JPS5830128A - ウエハのチヤツク装置 - Google Patents

ウエハのチヤツク装置

Info

Publication number
JPS5830128A
JPS5830128A JP56127788A JP12778881A JPS5830128A JP S5830128 A JPS5830128 A JP S5830128A JP 56127788 A JP56127788 A JP 56127788A JP 12778881 A JP12778881 A JP 12778881A JP S5830128 A JPS5830128 A JP S5830128A
Authority
JP
Japan
Prior art keywords
wafer
chuck
substrate
points
fine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56127788A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0454369B2 (enrdf_load_stackoverflow
Inventor
Yukio Kenbo
行雄 見坊
Nobuyuki Akiyama
秋山　伸幸
Yasuo Nakagawa
中川　泰夫
Susumu Aiuchi
進 相内
Mineo Nomoto
峰生 野本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP56127788A priority Critical patent/JPS5830128A/ja
Publication of JPS5830128A publication Critical patent/JPS5830128A/ja
Publication of JPH0454369B2 publication Critical patent/JPH0454369B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP56127788A 1981-08-17 1981-08-17 ウエハのチヤツク装置 Granted JPS5830128A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56127788A JPS5830128A (ja) 1981-08-17 1981-08-17 ウエハのチヤツク装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56127788A JPS5830128A (ja) 1981-08-17 1981-08-17 ウエハのチヤツク装置

Publications (2)

Publication Number Publication Date
JPS5830128A true JPS5830128A (ja) 1983-02-22
JPH0454369B2 JPH0454369B2 (enrdf_load_stackoverflow) 1992-08-31

Family

ID=14968689

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56127788A Granted JPS5830128A (ja) 1981-08-17 1981-08-17 ウエハのチヤツク装置

Country Status (1)

Country Link
JP (1) JPS5830128A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59169046U (ja) * 1983-04-26 1984-11-12 シャープ株式会社 吸着器
US5410259A (en) * 1992-06-01 1995-04-25 Tokyo Electron Yamanashi Limited Probing device setting a probe card parallel
US5806193A (en) * 1995-11-09 1998-09-15 Nikon Corporation Tilt and movement apparatus using flexure and air cylinder
KR100574919B1 (ko) * 1999-06-16 2006-04-28 삼성전자주식회사 반도체 장치 제조용 이온 주입 장비의 디스크 사이트 어셈블리및 이를 이용한 웨이퍼의 리프팅 보정방법
WO2011111327A1 (ja) * 2010-03-12 2011-09-15 パナソニック株式会社 アライメント方法およびフラットパネルディスプレイの製造方法
CN111730430A (zh) * 2020-07-30 2020-10-02 华海清科(北京)科技有限公司 具有可调节的吸盘转台的磨削设备

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5255472A (en) * 1975-10-31 1977-05-06 Thomson Csf Mask photo repeater
JPS5319901A (en) * 1976-07-28 1978-02-23 Mobil Oil Method of prospecting by earthquake
JPS5373078A (en) * 1976-12-13 1978-06-29 Nippon Telegr & Teleph Corp <Ntt> Fine adjustment mechanism of electromagnetic driving type
JPS5613726A (en) * 1979-07-14 1981-02-10 Nippon Kogaku Kk <Nikon> Gap setter in proximity-aligner

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5255472A (en) * 1975-10-31 1977-05-06 Thomson Csf Mask photo repeater
JPS5319901A (en) * 1976-07-28 1978-02-23 Mobil Oil Method of prospecting by earthquake
JPS5373078A (en) * 1976-12-13 1978-06-29 Nippon Telegr & Teleph Corp <Ntt> Fine adjustment mechanism of electromagnetic driving type
JPS5613726A (en) * 1979-07-14 1981-02-10 Nippon Kogaku Kk <Nikon> Gap setter in proximity-aligner

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59169046U (ja) * 1983-04-26 1984-11-12 シャープ株式会社 吸着器
US5410259A (en) * 1992-06-01 1995-04-25 Tokyo Electron Yamanashi Limited Probing device setting a probe card parallel
US5806193A (en) * 1995-11-09 1998-09-15 Nikon Corporation Tilt and movement apparatus using flexure and air cylinder
KR100574919B1 (ko) * 1999-06-16 2006-04-28 삼성전자주식회사 반도체 장치 제조용 이온 주입 장비의 디스크 사이트 어셈블리및 이를 이용한 웨이퍼의 리프팅 보정방법
WO2011111327A1 (ja) * 2010-03-12 2011-09-15 パナソニック株式会社 アライメント方法およびフラットパネルディスプレイの製造方法
JP5029786B2 (ja) * 2010-03-12 2012-09-19 パナソニック株式会社 アライメント方法およびフラットパネルディスプレイの製造方法
US8318392B2 (en) 2010-03-12 2012-11-27 Panasonic Corporation Alignment method and method for manufacturing flat panel display
CN111730430A (zh) * 2020-07-30 2020-10-02 华海清科(北京)科技有限公司 具有可调节的吸盘转台的磨削设备

Also Published As

Publication number Publication date
JPH0454369B2 (enrdf_load_stackoverflow) 1992-08-31

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