JPS58198525A - Epoxy resin composition - Google Patents

Epoxy resin composition

Info

Publication number
JPS58198525A
JPS58198525A JP57082164A JP8216482A JPS58198525A JP S58198525 A JPS58198525 A JP S58198525A JP 57082164 A JP57082164 A JP 57082164A JP 8216482 A JP8216482 A JP 8216482A JP S58198525 A JPS58198525 A JP S58198525A
Authority
JP
Japan
Prior art keywords
epoxy resin
resin
composition
curing
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57082164A
Other languages
Japanese (ja)
Other versions
JPS6230215B2 (en
Inventor
Yasuo Uchimiya
内宮 康夫
Atsushi Okuno
敦史 奥野
Tsuneichi Hashimoto
橋本 常一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SANYUREJIN KK
Original Assignee
SANYUREJIN KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SANYUREJIN KK filed Critical SANYUREJIN KK
Priority to JP57082164A priority Critical patent/JPS58198525A/en
Publication of JPS58198525A publication Critical patent/JPS58198525A/en
Publication of JPS6230215B2 publication Critical patent/JPS6230215B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE:An epoxy resin composition requiring no post curing and being excellent in moisture resistance and suitable for use for electronic parts, electronic instruments and devices, etc., obtained by mixing an epoxy resin with a curing agent for a phenolic resin, a specified cure accelerator and an inorganic filler. CONSTITUTION:100pts.wt. epoxy resin is mixed with about 10-150pts.wt. curing agent comprising a phenolic resin or a mixture of this resin with an acid anhydride (e.g., phthalic anhydride), about 0.05-8pts.wt. cure accelerator selected from the group consisting of a tert. amine (e.g., triethanolamine), a triazole (e.g., 5-methyltriazole) and an imidazole (e.g., 2-phenylimidazole), and about 20- 450pts.wt. inorganic filler (e.g., quartz glass). In the above mixing, at least two of the first three components are melt-blended first, and after cooling, the product is ground and used to obtain the purpose resin composition.

Description

【発明の詳細な説明】 本発明は後硬化不用にして且つ耐湿性が改善された電子
部品及び電子機器用として好適なエボ士シ樹脂組成物に
関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an embossment resin composition suitable for use in electronic parts and electronic devices, which does not require post-curing and has improved moisture resistance.

エポ+シ樹脂は、その電気的特性、機械的特性等が優れ
ているため、半導体装置等の電子部品及び電子機器の封
止や含浸等圧広く用いられている。
Since epoxy resin has excellent electrical properties, mechanical properties, etc., it is widely used for sealing and impregnating electronic components and devices such as semiconductor devices.

しかしながら従来のエボ士シ樹脂組成物には、半導体装
置等を封止又は含浸後高温で長時間、後硬化する必要が
あるという工業生産上の問題点があり、またその耐湿性
も充分であるとけ言えず使用するにつれて絶縁性が低下
しリーク電流が増加するという欠点がある。
However, conventional Eboshi resin compositions have problems in industrial production, such as the need to post-cure at high temperatures for a long time after sealing or impregnating semiconductor devices, etc., and their moisture resistance is also insufficient. It has the disadvantage that the insulation properties deteriorate and leakage current increases as it is used.

本発明者は、上記問題点及び欠点を解消する方法につい
て鋭意研究した結果、エボ+シ樹脂、硬化剤及び硬化促
進剤の内少なくと42種は、その使用量の全部又は一部
を予め溶融づレシド処理しておくこと罠よって目的が達
成出来ることを見出し、本発明を完成するに至った。
As a result of intensive research into methods for solving the above problems and drawbacks, the inventors of the present invention found that at least 42 types of epoxy resin, curing agents, and curing accelerators are melted in whole or in part in advance. The inventors discovered that the object could be achieved by pre-processing the resin and completed the present invention.

即ち本発明は、f+J  エポ+シ樹脂、(2)  フ
ェノール樹脂又はこれと酸無水物との混合物である硬化
剤、 (3)第3級アミン類、トリアリール類及びイミダリー
ル類からなる群より選ばれた少なくとも1種である硬化
促進剤、並びK (4)無機質充填剤 を必須成分として含有する組成物であって、上記(1)
、(2)及び(3)の成分の内少なくとも2mは、その
使用量の全部又は一部を予め溶融混合し、次いで冷却後
粉砕したものであることを特徴とするエポ士シ樹脂組成
物に係る。
That is, the present invention provides a curing agent selected from the group consisting of f+J epoxy resin, (2) a curing agent that is a phenol resin or a mixture thereof and an acid anhydride, and (3) tertiary amines, triaryls, and imidalyls. A composition containing as an essential component at least one hardening accelerator, as well as K (4) an inorganic filler, which comprises the above-mentioned (1).
, at least 2 m of the components (2) and (3) are obtained by melt-mixing all or a part of the amount used in advance, and then cooling and pulverizing. It depends.

本発明は、+1)エボ+シ樹脂、(2)フェノール樹脂
又はこれと酸無水物の混合物である硬化剤並びK(3)
第3級アミン類、トリアリール類及びイ!:Ijリール
類から選ばれる少なくと411種である硬化促進剤、の
内少なくとも2種は、その使用量の全部又は一部を予め
溶融混合し、次いで冷却後粉砕した状態で使用すること
を特徴とする。上記の如き溶融づしンド処理を施すこと
Kより、本発明エポ士シ樹脂組成物においては、この種
の組成物で必要とされる後硬化工程を省くことが出来、
又処理I7た成分間のなじみが良好になり従って最終製
品である成形体が稠密になり耐湿性が向上するのである
。該処理は、処理物の配合によ9変化するが、・処理物
が溶融する温度、通常60〜130℃程度で溶融混合し
、放冷、水冷等によシ冷却固化した後、粉砕することに
より行なわ、れる、粉砕したものの粒度としてはlOメ
ツシュ通過以下であるのが好ましい。10メツシュ通過
よりも大きいものは、他の添加剤との混合分散性が悪C
〕、最終製品の特性のバラタ+が大きくなる。
The present invention provides a hardening agent which is +1) Evo + Shi resin, (2) phenol resin or a mixture of this and an acid anhydride, and (3)
Tertiary amines, triaryls and i! : At least two of the at least 411 types of curing accelerators selected from IJ reels are characterized in that all or part of the amount used is melt-mixed in advance, and then used in a pulverized state after cooling. shall be. By performing the above-mentioned melt hardening treatment, the epoxy resin composition of the present invention can omit the post-curing step required for this type of composition.
Furthermore, the components subjected to treatment I7 become more compatible, and the final product, the molded article, becomes denser and has improved moisture resistance. The process varies depending on the composition of the materials to be treated; however, the materials are melted and mixed at the melting temperature of the materials, usually around 60 to 130°C, cooled to solidify by standing to cool, water-cooled, etc., and then pulverized. It is preferable that the particle size of the pulverized product is smaller than that passing through a 1O mesh. If the mesh size is larger than 10, the mixing and dispersibility with other additives is poor.
], the balata + of the characteristics of the final product increases.

核処理をする際の処理すべき量としては、各処理物によ
って異なるが成分(1)Kついてはその使用量の20〜
100重量%、成分(2)Kついではその使用量の50
〜100重量%及び成分(3)Kついてけその使用量の
5〜30重量−であるのが、本発明所期の効果を得る九
めに好ましい。成分(3)をその使用量の30重量%を
越えて処理する場合には副反応を起すことがある。該処
理をされる各成分の組み合わせとしては、(1)及び(
2)、tl)及び(3)、(2)及び(3)並びK (
11、(2)及び(3)のいずれでも良い。
The amount to be treated during nuclear treatment differs depending on the material to be treated, but for component (1) K, the amount to be treated is 20 to 20% of the amount used.
100% by weight, component (2) K and then 50% of its usage amount
It is the ninth most preferable to obtain the desired effect of the present invention that the amount of the component (3) K is 100% by weight and 5 to 30% by weight. If component (3) is used in an amount exceeding 30% by weight of the amount used, side reactions may occur. Combinations of each component to be treated include (1) and (
2), tl) and (3), (2) and (3) and K (
11, (2) and (3) may be used.

本発明におけるエポ士シ樹脂としては、特に限定される
ことなく全知のものがいずれも使用出来、例えばフェノ
ールノボラック型エポ+シ樹脂、フレリールノボラック
型エポ+シ樹脂、ビスフェノール、A型エポ中シ樹脂、
グリシジルエーテル型エポ中シ樹脂、グリシジルエステ
ル型エポ+シ樹脂、クリシジルアミシ型エポ牛シ樹脂、
オレフイυ結合のエポ+シ化により鰐導されるエポ+シ
樹脂、線状脂肪族エボ牛シ樹脂、脂環式エイ士シ樹脂、
複素環型エポ十シ樹脂、ハ0ゲシ化エポ+シ樹脂等の1
分子中にエボ牛シ基を2個以上有するものを挙げること
が出来、これらの少なくともll’lを用いる。
The epoxy resin in the present invention is not particularly limited and any known resin can be used, such as phenol novolak type epoxy resin, freryl novolac type epoxy resin, bisphenol, A type epoxy resin, etc. resin,
Glycidyl ether type epoxy resin, glycidyl ester type epoxy resin, chrycidyl amici type epoxy resin,
Epo+Si resin, linear aliphatic Ebony resin, alicyclic Ebony resin, which is produced by Epo+Si conversion of olefin υ bond.
1, such as heterocyclic epoxy resin, bald epoxy resin, etc.
Examples include those having two or more Ebo-gyu-shi groups in the molecule, and at least ll'l of these are used.

本発明においては、硬化剤としてフェノール樹脂又tま
これと酸無水物との混合物を用いる。そのことにより耐
湿性及び耐熱性が著しく向上干る。
In the present invention, a phenol resin or a mixture of the resin and an acid anhydride is used as the curing agent. This significantly improves moisture resistance and heat resistance.

本発明において用いるフェノール樹脂硬化剤としては、
公知のものを広く使用出来るが、例えばフェノールノボ
ラックtm脂s tart−ブチルフェノールノボラッ
ク樹脂、ノニルフェノールノボラック樹脂、ポリバラビ
ニルフェノール樹脂等を挙げろことが出来、これらの少
なくとも一穐を用いる。
The phenolic resin curing agent used in the present invention includes:
A wide variety of known materials can be used, including, for example, phenol novolak TM resin, start-butylphenol novolac resin, nonylphenol novolac resin, polyvarabinylphenol resin, etc., and at least one of these is used.

フェノール樹脂硬化剤の使用量としては、エポ士シ樹脂
100重量部に対して10〜150電量部である。10
重量部未満の場合又は150重量部を越える場合には耐
熱性が低下する。
The amount of the phenolic resin curing agent used is 10 to 150 coulometric parts per 100 parts by weight of the epoxy resin. 10
If the amount is less than 150 parts by weight or exceeds 150 parts by weight, heat resistance will decrease.

本発明圧おいて併用する酸無水物系硬化剤としてtよ、
公知の4のを広く使用出来、例えば無水フタル酸、無水
テトラしドロフタル酸、無水へ中サヒドロフタル酸、無
水ナジック酸、無水メチルナ・じツク酸、無水コハク酸
、無水トリメリット酸、無水ピロメリット酸、3.イ、
4.イーベシ・ノフェノシテトラカルポシ酸無水物、無
水テトラづO’Eフタル酸、無水り0レジデイツク酸、
5− (2,5−ジオ中ソテトラヒド0フリル)−3−
メチル−3−シフ0へ牛セ)−1,2−、;カルポジ酸
無水物、トリメリット酸二量体、3,4−ジメチル−6
−(2−メチル−1−づDベニル) −3,4,5,6
−チトラヒド0フタル酸無水物、3,4−ジメチル−6
−(2−メチル−1−づ0ベニル) −1,2,3,6
−チトラヒド0フタル酸無水物等を挙げることが出来、
これらの少なくと41種を用いる。酸無水物系硬化剤は
前記フェノール樹脂硬化剤の一部に置き換えて使用する
。その場合の使用量は、硬化剤全体の5〜60重量−で
あるのが好ましい。
As an acid anhydride curing agent used in combination with the pressure of the present invention,
A wide variety of known 4 can be used, such as phthalic anhydride, tetradolphthalic anhydride, sahydrophthalic anhydride, nadic anhydride, methylnadic anhydride, succinic anhydride, trimellitic anhydride, and pyromellitic anhydride. , 3. stomach,
4. Ebesi-nophenocytetracarposic acid anhydride, tetra-phthalic anhydride, redidic acid anhydride,
5- (2,5-diosotetrahydrofuryl)-3-
Methyl-3-Schiff0-1,2-; Carposiic acid anhydride, trimellitic acid dimer, 3,4-dimethyl-6
-(2-methyl-1-dbenyl) -3,4,5,6
-Titrahydro phthalic anhydride, 3,4-dimethyl-6
-(2-methyl-1-benyl) -1,2,3,6
-Titrahydro phthalic anhydride, etc.
At least 41 of these are used. The acid anhydride curing agent is used in place of a part of the phenolic resin curing agent. In that case, the amount used is preferably 5 to 60% by weight of the entire curing agent.

本発明において用いる硬化促進剤としては、第3級アミ
シ類、トリアリール類及びイ三Ijリール類から選ばれ
る公知のものを広く使用出来、例えばベニJ、;ルジメ
チルアミシ、トリエタノールアミン、ジメチルアミノメ
チルフェノール、トリス(ジメチルアミノメチル)フェ
ノール、トリエチルテトラミシ、3.9−ビス(3−ア
三)づ0ピル)−2,4,8,IO−テトラオ士すスピ
0 (5,5)ウシプガン等の第3級アΣシ類、1.2
.3−ベシリトリアリール、5−メチルトリアリール尋
のトリアリール類、2−フェニルイ、l:タリール、2
−エチル−4−メチルイミタリール、2−メチルイ三タ
リール、2−エチルイミタリール、2,4−ジメチルゴ
ミ4リール、2−ウシデシルイ三4リール、2−へづタ
デシルイ三j2リール、1−ビニル−2−メチルイ三づ
リール、2−フェニル−4,5−ジしドロ+シメチルイ
ミタリール、2−フェニル−4−メチルイミタリール、
2−イソづ0ビルイ三タリール、1−シアノメチル−2
−メチルイミタリール等のイミダリール類を挙げること
が出来、これらの少なくと本1種を用いる。硬化促進剤
の使用量はエポ十シ樹脂100重1部に対して0.05
〜8重量部が適当である。0.05重量部石満では硬化
促進効果が充分でなく未硬化物が生じる。ま念8重量部
を越えると貯蔵安定性が悪くなる。
As the curing accelerator used in the present invention, a wide variety of known curing accelerators can be used, such as those selected from tertiary amici, triaryls, and diaryls, such as Beni J, dimethylamici, triethanolamine, dimethylaminomethyl Phenol, tris(dimethylaminomethyl)phenol, triethyltetramis, 3,9-bis(3-aminomethyl)-2,4,8,IO-tetraospirol (5,5), etc. tertiary ΣΣ class of, 1.2
.. 3-besylitriaryl, 5-methyltriaryl triaryl, 2-phenylyl, l:taryl, 2
-Ethyl-4-methylimitaryl, 2-methyltritalyl, 2-ethylimitaryl, 2,4-dimethyltrimethyl, 2-bodecyl-tri-4-lyl, 2-heztadecyl-tri-j2-lyl, 1- Vinyl-2-methyl-trizuryl, 2-phenyl-4,5-diso+dimethylimitaryl, 2-phenyl-4-methylimitaryl,
2-Isodubirutritalyl, 1-cyanomethyl-2
- Imidaryls such as methyl imitalyl can be mentioned, and at least one of these is used. The amount of curing accelerator used is 0.05 parts per 100 parts by weight of epoxy resin.
~8 parts by weight is suitable. When the amount is 0.05 parts by weight, the curing accelerating effect is not sufficient and uncured products are produced. If the amount exceeds 8 parts by weight, storage stability will deteriorate.

また、本発明において耐湿性の向上、膨張係数の低減、
熱伝導率の向上等のために用いる無機質充填剤としては
、公知の本のを広く使用出来るが、例えば石英ガラス、
結晶性シリカ、ガラス繊維、タルク、アルミナ、水利ア
ルミナ、ケイ酸カルシウム、炭酸カルシウム、硫酸バリ
ウム、マグネシア、ケイ酸ジルコニウム、クレー、マイ
カ等を挙げることが出来、これらの少なくとも1111
を用いる。これら無機質充填剤は粉末状で用いるのが好
ましい。無機質充填剤の使用量はエポ+シ樹脂100重
量部に対して20〜450電量部が適当である。20重
量部未満では膨張係数の低減が期待できな°い。オた、
450重量部を越えると溶融粘度が非常圧高くな秒使用
が困難になる。
In addition, in the present invention, the moisture resistance is improved, the expansion coefficient is reduced,
As the inorganic filler used to improve thermal conductivity, a wide range of known materials can be used, such as quartz glass,
Examples include crystalline silica, glass fiber, talc, alumina, water-containing alumina, calcium silicate, calcium carbonate, barium sulfate, magnesia, zirconium silicate, clay, mica, and at least 1111 of these.
Use. These inorganic fillers are preferably used in powder form. The appropriate amount of the inorganic filler to be used is 20 to 450 parts by weight per 100 parts by weight of the epoxy resin. If the amount is less than 20 parts by weight, no reduction in the expansion coefficient can be expected. Ota,
If it exceeds 450 parts by weight, the melt viscosity will be extremely high and it will be difficult to use the resin.

また、本発明の組成物を電子部品又は電子機器用に用い
る場合には難燃剤を使用する。その際の難燃剤としては
、公知のものを広く使用出来、例えばへ十すづOtベシ
ゼン、三酸化アンチ[ン、テトラづ[1’Eビスフエノ
ールA、へ士すづO七ピフェニル、デカクOOピフェニ
ル、赤すシ等を挙げることが出来、これらの少なくと4
11種を用いる。難燃剤の使用lはエポ牛シ樹脂100
重量部に対して3〜150重量部が適当である。3重量
部未満では難燃効果が期待出来ない。
Further, when the composition of the present invention is used for electronic parts or electronic equipment, a flame retardant is used. As the flame retardant in this case, a wide variety of known flame retardants can be used. Examples include piphenyl, red sushi, etc., and at least 4 of these
11 types are used. The flame retardant used is epoxy resin 100
A suitable amount is 3 to 150 parts by weight. If the amount is less than 3 parts by weight, no flame retardant effect can be expected.

更Kまた、本発明においては、上記各成分の他にこの種
の組成物に通常使用される添加剤、例えばガーボシづラ
ック、ベシガラ等の着色剤、カルノウバ0つ、合成ワッ
クス等の離型剤、シラシカツづりυグ剤等の接着改良剤
等を添加併用しても良い。
Furthermore, in the present invention, in addition to the above-mentioned components, additives commonly used in this type of composition, such as coloring agents such as Garbosilac and Beshigara, and mold release agents such as Carnouba and synthetic wax, are also used. , an adhesion improver such as Shirashikazuri υg agent, etc. may be added and used in combination.

本発明エポ十シ樹脂組成物は、特に限定されることなく
広い用途に適用されるが、電子部品及び電子機器を封止
する場合に好適であり、その際の成形方法としては、こ
の種の組成物の成形方法として従来公知の本のがいずれ
も適用出来、例えば低圧トランスファー成形法、インジ
エクショシ成形方法、圧縮成形方法等が挙げられる。ま
た、本発明組成物は、封止用以外にも被覆用、絶縁用等
とすること本出来、更に適当な溶剤、例えばメチルエチ
ルケトシ、スチレシ七ツマ−1づチルカルビノール等圧
溶解して含浸用とすること本出来る。
The epoxy resin composition of the present invention can be applied to a wide range of applications without particular limitations, but it is suitable for sealing electronic parts and electronic equipment, and the molding method used in this case is Any conventionally known method for molding the composition can be applied, such as low-pressure transfer molding, injection molding, compression molding, and the like. Furthermore, the composition of the present invention can be used not only for sealing purposes but also for coating purposes, insulation purposes, etc. Furthermore, it can be impregnated by dissolving it in a suitable solvent such as methyl ethyl ketone, styrene, and methylcarbinol. You can read what you need.

本発明エポキシ樹脂組成物は、前述した様に、エポキシ
樹脂、硬化剤及び硬化促進剤の内少力〈と4.2種を予
め溶融プレシト処理すること罠よって、成形硬化後に通
常行なわれる後硬化が不要であるという大きな利点を有
するので工業生産上極めて有利である。また、従来のも
のに比べ耐湿性が改善されているので絶縁性が良くリー
ク電流を低減させる。
As mentioned above, the epoxy resin composition of the present invention is produced by pre-melting the epoxy resin, curing agent, and curing accelerator (4.2), and by pre-melting the epoxy resin, curing agent, and curing accelerator. This method has the great advantage that it is unnecessary, so it is extremely advantageous in terms of industrial production. In addition, since the moisture resistance is improved compared to conventional products, the insulation properties are good and leakage current is reduced.

本発明エポキシ樹脂組成物を適用する電子部品及び電子
機器としては、%に限定されることなく広い範囲の本の
に使用できるが、例えば集積回路、大規模集積回路、ト
ラシジスター、サイリスタ、づイオード、抵抗器、ガイ
シ、ソケット、ケース、コネクター、バリスター等を挙
げることが出来る。
The epoxy resin composition of the present invention can be applied to a wide range of electronic components and devices without being limited in terms of percentage, but includes, for example, integrated circuits, large-scale integrated circuits, transistors, thyristors, diodes, Examples include resistors, insulators, sockets, cases, connectors, varistors, etc.

また電子用以外にも各種機械部品、各種容器等に適用す
ることが出来る。
In addition to electronic applications, it can also be applied to various mechanical parts, various containers, etc.

以下、実施例及び比較例を挙げて本発明を更にへ体的に
説明する。
Hereinafter, the present invention will be further explained in more detail with reference to Examples and Comparative Examples.

実施例1.2及び比較例I F配糖1表に示す組成のエポキシ樹脂組成物を調整した
。即ち、本発明組成物(実施例1)としては、フレ・ク
ールノボラック型エボ+シ樹脂(日本化薬■製[EOc
NJ )60重量部、臭素化エボ牛ジノボラック樹脂(
日本化薬■製「づレージ」)40重量部及びフェノール
ノボラック樹脂(群栄化学工業■製r&P−120J)
60重量部をスーパーミ十す一に入れ80〜120℃で
溶融混合し、水冷により冷却固化した後、アトマイザ−
により10メツシユ連漕以下に粉砕した。
Example 1.2 and Comparative Example IF Epoxy resin compositions having the compositions shown in Table 1 were prepared. That is, the composition of the present invention (Example 1) was prepared using Flet-Cour Novolak type Evo+C resin (manufactured by Nippon Kayaku ■ [EOc
NJ) 60 parts by weight, brominated evo-cow dinovolac resin (
40 parts by weight of "Zurage" manufactured by Nippon Kayaku ■ and phenol novolac resin (r&P-120J manufactured by Gunei Chemical Industry ■)
60 parts by weight were placed in a super mixer and melted and mixed at 80 to 120°C, solidified by cooling with water, and then placed in an atomizer.
The powder was pulverized to 10 meshes or less.

h記で得た粉末成分と第1表に示すその他の成分全体を
80〜110℃で熱0−ルで溶融混合し、水冷により冷
却固化17た後、アトマイザ−によね粉砕したものを熱
づレス法により成形してテストご−ス(直径50藺、厚
さ3寵の円盤状)を得た。
The powder component obtained in Section h and all the other components shown in Table 1 were melted and mixed at 80 to 110°C at 0°C, cooled and solidified by water cooling, and then ground in an atomizer and heated. A test piece (disk shape with a diameter of 5 mm and a thickness of 3 mm) was obtained by molding by the loess method.

更に、もうl穐の本発明組成物(実施例2)としてフェ
ノールノボラック樹脂60重量部及び2−フェニルイミ
タ・クール0.5重量部を上記と同様に溶融づレンド処
理して得意粉末成分、2−フエ\ ニルイミダリール15重量部及び第1表に示十その他の
成分全体を上記と同様に処理成形してテストピースを得
た。
Furthermore, as another composition of the present invention (Example 2), 60 parts by weight of phenol novolak resin and 0.5 parts by weight of 2-phenylimimita cool were melted and blended in the same manner as above to obtain the desired powder component, 2- A test piece was obtained by processing and molding 15 parts by weight of Fe\nylimidalyl and all the other ingredients shown in Table 1 in the same manner as above.

比較例1として同一組成であるが上記の様か溶融づレシ
ド処理をすることかく同様に成形l−てテストピースを
得た。比較例1においては後硬化を行なったが、実施例
1及び2では後硬化を行なわかかった。
As Comparative Example 1, a test piece having the same composition was obtained by melting and resin treatment as described above and molding in the same manner. In Comparative Example 1, post-curing was performed, but in Examples 1 and 2, post-curing was performed.

次に、実施例1,2及び比較例IKより得た各テストピ
ースの硬度及び耐湿性を調べ九。硬化条件、硬度及び耐
湿性試験結果を併せて第1表に示す。
Next, the hardness and moisture resistance of each test piece obtained from Examples 1 and 2 and Comparative Example IK were examined. The curing conditions, hardness and moisture resistance test results are also shown in Table 1.

米 信越化学工業■製「KBM−4034−a’120
℃、2気圧の条件でづレッシセークツカー試験を行ない
、20OAr後の値を測定した。
"KBM-4034-a'120" manufactured by Shin-Etsu Chemical Co., Ltd.
A loss seeker test was conducted under the conditions of ℃ and 2 atm, and the value after 200Ar was measured.

第1表より、本発明組成物はいずれ本、後硬化が不要で
且つ耐湿性が優れることが判る。
From Table 1, it can be seen that the composition of the present invention does not require post-curing and has excellent moisture resistance.

(以 上)(that's all)

Claims (1)

【特許請求の範囲】 ■(1)  エボ士シ樹脂、 (2)  フェノール樹脂又はこれと酸無水物との混合
物である硬化剤、 (3)  第3級ア三シ類、トリアルノール類及びイ三
タリール類からなる群より選ばれた少なくと411種で
ある硬化促進剤、並びに (4)無機質充填剤 を必須成分として含有する組成物であって、記(1)、
(2)及び(3)の成分の内少なくとも2種は、その使
用量の全部又は一部を予め溶融混合し、次いで冷却後粉
砕した本のであることを特徴とするエポ+シ樹脂組成物
。 ■ 難燃剤を更に配合した特許請求の範囲第1mの組成
物。
[Scope of Claims] ■(1) Eboshi resin, (2) A curing agent which is a phenol resin or a mixture of this and an acid anhydride, (3) Tertiary alkalins, trialnols, and A composition comprising as essential components at least 411 types of curing accelerator selected from the group consisting of tritalyls, and (4) an inorganic filler, the composition comprising:
An epoxy resin composition characterized in that at least two of the components (2) and (3) are melt-mixed in advance, in whole or in part, and then cooled and pulverized. (2) The composition according to claim 1m, which further contains a flame retardant.
JP57082164A 1982-05-14 1982-05-14 Epoxy resin composition Granted JPS58198525A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57082164A JPS58198525A (en) 1982-05-14 1982-05-14 Epoxy resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57082164A JPS58198525A (en) 1982-05-14 1982-05-14 Epoxy resin composition

Publications (2)

Publication Number Publication Date
JPS58198525A true JPS58198525A (en) 1983-11-18
JPS6230215B2 JPS6230215B2 (en) 1987-07-01

Family

ID=13766783

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57082164A Granted JPS58198525A (en) 1982-05-14 1982-05-14 Epoxy resin composition

Country Status (1)

Country Link
JP (1) JPS58198525A (en)

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60190418A (en) * 1984-03-12 1985-09-27 Mitsubishi Electric Corp Liquid epoxy resin composition for sealing semiconductors
JPS61101524A (en) * 1984-10-25 1986-05-20 Toshiba Chem Corp Sealing resin composition
JPS62161820A (en) * 1986-01-10 1987-07-17 Hitachi Chem Co Ltd Epoxy resin composition
JPS6361016A (en) * 1986-08-29 1988-03-17 New Japan Chem Co Ltd Curing agent composition for epoxy resin
JPS63234013A (en) * 1987-03-23 1988-09-29 Tatsuta Electric Wire & Cable Co Ltd Resin composition for semiconductor sealing use
JPH01242616A (en) * 1988-03-23 1989-09-27 Sumitomo Bakelite Co Ltd Epoxy resin composition for sealing semiconductor
JPH01287131A (en) * 1988-03-23 1989-11-17 Sumitomo Bakelite Co Ltd Epoxy resin composition for semiconductor sealing and curing accelerator
JPH04248876A (en) * 1991-01-25 1992-09-04 Somar Corp Epoxy resin composition for powdery coating
EP1184419A3 (en) * 2000-08-24 2003-04-02 Nitto Denko Corporation Resin composition for selaing semiconductor, semiconductor device using the same semiconductor wafer and mounted structure of semiconductor device
WO2005037888A1 (en) * 2003-10-20 2005-04-28 Sumitomo Bakelite Co., Ltd. Epoxy resin composition and semiconductor device
JP2005120289A (en) * 2003-10-20 2005-05-12 Sumitomo Bakelite Co Ltd Epoxy resin composition and semiconductor device
JP2005281582A (en) * 2004-03-30 2005-10-13 Sumitomo Bakelite Co Ltd Epoxy resin composition, and semiconductor device
JP2006143952A (en) * 2004-11-24 2006-06-08 Sumitomo Bakelite Co Ltd Epoxy resin composition and semiconductor device
JP2006176555A (en) * 2004-12-21 2006-07-06 Sumitomo Bakelite Co Ltd Epoxy resin composition and semiconductor device
JP2006182803A (en) * 2004-12-24 2006-07-13 Sumitomo Bakelite Co Ltd Epoxy resin composition and semiconductor device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02208611A (en) * 1989-02-08 1990-08-20 Sumitomo Electric Ind Ltd Nonmetallic optical fiber cable

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49122598A (en) * 1973-03-30 1974-11-22
JPS5328960A (en) * 1976-08-30 1978-03-17 Kubota Ltd Nitration treatment
JPS53111398A (en) * 1977-03-11 1978-09-28 Hitachi Ltd Epoxy resin composition
JPS5454199A (en) * 1977-10-07 1979-04-28 Hitachi Ltd Epoxy resin composition

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49122598A (en) * 1973-03-30 1974-11-22
JPS5328960A (en) * 1976-08-30 1978-03-17 Kubota Ltd Nitration treatment
JPS53111398A (en) * 1977-03-11 1978-09-28 Hitachi Ltd Epoxy resin composition
JPS5454199A (en) * 1977-10-07 1979-04-28 Hitachi Ltd Epoxy resin composition

Cited By (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60190418A (en) * 1984-03-12 1985-09-27 Mitsubishi Electric Corp Liquid epoxy resin composition for sealing semiconductors
JPS61101524A (en) * 1984-10-25 1986-05-20 Toshiba Chem Corp Sealing resin composition
JPS62161820A (en) * 1986-01-10 1987-07-17 Hitachi Chem Co Ltd Epoxy resin composition
JPH0257812B2 (en) * 1986-01-10 1990-12-06 Hitachi Chemical Co Ltd
JPH0521926B2 (en) * 1986-08-29 1993-03-26 Shin Nippon Rika Kk
JPS6361016A (en) * 1986-08-29 1988-03-17 New Japan Chem Co Ltd Curing agent composition for epoxy resin
JPS63234013A (en) * 1987-03-23 1988-09-29 Tatsuta Electric Wire & Cable Co Ltd Resin composition for semiconductor sealing use
JPH01242616A (en) * 1988-03-23 1989-09-27 Sumitomo Bakelite Co Ltd Epoxy resin composition for sealing semiconductor
JPH01287131A (en) * 1988-03-23 1989-11-17 Sumitomo Bakelite Co Ltd Epoxy resin composition for semiconductor sealing and curing accelerator
US5418265A (en) * 1991-01-25 1995-05-23 Somar Corporation Powder epoxy resin coating composition
JPH04248876A (en) * 1991-01-25 1992-09-04 Somar Corp Epoxy resin composition for powdery coating
EP1184419A3 (en) * 2000-08-24 2003-04-02 Nitto Denko Corporation Resin composition for selaing semiconductor, semiconductor device using the same semiconductor wafer and mounted structure of semiconductor device
US7354978B2 (en) 2003-10-20 2008-04-08 Sumitomo Bakelite Co. Semiconductor encapsulant of epoxy resin, phenolic resin and triazole compound
JP2005120289A (en) * 2003-10-20 2005-05-12 Sumitomo Bakelite Co Ltd Epoxy resin composition and semiconductor device
JPWO2005037888A1 (en) * 2003-10-20 2007-11-22 住友ベークライト株式会社 Epoxy resin composition and semiconductor device
WO2005037888A1 (en) * 2003-10-20 2005-04-28 Sumitomo Bakelite Co., Ltd. Epoxy resin composition and semiconductor device
CN100402575C (en) * 2003-10-20 2008-07-16 住友电木株式会社 Epoxy resin composition and semiconductor device
KR101055113B1 (en) 2003-10-20 2011-08-08 스미토모 베이클라이트 가부시키가이샤 Epoxy Resin Compositions and Semiconductor Devices
JP2005281582A (en) * 2004-03-30 2005-10-13 Sumitomo Bakelite Co Ltd Epoxy resin composition, and semiconductor device
JP4581456B2 (en) * 2004-03-30 2010-11-17 住友ベークライト株式会社 Epoxy resin composition and semiconductor device
JP2006143952A (en) * 2004-11-24 2006-06-08 Sumitomo Bakelite Co Ltd Epoxy resin composition and semiconductor device
JP2006176555A (en) * 2004-12-21 2006-07-06 Sumitomo Bakelite Co Ltd Epoxy resin composition and semiconductor device
JP2006182803A (en) * 2004-12-24 2006-07-13 Sumitomo Bakelite Co Ltd Epoxy resin composition and semiconductor device

Also Published As

Publication number Publication date
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