JPH0454369B2 - - Google Patents

Info

Publication number
JPH0454369B2
JPH0454369B2 JP56127788A JP12778881A JPH0454369B2 JP H0454369 B2 JPH0454369 B2 JP H0454369B2 JP 56127788 A JP56127788 A JP 56127788A JP 12778881 A JP12778881 A JP 12778881A JP H0454369 B2 JPH0454369 B2 JP H0454369B2
Authority
JP
Japan
Prior art keywords
wafer
chuck
wafer surface
rigidity
inclination
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56127788A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5830128A (ja
Inventor
Yukio Kenbo
Nobuyuki Akyama
Yasuo Nakagawa
Susumu Aiuchi
Mineo Nomoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP56127788A priority Critical patent/JPS5830128A/ja
Publication of JPS5830128A publication Critical patent/JPS5830128A/ja
Publication of JPH0454369B2 publication Critical patent/JPH0454369B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP56127788A 1981-08-17 1981-08-17 ウエハのチヤツク装置 Granted JPS5830128A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56127788A JPS5830128A (ja) 1981-08-17 1981-08-17 ウエハのチヤツク装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56127788A JPS5830128A (ja) 1981-08-17 1981-08-17 ウエハのチヤツク装置

Publications (2)

Publication Number Publication Date
JPS5830128A JPS5830128A (ja) 1983-02-22
JPH0454369B2 true JPH0454369B2 (enrdf_load_stackoverflow) 1992-08-31

Family

ID=14968689

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56127788A Granted JPS5830128A (ja) 1981-08-17 1981-08-17 ウエハのチヤツク装置

Country Status (1)

Country Link
JP (1) JPS5830128A (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59169046U (ja) * 1983-04-26 1984-11-12 シャープ株式会社 吸着器
JP3219844B2 (ja) * 1992-06-01 2001-10-15 東京エレクトロン株式会社 プローブ装置
US5806193A (en) * 1995-11-09 1998-09-15 Nikon Corporation Tilt and movement apparatus using flexure and air cylinder
KR100574919B1 (ko) * 1999-06-16 2006-04-28 삼성전자주식회사 반도체 장치 제조용 이온 주입 장비의 디스크 사이트 어셈블리및 이를 이용한 웨이퍼의 리프팅 보정방법
US8318392B2 (en) 2010-03-12 2012-11-27 Panasonic Corporation Alignment method and method for manufacturing flat panel display
CN111730430B (zh) * 2020-07-30 2021-10-15 华海清科(北京)科技有限公司 具有可调节的吸盘转台的磨削设备

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2330030A1 (fr) * 1975-10-31 1977-05-27 Thomson Csf Nouvel appareil photorepeteur de masques de haute precision
NO146924C (no) * 1976-07-28 1982-12-29 Mobil Oil Corp Fremgangsmaate ved marine seismiske undersoekelser
JPS5373078A (en) * 1976-12-13 1978-06-29 Nippon Telegr & Teleph Corp <Ntt> Fine adjustment mechanism of electromagnetic driving type
JPS587055B2 (ja) * 1979-07-14 1983-02-08 株式会社ニコン プロキシミテイ・アライナ−におけるギヤツプ設定装置

Also Published As

Publication number Publication date
JPS5830128A (ja) 1983-02-22

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