JPS58137830A - 裏焼き用画像形成材料 - Google Patents

裏焼き用画像形成材料

Info

Publication number
JPS58137830A
JPS58137830A JP57018821A JP1882182A JPS58137830A JP S58137830 A JPS58137830 A JP S58137830A JP 57018821 A JP57018821 A JP 57018821A JP 1882182 A JP1882182 A JP 1882182A JP S58137830 A JPS58137830 A JP S58137830A
Authority
JP
Japan
Prior art keywords
layer
optical density
self
alkali
dye
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57018821A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0229206B2 (cg-RX-API-DMAC7.html
Inventor
Kotaro Nagasawa
長澤　孝太郎
Kunio Morikubo
森久保　邦男
Masaaki Kawakami
川上　政昭
Tsuyoshi Matsuda
強 松田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Somar Corp
Original Assignee
Somar Corp
Somar Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Somar Corp, Somar Manufacturing Co Ltd filed Critical Somar Corp
Priority to JP57018821A priority Critical patent/JPS58137830A/ja
Publication of JPS58137830A publication Critical patent/JPS58137830A/ja
Publication of JPH0229206B2 publication Critical patent/JPH0229206B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP57018821A 1982-02-10 1982-02-10 裏焼き用画像形成材料 Granted JPS58137830A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57018821A JPS58137830A (ja) 1982-02-10 1982-02-10 裏焼き用画像形成材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57018821A JPS58137830A (ja) 1982-02-10 1982-02-10 裏焼き用画像形成材料

Publications (2)

Publication Number Publication Date
JPS58137830A true JPS58137830A (ja) 1983-08-16
JPH0229206B2 JPH0229206B2 (cg-RX-API-DMAC7.html) 1990-06-28

Family

ID=11982223

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57018821A Granted JPS58137830A (ja) 1982-02-10 1982-02-10 裏焼き用画像形成材料

Country Status (1)

Country Link
JP (1) JPS58137830A (cg-RX-API-DMAC7.html)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5710136A (en) * 1980-06-21 1982-01-19 Somar Corp Photosensitive image forming material

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5710136A (en) * 1980-06-21 1982-01-19 Somar Corp Photosensitive image forming material

Also Published As

Publication number Publication date
JPH0229206B2 (cg-RX-API-DMAC7.html) 1990-06-28

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