JPH0336291B2 - - Google Patents
Info
- Publication number
- JPH0336291B2 JPH0336291B2 JP56139762A JP13976281A JPH0336291B2 JP H0336291 B2 JPH0336291 B2 JP H0336291B2 JP 56139762 A JP56139762 A JP 56139762A JP 13976281 A JP13976281 A JP 13976281A JP H0336291 B2 JPH0336291 B2 JP H0336291B2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- film thickness
- electron beam
- resist
- residual film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13976281A JPS5842229A (ja) | 1981-09-07 | 1981-09-07 | レジストパタ−ン形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13976281A JPS5842229A (ja) | 1981-09-07 | 1981-09-07 | レジストパタ−ン形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5842229A JPS5842229A (ja) | 1983-03-11 |
| JPH0336291B2 true JPH0336291B2 (enrdf_load_stackoverflow) | 1991-05-31 |
Family
ID=15252792
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13976281A Granted JPS5842229A (ja) | 1981-09-07 | 1981-09-07 | レジストパタ−ン形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5842229A (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0622196B2 (ja) * | 1984-04-12 | 1994-03-23 | 松下電子工業株式会社 | レジストパタ−ンの現像制御方法 |
| US6087052A (en) * | 1997-10-01 | 2000-07-11 | Fujitsu Limited | Charged particle beam exposure method utilizing subfield proximity corrections |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5580318A (en) * | 1978-12-12 | 1980-06-17 | Fujitsu Ltd | Electron-beam exposure |
| JPS55140228A (en) * | 1979-04-20 | 1980-11-01 | Hitachi Ltd | Method for formation of pattern |
-
1981
- 1981-09-07 JP JP13976281A patent/JPS5842229A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5842229A (ja) | 1983-03-11 |
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