JPS58164222A - 加熱処理装置 - Google Patents

加熱処理装置

Info

Publication number
JPS58164222A
JPS58164222A JP4821882A JP4821882A JPS58164222A JP S58164222 A JPS58164222 A JP S58164222A JP 4821882 A JP4821882 A JP 4821882A JP 4821882 A JP4821882 A JP 4821882A JP S58164222 A JPS58164222 A JP S58164222A
Authority
JP
Japan
Prior art keywords
top plate
processing container
plate
heating
supporting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4821882A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0381295B2 (enrdf_load_stackoverflow
Inventor
Yuichiro Yamada
雄一郎 山田
Shinichi Mizuguchi
水口　信一
Hirozo Shima
島　博三
Junichi Nozaki
野崎　順一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP4821882A priority Critical patent/JPS58164222A/ja
Publication of JPS58164222A publication Critical patent/JPS58164222A/ja
Publication of JPH0381295B2 publication Critical patent/JPH0381295B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation by radiant heating of the substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrodes Of Semiconductors (AREA)
JP4821882A 1982-03-25 1982-03-25 加熱処理装置 Granted JPS58164222A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4821882A JPS58164222A (ja) 1982-03-25 1982-03-25 加熱処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4821882A JPS58164222A (ja) 1982-03-25 1982-03-25 加熱処理装置

Publications (2)

Publication Number Publication Date
JPS58164222A true JPS58164222A (ja) 1983-09-29
JPH0381295B2 JPH0381295B2 (enrdf_load_stackoverflow) 1991-12-27

Family

ID=12797268

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4821882A Granted JPS58164222A (ja) 1982-03-25 1982-03-25 加熱処理装置

Country Status (1)

Country Link
JP (1) JPS58164222A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0237744A (ja) * 1988-07-27 1990-02-07 Tokyo Electron Ltd 搬送装置
JPH0771601A (ja) * 1992-12-14 1995-03-17 Trw United Carr Gmbh & Co Kg 閉鎖蓋
US5445675A (en) * 1992-07-09 1995-08-29 Tel-Varian Limited Semiconductor processing apparatus
JP2755369B2 (ja) * 1992-02-25 1998-05-20 エージー．アソシェーツ、インコーポレイテッド 放射加熱された冷壁リアクタにおける減圧下での半導体材料の気相ドーピング
WO2020100376A1 (ja) * 2018-11-14 2020-05-22 株式会社アルバック 真空加熱装置、リフレクタ装置

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0237744A (ja) * 1988-07-27 1990-02-07 Tokyo Electron Ltd 搬送装置
JP2755369B2 (ja) * 1992-02-25 1998-05-20 エージー．アソシェーツ、インコーポレイテッド 放射加熱された冷壁リアクタにおける減圧下での半導体材料の気相ドーピング
US5445675A (en) * 1992-07-09 1995-08-29 Tel-Varian Limited Semiconductor processing apparatus
JPH0771601A (ja) * 1992-12-14 1995-03-17 Trw United Carr Gmbh & Co Kg 閉鎖蓋
WO2020100376A1 (ja) * 2018-11-14 2020-05-22 株式会社アルバック 真空加熱装置、リフレクタ装置
JPWO2020100376A1 (ja) * 2018-11-14 2021-06-10 株式会社アルバック 真空加熱装置、リフレクタ装置
TWI749366B (zh) * 2018-11-14 2021-12-11 日商愛發科股份有限公司 真空加熱裝置、反射器裝置

Also Published As

Publication number Publication date
JPH0381295B2 (enrdf_load_stackoverflow) 1991-12-27

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