JPS5825233A - 電子ビ−ム直接描画に於ける重ね合せマ−ク保存法 - Google Patents
電子ビ−ム直接描画に於ける重ね合せマ−ク保存法Info
- Publication number
- JPS5825233A JPS5825233A JP12380081A JP12380081A JPS5825233A JP S5825233 A JPS5825233 A JP S5825233A JP 12380081 A JP12380081 A JP 12380081A JP 12380081 A JP12380081 A JP 12380081A JP S5825233 A JPS5825233 A JP S5825233A
- Authority
- JP
- Japan
- Prior art keywords
- film
- mark
- electron beam
- pattern
- negative
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004321 preservation Methods 0.000 title abstract description 3
- 238000000609 electron-beam lithography Methods 0.000 title description 2
- 238000000034 method Methods 0.000 claims abstract description 17
- 239000000758 substrate Substances 0.000 claims abstract description 6
- 230000007261 regionalization Effects 0.000 claims abstract description 4
- 238000010894 electron beam technology Methods 0.000 claims description 18
- 238000005516 engineering process Methods 0.000 claims 1
- 210000004303 peritoneum Anatomy 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 abstract description 5
- 229920002120 photoresistant polymer Polymers 0.000 abstract description 4
- 230000035945 sensitivity Effects 0.000 abstract description 3
- 239000004793 Polystyrene Substances 0.000 abstract 2
- 238000005530 etching Methods 0.000 abstract 2
- 238000001459 lithography Methods 0.000 abstract 2
- 229920002223 polystyrene Polymers 0.000 abstract 2
- 230000018109 developmental process Effects 0.000 abstract 1
- 230000001681 protective effect Effects 0.000 abstract 1
- 208000031513 cyst Diseases 0.000 description 11
- 206010011732 Cyst Diseases 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000012528 membrane Substances 0.000 description 3
- 235000014121 butter Nutrition 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 238000010422 painting Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12380081A JPS5825233A (ja) | 1981-08-06 | 1981-08-06 | 電子ビ−ム直接描画に於ける重ね合せマ−ク保存法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12380081A JPS5825233A (ja) | 1981-08-06 | 1981-08-06 | 電子ビ−ム直接描画に於ける重ね合せマ−ク保存法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5825233A true JPS5825233A (ja) | 1983-02-15 |
JPH0216571B2 JPH0216571B2 (enrdf_load_stackoverflow) | 1990-04-17 |
Family
ID=14869622
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12380081A Granted JPS5825233A (ja) | 1981-08-06 | 1981-08-06 | 電子ビ−ム直接描画に於ける重ね合せマ−ク保存法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5825233A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63100380A (ja) * | 1986-08-01 | 1988-05-02 | インタ−シル,インコ−ポレ−テツド | 交流電力損失検出装置 |
-
1981
- 1981-08-06 JP JP12380081A patent/JPS5825233A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63100380A (ja) * | 1986-08-01 | 1988-05-02 | インタ−シル,インコ−ポレ−テツド | 交流電力損失検出装置 |
Also Published As
Publication number | Publication date |
---|---|
JPH0216571B2 (enrdf_load_stackoverflow) | 1990-04-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS61200537A (ja) | 蒸気拡散画像反転によりポジのホトレジストの画像の質を高める方法 | |
US4610948A (en) | Electron beam peripheral patterning of integrated circuits | |
JPH0496065A (ja) | レチクル | |
JPS5825233A (ja) | 電子ビ−ム直接描画に於ける重ね合せマ−ク保存法 | |
JPH05326358A (ja) | 微細パターン形成方法 | |
US5648199A (en) | Method of forming a resist pattern utilizing an acid water-soluble material overlayer on the resist film | |
US3673018A (en) | Method of fabrication of photomasks | |
JP2659550B2 (ja) | パターン形成方法 | |
JP2603935B2 (ja) | レジストパターン形成方法 | |
JPS59141230A (ja) | パタ−ン形成方法 | |
JPH04216553A (ja) | 半導体製造用マスク | |
JPH07325382A (ja) | 位相シフトマスクの製造方法 | |
JPS58204532A (ja) | パタ−ン形成方法 | |
JPS6020512A (ja) | パタ−ン形成方法 | |
JPS6156867B2 (enrdf_load_stackoverflow) | ||
JP3837846B2 (ja) | 半導体装置の製造方法 | |
JPS6148704B2 (enrdf_load_stackoverflow) | ||
JPS6215854B2 (enrdf_load_stackoverflow) | ||
JPH06112119A (ja) | レジストパターン形成方法 | |
JPS60176040A (ja) | シヤドウマスク用パタ−ン版の製造方法 | |
JPS6255650A (ja) | 基板上への樹脂パタ−ンの形成方法 | |
JPS63202025A (ja) | 半導体装置の製造方法 | |
JPS5989414A (ja) | 半導体基板の位置合せ方法 | |
JPS63231348A (ja) | フオトマスク | |
JPS60176041A (ja) | シヤドウマスク用パタ−ン版の製造方法 |