JPH035652B2 - - Google Patents

Info

Publication number
JPH035652B2
JPH035652B2 JP56203050A JP20305081A JPH035652B2 JP H035652 B2 JPH035652 B2 JP H035652B2 JP 56203050 A JP56203050 A JP 56203050A JP 20305081 A JP20305081 A JP 20305081A JP H035652 B2 JPH035652 B2 JP H035652B2
Authority
JP
Japan
Prior art keywords
substrate
plane
mask
points
reference plane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56203050A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58103136A (ja
Inventor
Junji Hazama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku KK filed Critical Nippon Kogaku KK
Priority to JP56203050A priority Critical patent/JPS58103136A/ja
Publication of JPS58103136A publication Critical patent/JPS58103136A/ja
Publication of JPH035652B2 publication Critical patent/JPH035652B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/703—Gap setting, e.g. in proximity printer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
JP56203050A 1981-12-16 1981-12-16 基板の傾き設定装置 Granted JPS58103136A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56203050A JPS58103136A (ja) 1981-12-16 1981-12-16 基板の傾き設定装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56203050A JPS58103136A (ja) 1981-12-16 1981-12-16 基板の傾き設定装置

Publications (2)

Publication Number Publication Date
JPS58103136A JPS58103136A (ja) 1983-06-20
JPH035652B2 true JPH035652B2 (enrdf_load_stackoverflow) 1991-01-28

Family

ID=16467506

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56203050A Granted JPS58103136A (ja) 1981-12-16 1981-12-16 基板の傾き設定装置

Country Status (1)

Country Link
JP (1) JPS58103136A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011164595A (ja) * 2010-01-14 2011-08-25 Nsk Ltd 近接露光装置及び近接露光方法

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS616701A (ja) * 1984-06-21 1986-01-13 Iwatsu Electric Co Ltd 製版機の瀬御誤差調整方法
JPS6144429A (ja) * 1984-08-09 1986-03-04 Nippon Kogaku Kk <Nikon> 位置合わせ方法、及び位置合せ装置
JPS6190432A (ja) * 1984-10-11 1986-05-08 Nippon Telegr & Teleph Corp <Ntt> あおり支持機構
JPS62277726A (ja) * 1986-05-27 1987-12-02 Canon Inc 平行出し装置
JPH0652707B2 (ja) * 1988-10-11 1994-07-06 キヤノン株式会社 面位置検出方法
JP3401769B2 (ja) * 1993-12-28 2003-04-28 株式会社ニコン 露光方法、ステージ装置、及び露光装置
JP3634068B2 (ja) 1995-07-13 2005-03-30 株式会社ニコン 露光方法及び装置
KR19980019031A (ko) 1996-08-27 1998-06-05 고노 시게오 스테이지 장치(a stage apparatus)
KR100471018B1 (ko) 2000-11-28 2005-03-08 스미도모쥬기가이고교 가부시키가이샤 두 개의 대상물 간의 갭 조절장치 및 조절방법
SG188343A1 (en) 2010-09-03 2013-04-30 Ev Group E Thallner Gmbh Device and method for reducing a wedge error
CN103206591B (zh) * 2012-01-11 2016-10-05 昆山允升吉光电科技有限公司 电动载物台定位方法
EP2752870A1 (en) * 2013-01-04 2014-07-09 Süss Microtec Lithography GmbH Chuck, in particular for use in a mask aligner
US20210340663A1 (en) * 2018-04-03 2021-11-04 Matthias HEYMANNS Apparatus for processing a substrate, system for processing a substrate, and methods therefor

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5243692A (en) * 1975-09-30 1977-04-05 Sumiyoshi Heavy Ind Apparatus for hauling with hauling roller having angle changeable fishing net linkkgethering member
JPS5252579A (en) * 1975-10-27 1977-04-27 Canon Inc Clearance adjusng method
JPS5516457A (en) * 1978-07-24 1980-02-05 Nippon Telegr & Teleph Corp <Ntt> Gap detecting method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011164595A (ja) * 2010-01-14 2011-08-25 Nsk Ltd 近接露光装置及び近接露光方法

Also Published As

Publication number Publication date
JPS58103136A (ja) 1983-06-20

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