JPS5818949A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS5818949A
JPS5818949A JP56118037A JP11803781A JPS5818949A JP S5818949 A JPS5818949 A JP S5818949A JP 56118037 A JP56118037 A JP 56118037A JP 11803781 A JP11803781 A JP 11803781A JP S5818949 A JPS5818949 A JP S5818949A
Authority
JP
Japan
Prior art keywords
chip
insulating substrate
bumps
tip
bonding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56118037A
Other languages
Japanese (ja)
Inventor
Toyoaki Yamazaki
山崎 豊明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP56118037A priority Critical patent/JPS5818949A/en
Publication of JPS5818949A publication Critical patent/JPS5818949A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/50Tape automated bonding [TAB] connectors, i.e. film carriers; Manufacturing methods related thereto

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Wire Bonding (AREA)

Abstract

PURPOSE:To contrive the reduction of a tip by a method wherein external connection terminals are provided at both the surfaces of an insulating substrate and electrodes of the semiconductor tip are connected. CONSTITUTION:Conductor patterns 2a and leads 2b are formed on an insulating substrate 1 and furthermore, connection terminals 2d for conductor patterns 2c and an IC tip 3 are formed on the rear surface of the insulating substrate 1. Bumps 4a and conductor leads 2b of the external side connection row of the tips 3 and the bumps 4b and conductor patterns 2d of the internal connection row are connected. This electrode arrangement in two rows easily reduced the chip and easily permits the connection when sides disable pad formation exist in four sides.

Description

【発明の詳細な説明】 本発明は半導体集積回路チップ(以下、ICチップとい
う)とそれを接続する為の導体パターン及び導体リード
をもった絶縁基板とを接続した半導体装置に関するもの
である。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a semiconductor device in which a semiconductor integrated circuit chip (hereinafter referred to as an IC chip) is connected to an insulating substrate having a conductive pattern and conductive leads for connecting the semiconductor integrated circuit chip.

通常、ICチップと外部接続端子との接続法は金属細線
を用いたワイヤーボンディング法が主流である。しかし
、この場合、ボンディングに要する時間がボンディング
数にほぼ比例するために多ビン化した場合はそれだけ長
くなるといつ九ことになる。また、ワイヤポジディング
のボンダーの精度等によシ、ICチ、プの電極(以下、
パッドという)のサイズを小さくするにも限界がある。
Usually, the mainstream method for connecting IC chips and external connection terminals is wire bonding using thin metal wires. However, in this case, since the time required for bonding is approximately proportional to the number of bonds, if the number of bins is increased, the time required for bonding becomes nine. In addition, depending on the precision of the wire-positing bonder, etc., the IC chips and electrodes (hereinafter referred to as
There are limits to reducing the size of the pad (also called a pad).

プ・オートメーテツド・ボンディング)であった。(automated bonding).

そこで、TAB方式により製造された半導体装置につい
て説明する0第1riAKII’部構造断面図を示す。
Therefore, a cross-sectional view of the structure of the 0th riAKII' portion is shown to explain a semiconductor device manufactured by the TAB method.

絶縁基板lにはまず必要部分に穴があけられる。次に、
導体箔がラシネートされ、エツチングによって導体パタ
ーン2暑及び導体リード2bが形成される。更にボンデ
ィング性を良くする為にメッキが施されているatた。
First, holes are made in the required portions of the insulating substrate l. next,
The conductor foil is laminated and etched to form a conductor pattern 2 and conductor leads 2b. Furthermore, it is plated to improve bonding properties.

ICテップ3には、従来のワイヤボンディングのパッド
の上に蒸着とメッキによって盛9上げた電極4a<以下
、バンプという)が設けられるOボンディングでは、i
fバンプ4!とリード2bの位置を合わせる。
In O-bonding, the IC chip 3 is provided with an electrode 4a (hereinafter referred to as a bump) which is raised by vapor deposition and plating on the pad of conventional wire bonding.
f bump 4! and the position of lead 2b.

次にリード上方よシ、チップサイズ程度の平板を用いて
、それに付属するヒーターにより加熱しながら、荷重を
加え接続する。その後、ボッティング等により樹脂5で
封入される。
Next, using a flat plate about the size of a chip above the leads, a load is applied and the connection is made while being heated by the attached heater. Thereafter, it is sealed with resin 5 by botting or the like.

この方法によれば、前記のワイヤボンディング法に比べ
、■ボンディング時間が短い。これは、ボンディングを
全ビン一括して行なう為、ビン数が多くなっても変わら
ない。■パッドピッチが小さくなる。これは外部接続端
子のり−ド2bがワイヤーボンディングのパッドピッチ
よりも小さくできるためである。以上の特長は100ピ
ン以上OICチップの場合、チップサイズがポンディン
グパッド数によって決められるといったワイヤーボンデ
ィング法の欠点を解消し、チップサイズを大巾に縮小で
きる。
According to this method, (1) the bonding time is shorter than the wire bonding method described above. This does not change even if the number of bins increases because bonding is performed for all bins at once. ■Pad pitch becomes smaller. This is because the external connection terminal glue 2b can be made smaller than the pad pitch of wire bonding. For OIC chips with 100 pins or more, the above features eliminate the drawbacks of the wire bonding method, such as the fact that the chip size is determined by the number of bonding pads, and can significantly reduce the chip size.

しかし、このような構造では、ICテップ3の接続端子
を片面からのみ取っておfi、ICテ、プ3中のバンプ
41”の配列はチップの周辺部の辺に沿って2列以上取
ることができなかった。このことは、ICテップ3の回
路パターンの縮小化が益々進んだ場合、バンプピッチ及
びリードピッチを小さくすることによってのみ、チップ
の縮小化を計らねばならないことKなる。しかし、バン
プピッチ、リードピッチを小さく取った場合、絶縁基板
1のパターン形成が難かしくなり、走留シが低下して高
価になる。また、リードピッチ、バンプピッチが小さく
なることによって、ボンディング時の位置合わせが難か
しくなシ1作業性が悪くなるといった欠点があった。
However, in such a structure, the connection terminals of the IC chip 3 are taken from only one side, and the bumps 41'' in the IC chip 3 are arranged in two or more rows along the peripheral side of the chip. This means that if the circuit pattern of the IC chip 3 becomes smaller and smaller, the chip will have to be smaller only by reducing the bump pitch and lead pitch.However, If the bump pitch and lead pitch are made small, it becomes difficult to form a pattern on the insulating substrate 1, the running distance decreases, and the cost increases.Also, by making the lead pitch and bump pitch small, the position during bonding becomes difficult. There were drawbacks such as difficulty in alignment and poor workability.

本発明は前記欠点を解消すべく、絶縁基板の両面からI
Cテップとの接続端子を摩り% ICテ。
In order to solve the above-mentioned drawbacks, the present invention provides an I.
Rub the connection terminal with the C-Tep.

プの電極端子をチップ周辺部と更にその内側から小さく
、チップの縮小化を可能とした。
The electrode terminals on the chip are made smaller from the periphery of the chip and further from the inside, making it possible to downsize the chip.

以下1本発明の一実施例を図面とともに説明するO 92図に本発明の一実施例の半導体装置の要部構成断面
図を示す。第1図と同じようにチップ3には蒸着とメッ
キによりバンプ4aと、更にその内側にもバンプ4bが
設けられる。バンプ4 a+ 4 bは同じ構造のもの
で同時に形成される。結縁基板lには第1図と同じよう
に導体パターン2a、  リード2bが設けられ、さら
にそれに加えてその裏面に導体パターン2c、及びIC
テップ3との接続端子2dが前記した第1図の場合と同
様の手順で形成される。
An embodiment of the present invention will be described below with reference to the drawings. Fig. 92 shows a cross-sectional view of the main part configuration of a semiconductor device according to an embodiment of the present invention. As in FIG. 1, the chip 3 is provided with bumps 4a by vapor deposition and plating, and furthermore with bumps 4b inside the bumps 4a. Bumps 4a+4b have the same structure and are formed at the same time. A conductive pattern 2a and a lead 2b are provided on the bonding board l as in FIG. 1, and in addition, a conductive pattern 2c and an IC are provided on the back surface thereof.
The connection terminal 2d with step 3 is formed in the same procedure as in the case of FIG. 1 described above.

実際の組立も前記第1図の場合と同様で、外側の接続列
のバンプ4aと導体リード2b、内側の接続列のバンプ
4bと導体パターン2dは同時にボンディングしても、
また、2段階に分けて行なってもよい。組立が終り友あ
との平面図を第3図に示す。
The actual assembly is the same as in the case of FIG.
Alternatively, the process may be performed in two stages. Figure 3 shows a plan view of the finished assembly.

本発明のような構造にすると、従来、ICチップの電極
はICチップの周辺部に1列に配列されるだけであう九
ものが、更にその内側にも電極を設けることが可能とな
る。このように、1.Cテップの電極が2列に配列でき
ることは、多ビンのものでパッドあるいはバンプに占め
られるチップの周の長さの為、チップサイズが回路パタ
ーンとして使われる領域よりもはるかに大きくなるもの
に対して、チップ縮小化の有効な施策となる0従米、前
記のような多ピンのICチップに対しては、バンプピッ
チ及びリードピッチを小さくするといった方法だけで、
ICチップの縮小化を計っておや。
With the structure of the present invention, conventionally, the electrodes of an IC chip were arranged only in one row around the periphery of the IC chip, but it becomes possible to further provide electrodes inside the IC chip. In this way, 1. The fact that the C-Tep electrodes can be arranged in two rows is useful for multi-bin devices where the chip size is much larger than the area used as a circuit pattern due to the length of the chip circumference occupied by pads or bumps. Therefore, for multi-pin IC chips such as those mentioned above, reducing the bump pitch and lead pitch is an effective measure for reducing the size of the chip.
We are trying to downsize the IC chip.

前記のようにリードピッチを小さくするにも製造上限界
が有るため、チップの縮小化も困難となるが、本発明の
ように電極を2列に並べることにより容易にチップの縮
小化を計ることができる。
As mentioned above, there is a manufacturing limit to reducing the lead pitch, making it difficult to reduce the size of the chip.However, by arranging the electrodes in two rows as in the present invention, it is possible to easily reduce the size of the chip. Can be done.

また、前記のような多ビンのものでなくても、封止形状
あるいは外部配線パターン等の制約により、チップ4辺
の内、パッドの取れない辺がある場合でも、本発明の方
法によれば容易に製造できる。例えば、電子腕時計のよ
うに多機能化に伴う多ビン化と小型薄型化という相反す
る事柄が要求されるものにおいて起こるが、この場合で
も本発明のような構造によれば容易に解消される。
Furthermore, even if the chip does not have a large number of bins as described above, even if there is a side of the chip where pads cannot be removed due to restrictions such as the sealing shape or external wiring pattern, the method of the present invention can be applied. Easy to manufacture. For example, this occurs in products such as electronic wristwatches, which require contradictory requirements such as increasing the number of bins and reducing the size and thickness of the watch due to multi-functionality, but even in this case, the structure of the present invention can easily resolve these issues.

【図面の簡単な説明】[Brief explanation of the drawing]

Claims (1)

【特許請求の範囲】 半導体チップと外部接続端子との接続において。 上記外部接続端子が絶縁基板の両面に有り、これら両面
の端子が上記半導体チップに配置された電極に接続され
ていることを特徴とする半導体装置〇
[Claims] In connection between a semiconductor chip and an external connection terminal. A semiconductor device characterized in that the external connection terminals are provided on both sides of the insulating substrate, and the terminals on both sides are connected to electrodes arranged on the semiconductor chip.
JP56118037A 1981-07-28 1981-07-28 Semiconductor device Pending JPS5818949A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56118037A JPS5818949A (en) 1981-07-28 1981-07-28 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56118037A JPS5818949A (en) 1981-07-28 1981-07-28 Semiconductor device

Publications (1)

Publication Number Publication Date
JPS5818949A true JPS5818949A (en) 1983-02-03

Family

ID=14726479

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56118037A Pending JPS5818949A (en) 1981-07-28 1981-07-28 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS5818949A (en)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61502225A (en) * 1984-03-22 1986-10-02 モステック・コ−ポレイション Impedance matched leads
EP0223699A2 (en) * 1985-11-12 1987-05-27 Fairchild Semiconductor Corporation Signal ground planes for tape bonded devices
JPH01241140A (en) * 1988-03-14 1989-09-26 Internatl Business Mach Corp <Ibm> Tape bonding package
JPH02192747A (en) * 1989-01-20 1990-07-30 Hitachi Cable Ltd Tape carrier for tab
JPH0397241A (en) * 1989-09-11 1991-04-23 Takehide Shirato Semiconductor device
JPH0397238A (en) * 1989-09-11 1991-04-23 Takehide Shirato Semiconductor device
JPH0677294A (en) * 1992-07-13 1994-03-18 Samsung Electron Co Ltd Semiconductor package provided with stacked lead and its bonding method
US5321204A (en) * 1990-10-13 1994-06-14 Gold Star Electron Co., Ltd. Structure of charged coupled device
US5420459A (en) * 1992-12-22 1995-05-30 Kabushiki Kaisha Toshiba Resin encapsulation type semiconductor device having an improved lead configuration
US5442231A (en) * 1991-10-01 1995-08-15 Mitsubishi Denki Kabushiki Kaisha Semiconductor device
EP0755075A2 (en) * 1995-06-29 1997-01-22 Sharp Kabushiki Kaisha A tape carrier package
US5917242A (en) * 1996-05-20 1999-06-29 Micron Technology, Inc. Combination of semiconductor interconnect
CN108064417A (en) * 2015-06-26 2018-05-22 英特尔公司 The encapsulation sub-assembly of insulated wire with aggregation

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61502225A (en) * 1984-03-22 1986-10-02 モステック・コ−ポレイション Impedance matched leads
EP0223699A2 (en) * 1985-11-12 1987-05-27 Fairchild Semiconductor Corporation Signal ground planes for tape bonded devices
JPH01241140A (en) * 1988-03-14 1989-09-26 Internatl Business Mach Corp <Ibm> Tape bonding package
JPH02192747A (en) * 1989-01-20 1990-07-30 Hitachi Cable Ltd Tape carrier for tab
JPH0397241A (en) * 1989-09-11 1991-04-23 Takehide Shirato Semiconductor device
JPH0397238A (en) * 1989-09-11 1991-04-23 Takehide Shirato Semiconductor device
DE4133183B4 (en) * 1990-10-13 2005-07-28 Hynix Semiconductor Inc., Ichon Enclosure design for chip TAB devices, use thereof and methods of assembling same
US5321204A (en) * 1990-10-13 1994-06-14 Gold Star Electron Co., Ltd. Structure of charged coupled device
US5442231A (en) * 1991-10-01 1995-08-15 Mitsubishi Denki Kabushiki Kaisha Semiconductor device
JPH0677294A (en) * 1992-07-13 1994-03-18 Samsung Electron Co Ltd Semiconductor package provided with stacked lead and its bonding method
US5420459A (en) * 1992-12-22 1995-05-30 Kabushiki Kaisha Toshiba Resin encapsulation type semiconductor device having an improved lead configuration
EP0755075A3 (en) * 1995-06-29 1998-12-09 Sharp Kabushiki Kaisha A tape carrier package
EP0755075A2 (en) * 1995-06-29 1997-01-22 Sharp Kabushiki Kaisha A tape carrier package
US5917242A (en) * 1996-05-20 1999-06-29 Micron Technology, Inc. Combination of semiconductor interconnect
US6080264A (en) * 1996-05-20 2000-06-27 Micron Technology, Inc. Combination of semiconductor interconnect
CN108064417A (en) * 2015-06-26 2018-05-22 英特尔公司 The encapsulation sub-assembly of insulated wire with aggregation

Similar Documents

Publication Publication Date Title
JPH11297889A (en) Semiconductor package, mounting board and mounting method by use of them
JPS5818949A (en) Semiconductor device
JPS61117858A (en) Semiconductor device
US5382546A (en) Semiconductor device and method of fabricating same, as well as lead frame used therein and method of fabricating same
JPH03293740A (en) Connecting method for semiconductor device
KR19980063740A (en) Multilayer Leadframe for Molded Packages
KR19980070133A (en) Semiconductor device, mounting apparatus of semiconductor device, and manufacturing method of semiconductor device
JPS63276235A (en) Semiconductor integrated circuit device
JP2652222B2 (en) Substrate for mounting electronic components
JP2822446B2 (en) Hybrid integrated circuit device
JPH1140728A (en) Lead frame and electronic component using the same, and manufacture thereof
JPH11274233A (en) Semiconductor device and producing method therefor
JP2992408B2 (en) IC package and its mounting structure
KR100206941B1 (en) Buttom lead package and its manufacturing method
KR100213435B1 (en) Master electrode pad of semiconductor chip and tap package using it
JP2523209Y2 (en) Hybrid integrated circuit
JPH08250624A (en) Semiconductor device and its manufacture
JPH0214558A (en) Semiconductor integrated circuit device
JPS6143437A (en) Semiconductor device
JPH04322435A (en) Semiconductor device and manufacture thereof
JPS62199022A (en) Mounting means of semiconductor device
JPH06112279A (en) Method of manufacturing semiconductor device
JPS5834953A (en) Semiconductor device
JPS63117437A (en) Semiconductor chip
JP2643898B2 (en) Resin-sealed semiconductor device and method of manufacturing the same