JPS58180024A - 電子ビ−ム露光方法 - Google Patents

電子ビ−ム露光方法

Info

Publication number
JPS58180024A
JPS58180024A JP57063378A JP6337882A JPS58180024A JP S58180024 A JPS58180024 A JP S58180024A JP 57063378 A JP57063378 A JP 57063378A JP 6337882 A JP6337882 A JP 6337882A JP S58180024 A JPS58180024 A JP S58180024A
Authority
JP
Japan
Prior art keywords
data
deflection
conversion circuit
region
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57063378A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0328811B2 (enExample
Inventor
Takayuki Miyazaki
宮崎　隆之
Haruo Tsuchikawa
土川　春穂
Hiroshi Yasuda
洋 安田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP57063378A priority Critical patent/JPS58180024A/ja
Publication of JPS58180024A publication Critical patent/JPS58180024A/ja
Publication of JPH0328811B2 publication Critical patent/JPH0328811B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP57063378A 1982-04-16 1982-04-16 電子ビ−ム露光方法 Granted JPS58180024A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57063378A JPS58180024A (ja) 1982-04-16 1982-04-16 電子ビ−ム露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57063378A JPS58180024A (ja) 1982-04-16 1982-04-16 電子ビ−ム露光方法

Publications (2)

Publication Number Publication Date
JPS58180024A true JPS58180024A (ja) 1983-10-21
JPH0328811B2 JPH0328811B2 (enExample) 1991-04-22

Family

ID=13227568

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57063378A Granted JPS58180024A (ja) 1982-04-16 1982-04-16 電子ビ−ム露光方法

Country Status (1)

Country Link
JP (1) JPS58180024A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017143034A (ja) * 2016-02-12 2017-08-17 東方晶源微電子科技（北京）有限公司 画像取得方法及び電子ビーム検査・測長装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017143034A (ja) * 2016-02-12 2017-08-17 東方晶源微電子科技（北京）有限公司 画像取得方法及び電子ビーム検査・測長装置

Also Published As

Publication number Publication date
JPH0328811B2 (enExample) 1991-04-22

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