JPS5834981A - 圧電薄膜形電気−機械的変位変換素子の製造方法 - Google Patents
圧電薄膜形電気−機械的変位変換素子の製造方法Info
- Publication number
- JPS5834981A JPS5834981A JP56134413A JP13441381A JPS5834981A JP S5834981 A JPS5834981 A JP S5834981A JP 56134413 A JP56134413 A JP 56134413A JP 13441381 A JP13441381 A JP 13441381A JP S5834981 A JPS5834981 A JP S5834981A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- piezoelectric thin
- layer
- electrode layer
- semiconductor substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
- H10D48/50—Devices controlled by mechanical forces, e.g. pressure
Landscapes
- Pressure Sensors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56134413A JPS5834981A (ja) | 1981-08-26 | 1981-08-26 | 圧電薄膜形電気−機械的変位変換素子の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56134413A JPS5834981A (ja) | 1981-08-26 | 1981-08-26 | 圧電薄膜形電気−機械的変位変換素子の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5834981A true JPS5834981A (ja) | 1983-03-01 |
JPH0213833B2 JPH0213833B2 (enrdf_load_stackoverflow) | 1990-04-05 |
Family
ID=15127797
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56134413A Granted JPS5834981A (ja) | 1981-08-26 | 1981-08-26 | 圧電薄膜形電気−機械的変位変換素子の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5834981A (enrdf_load_stackoverflow) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60137462U (ja) * | 1984-02-23 | 1985-09-11 | ティーディーケイ株式会社 | アクチユエ−タ素子 |
US6408496B1 (en) * | 1997-07-09 | 2002-06-25 | Ronald S. Maynard | Method of manufacturing a vibrational transducer |
US20110056059A1 (en) * | 2009-09-07 | 2011-03-10 | Ngk Insulators, Ltd. | Method of producing piezoelectric/electrostrictive film type device |
-
1981
- 1981-08-26 JP JP56134413A patent/JPS5834981A/ja active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60137462U (ja) * | 1984-02-23 | 1985-09-11 | ティーディーケイ株式会社 | アクチユエ−タ素子 |
US6408496B1 (en) * | 1997-07-09 | 2002-06-25 | Ronald S. Maynard | Method of manufacturing a vibrational transducer |
US20110056059A1 (en) * | 2009-09-07 | 2011-03-10 | Ngk Insulators, Ltd. | Method of producing piezoelectric/electrostrictive film type device |
US8881353B2 (en) * | 2009-09-07 | 2014-11-11 | Ngk Insulators, Ltd. | Method of producing piezoelectric/electrostrictive film type device |
Also Published As
Publication number | Publication date |
---|---|
JPH0213833B2 (enrdf_load_stackoverflow) | 1990-04-05 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4276708B2 (ja) | レートセンサを製造するための方法 | |
JP4448845B2 (ja) | 回転レートセンサの製造方法 | |
TWI269349B (en) | Bump style MEMS switch | |
CN116684798A (zh) | 一种压电麦克风的结构和制造方法 | |
JPS5834981A (ja) | 圧電薄膜形電気−機械的変位変換素子の製造方法 | |
TW521439B (en) | Method for making a thin film structure | |
US20040121619A1 (en) | Multipoint minute electrode, device for measuring a living organism voltage, method for fabricating the multipoint minute electrode, and method for fabricating the living organism voltage-measuring device | |
WO2004068591A1 (ja) | 半導体装置の製造方法及び加速度センサ | |
JP3484956B2 (ja) | 圧電体素子の製造方法 | |
JPH0485829A (ja) | 半導体装置及びその製造方法 | |
JPS613431A (ja) | 多層配線を有する半導体装置およびその製造方法 | |
JPH10308397A (ja) | 電極端子及びその製造方法 | |
JPS61222236A (ja) | 半導体装置及びその製造方法 | |
JP2504239B2 (ja) | 半導体装置の製造方法 | |
JPS63275113A (ja) | 半導体装置の製造方法 | |
JPH04303943A (ja) | 半導体装置の製造方法 | |
JPH0132746Y2 (enrdf_load_stackoverflow) | ||
JPH11340189A (ja) | マイクロマシン製造における凹部又は貫通孔の形成方法 | |
JPS6257114B2 (enrdf_load_stackoverflow) | ||
JP3033171B2 (ja) | 半導体装置の製造方法 | |
JPS605232B2 (ja) | ジヨセフソン素子の製造方法 | |
JPS628030B2 (enrdf_load_stackoverflow) | ||
JPS61144034A (ja) | 転写バンプ基板の製造方法 | |
JPH0760886B2 (ja) | 半導体装置の製造方法 | |
JPS6346152B2 (enrdf_load_stackoverflow) |