JPS58219736A - パターン形成方法 - Google Patents

パターン形成方法

Info

Publication number
JPS58219736A
JPS58219736A JP57102019A JP10201982A JPS58219736A JP S58219736 A JPS58219736 A JP S58219736A JP 57102019 A JP57102019 A JP 57102019A JP 10201982 A JP10201982 A JP 10201982A JP S58219736 A JPS58219736 A JP S58219736A
Authority
JP
Japan
Prior art keywords
radiation
thin film
polymer
resist
aldehyde
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57102019A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0380300B2 (enrdf_load_stackoverflow
Inventor
Koichi Hatada
畑田　耕一
Hiraaki Yuuki
結城　平明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP57102019A priority Critical patent/JPS58219736A/ja
Priority to EP83105867A priority patent/EP0096895A3/en
Publication of JPS58219736A publication Critical patent/JPS58219736A/ja
Publication of JPH0380300B2 publication Critical patent/JPH0380300B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP57102019A 1982-06-16 1982-06-16 パターン形成方法 Granted JPS58219736A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP57102019A JPS58219736A (ja) 1982-06-16 1982-06-16 パターン形成方法
EP83105867A EP0096895A3 (en) 1982-06-16 1983-06-15 Positive type radiation-sensitive organic highpolymer material and method of forming fine pattern by using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57102019A JPS58219736A (ja) 1982-06-16 1982-06-16 パターン形成方法

Publications (2)

Publication Number Publication Date
JPS58219736A true JPS58219736A (ja) 1983-12-21
JPH0380300B2 JPH0380300B2 (enrdf_load_stackoverflow) 1991-12-24

Family

ID=14316033

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57102019A Granted JPS58219736A (ja) 1982-06-16 1982-06-16 パターン形成方法

Country Status (1)

Country Link
JP (1) JPS58219736A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58219547A (ja) * 1982-06-16 1983-12-21 Hitachi Ltd ポジ形放射線感応性有機高分子材料
JPS6010250A (ja) * 1983-06-30 1985-01-19 Fujitsu Ltd パタ−ン形成方法
JPS6311932A (ja) * 1986-04-11 1988-01-19 ジエイムズ・シ−・ダブリユ・チエン 自己現像する放射レジスト

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5387720A (en) * 1977-01-13 1978-08-02 Toshiba Corp Positive type radiation sensitive material
JPS53117096A (en) * 1977-03-24 1978-10-13 Nippon Telegr & Teleph Corp <Ntt> Formation of high polymer film materials and their patterns
JPS53133429A (en) * 1977-04-25 1978-11-21 Hoechst Ag Radiation sensitive copying conposite and method of forming relief

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5387720A (en) * 1977-01-13 1978-08-02 Toshiba Corp Positive type radiation sensitive material
JPS53117096A (en) * 1977-03-24 1978-10-13 Nippon Telegr & Teleph Corp <Ntt> Formation of high polymer film materials and their patterns
JPS53133429A (en) * 1977-04-25 1978-11-21 Hoechst Ag Radiation sensitive copying conposite and method of forming relief

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58219547A (ja) * 1982-06-16 1983-12-21 Hitachi Ltd ポジ形放射線感応性有機高分子材料
JPS6010250A (ja) * 1983-06-30 1985-01-19 Fujitsu Ltd パタ−ン形成方法
JPS6311932A (ja) * 1986-04-11 1988-01-19 ジエイムズ・シ−・ダブリユ・チエン 自己現像する放射レジスト

Also Published As

Publication number Publication date
JPH0380300B2 (enrdf_load_stackoverflow) 1991-12-24

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