JPS5837917A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPS5837917A
JPS5837917A JP56136677A JP13667781A JPS5837917A JP S5837917 A JPS5837917 A JP S5837917A JP 56136677 A JP56136677 A JP 56136677A JP 13667781 A JP13667781 A JP 13667781A JP S5837917 A JPS5837917 A JP S5837917A
Authority
JP
Japan
Prior art keywords
single crystal
region
silicon
semiconductor device
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56136677A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0136244B2 (enrdf_load_stackoverflow
Inventor
Seiichiro Kawamura
河村　誠一郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP56136677A priority Critical patent/JPS5837917A/ja
Publication of JPS5837917A publication Critical patent/JPS5837917A/ja
Publication of JPH0136244B2 publication Critical patent/JPH0136244B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02656—Special treatments
    • H01L21/02664—Aftertreatments
    • H01L21/02667—Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H01L21/02524—Group 14 semiconducting materials
    • H01L21/02532—Silicon, silicon germanium, germanium

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Recrystallisation Techniques (AREA)
JP56136677A 1981-08-31 1981-08-31 半導体装置の製造方法 Granted JPS5837917A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56136677A JPS5837917A (ja) 1981-08-31 1981-08-31 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56136677A JPS5837917A (ja) 1981-08-31 1981-08-31 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS5837917A true JPS5837917A (ja) 1983-03-05
JPH0136244B2 JPH0136244B2 (enrdf_load_stackoverflow) 1989-07-31

Family

ID=15180889

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56136677A Granted JPS5837917A (ja) 1981-08-31 1981-08-31 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS5837917A (enrdf_load_stackoverflow)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4947630A (enrdf_load_stackoverflow) * 1972-06-05 1974-05-08

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4947630A (enrdf_load_stackoverflow) * 1972-06-05 1974-05-08

Also Published As

Publication number Publication date
JPH0136244B2 (enrdf_load_stackoverflow) 1989-07-31

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