JPS58128734A - 粗微動回転ステ−ジとこれを使用したアライメント方法 - Google Patents

粗微動回転ステ−ジとこれを使用したアライメント方法

Info

Publication number
JPS58128734A
JPS58128734A JP57010004A JP1000482A JPS58128734A JP S58128734 A JPS58128734 A JP S58128734A JP 57010004 A JP57010004 A JP 57010004A JP 1000482 A JP1000482 A JP 1000482A JP S58128734 A JPS58128734 A JP S58128734A
Authority
JP
Japan
Prior art keywords
rotation
stage
wafer
alignment
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57010004A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6255293B2 (enrdf_load_stackoverflow
Inventor
Yoshihiro Yoneyama
米山　義弘
Motoya Taniguchi
素也 谷口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP57010004A priority Critical patent/JPS58128734A/ja
Publication of JPS58128734A publication Critical patent/JPS58128734A/ja
Publication of JPS6255293B2 publication Critical patent/JPS6255293B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Details Of Measuring And Other Instruments (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP57010004A 1982-01-27 1982-01-27 粗微動回転ステ−ジとこれを使用したアライメント方法 Granted JPS58128734A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57010004A JPS58128734A (ja) 1982-01-27 1982-01-27 粗微動回転ステ−ジとこれを使用したアライメント方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57010004A JPS58128734A (ja) 1982-01-27 1982-01-27 粗微動回転ステ−ジとこれを使用したアライメント方法

Publications (2)

Publication Number Publication Date
JPS58128734A true JPS58128734A (ja) 1983-08-01
JPS6255293B2 JPS6255293B2 (enrdf_load_stackoverflow) 1987-11-19

Family

ID=11738264

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57010004A Granted JPS58128734A (ja) 1982-01-27 1982-01-27 粗微動回転ステ−ジとこれを使用したアライメント方法

Country Status (1)

Country Link
JP (1) JPS58128734A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS6255293B2 (enrdf_load_stackoverflow) 1987-11-19

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