JPS58173104A - 放電グラフト重合体膜及びその製造方法 - Google Patents
放電グラフト重合体膜及びその製造方法Info
- Publication number
- JPS58173104A JPS58173104A JP5553282A JP5553282A JPS58173104A JP S58173104 A JPS58173104 A JP S58173104A JP 5553282 A JP5553282 A JP 5553282A JP 5553282 A JP5553282 A JP 5553282A JP S58173104 A JPS58173104 A JP S58173104A
- Authority
- JP
- Japan
- Prior art keywords
- discharge
- polymerization
- substrate
- polymer film
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5553282A JPS58173104A (ja) | 1982-04-05 | 1982-04-05 | 放電グラフト重合体膜及びその製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5553282A JPS58173104A (ja) | 1982-04-05 | 1982-04-05 | 放電グラフト重合体膜及びその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58173104A true JPS58173104A (ja) | 1983-10-12 |
| JPH0329802B2 JPH0329802B2 (OSRAM) | 1991-04-25 |
Family
ID=13001333
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5553282A Granted JPS58173104A (ja) | 1982-04-05 | 1982-04-05 | 放電グラフト重合体膜及びその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58173104A (OSRAM) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0195115A (ja) * | 1987-10-07 | 1989-04-13 | Terumo Corp | 紫外線吸収高分子材料 |
-
1982
- 1982-04-05 JP JP5553282A patent/JPS58173104A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0195115A (ja) * | 1987-10-07 | 1989-04-13 | Terumo Corp | 紫外線吸収高分子材料 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0329802B2 (OSRAM) | 1991-04-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0067066B1 (en) | Dry-developing resist composition | |
| US4789622A (en) | Production of resist images, and a suitable dry film resist | |
| US4560641A (en) | Method for forming fine multilayer resist patterns | |
| WO1985005470A1 (en) | Bilevel resist | |
| WO1980001978A1 (en) | Solid state devices by differential plasma etching of resists | |
| US4489146A (en) | Reverse process for making chromium masks using silicon dioxide dry etch mask | |
| JP2850834B2 (ja) | 非晶質炭素膜の製造方法及び半導体装置 | |
| JPS58173104A (ja) | 放電グラフト重合体膜及びその製造方法 | |
| JPS5835527B2 (ja) | 電子官能性樹脂 | |
| JPS59125730A (ja) | ポジ型レジスト組成物 | |
| JPS58207041A (ja) | 放射線感応性高分子レジスト | |
| US4278754A (en) | Resists and method of manufacturing semiconductor elements by using the same | |
| TW554429B (en) | Resist pattern hardening method | |
| JPS6376438A (ja) | パタ−ン形成方法 | |
| JPS5953841A (ja) | パタ−ン形成方法 | |
| JPS6377050A (ja) | 三層レジスト用中間層材料およびパタ−ン形成方法 | |
| JPS5886726A (ja) | パタ−ン形成法 | |
| JPS6360898B2 (OSRAM) | ||
| JPH0328852A (ja) | 感光性樹脂組成物およびこれを用いたパターン形成方法 | |
| JPS6363564B2 (OSRAM) | ||
| US4954424A (en) | Pattern fabrication by radiation-induced graft copolymerization | |
| JPS58107535A (ja) | ネガ型レジスト膜の形成方法 | |
| Kiyohara et al. | Nanopatterning of diamond films with composite oxide mask of metal octylates in electron beam lithography | |
| JP3279822B2 (ja) | パターン形成方法 | |
| JPH07209863A (ja) | パターン形成方法 |