JPS5817689A - ジヨセフソン回路の製造方法 - Google Patents
ジヨセフソン回路の製造方法Info
- Publication number
- JPS5817689A JPS5817689A JP56115923A JP11592381A JPS5817689A JP S5817689 A JPS5817689 A JP S5817689A JP 56115923 A JP56115923 A JP 56115923A JP 11592381 A JP11592381 A JP 11592381A JP S5817689 A JPS5817689 A JP S5817689A
- Authority
- JP
- Japan
- Prior art keywords
- film
- thin
- coating film
- etching
- superconducting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0912—Manufacture or treatment of Josephson-effect devices
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56115923A JPS5817689A (ja) | 1981-07-24 | 1981-07-24 | ジヨセフソン回路の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56115923A JPS5817689A (ja) | 1981-07-24 | 1981-07-24 | ジヨセフソン回路の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5817689A true JPS5817689A (ja) | 1983-02-01 |
| JPH0334675B2 JPH0334675B2 (enExample) | 1991-05-23 |
Family
ID=14674542
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56115923A Granted JPS5817689A (ja) | 1981-07-24 | 1981-07-24 | ジヨセフソン回路の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5817689A (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61263181A (ja) * | 1985-05-17 | 1986-11-21 | Agency Of Ind Science & Technol | 超電導線路の形成方法 |
| JPS61271880A (ja) * | 1985-05-27 | 1986-12-02 | Agency Of Ind Science & Technol | 超電導線路の形成方法 |
| US4790696A (en) * | 1987-12-03 | 1988-12-13 | The Stanley Works | Chuck key mounting and ejector arrangement |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54158870A (en) * | 1978-06-06 | 1979-12-15 | Matsushita Electric Ind Co Ltd | Etching method |
| JPS5658247A (en) * | 1979-10-17 | 1981-05-21 | Fujitsu Ltd | Production of semiconductor device |
-
1981
- 1981-07-24 JP JP56115923A patent/JPS5817689A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54158870A (en) * | 1978-06-06 | 1979-12-15 | Matsushita Electric Ind Co Ltd | Etching method |
| JPS5658247A (en) * | 1979-10-17 | 1981-05-21 | Fujitsu Ltd | Production of semiconductor device |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61263181A (ja) * | 1985-05-17 | 1986-11-21 | Agency Of Ind Science & Technol | 超電導線路の形成方法 |
| JPS61271880A (ja) * | 1985-05-27 | 1986-12-02 | Agency Of Ind Science & Technol | 超電導線路の形成方法 |
| US4790696A (en) * | 1987-12-03 | 1988-12-13 | The Stanley Works | Chuck key mounting and ejector arrangement |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0334675B2 (enExample) | 1991-05-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH0354464B2 (enExample) | ||
| US3994758A (en) | Method of manufacturing a semiconductor device having closely spaced electrodes by perpendicular projection | |
| US4266333A (en) | Method of making a Schottky barrier field effect transistor | |
| KR960001595B1 (ko) | 전도층 연결을 위한 단차 영역에서의 제조방법 | |
| JPS5817689A (ja) | ジヨセフソン回路の製造方法 | |
| US4775644A (en) | Zero bird-beak oxide isolation scheme for integrated circuits | |
| JP2570857B2 (ja) | 半導体装置の製造方法 | |
| JPS6154265B2 (enExample) | ||
| JPH0346977B2 (enExample) | ||
| JPS6387741A (ja) | 半導体装置の製造方法 | |
| JPS63273363A (ja) | 半導体装置の製造方法 | |
| JPH04124822A (ja) | 半導体装置の製造方法 | |
| JPS6059742B2 (ja) | 半導体装置およびその製造方法 | |
| JP2924085B2 (ja) | 電極ラインの製造方法 | |
| JPS63244772A (ja) | 半導体装置のコンタクトホ−ル | |
| JP4072248B2 (ja) | 半導体装置の製造方法 | |
| JPS62281356A (ja) | 半導体装置の製造方法 | |
| JPS639952A (ja) | 半導体装置の製造方法 | |
| JPH0212827A (ja) | 半導体装置の製造方法 | |
| JPS6362104B2 (enExample) | ||
| JPH023926A (ja) | 配線の形成方法 | |
| JPS6025277A (ja) | 半導体装置の製造方法 | |
| JPS63205972A (ja) | 超伝導回路装置とその製造方法 | |
| JPS62114239A (ja) | 半導体装置の製造方法 | |
| JPS63289880A (ja) | ジョセフソン接合素子の製造方法 |