JPS58127924A - 画像の形成方法 - Google Patents

画像の形成方法

Info

Publication number
JPS58127924A
JPS58127924A JP997082A JP997082A JPS58127924A JP S58127924 A JPS58127924 A JP S58127924A JP 997082 A JP997082 A JP 997082A JP 997082 A JP997082 A JP 997082A JP S58127924 A JPS58127924 A JP S58127924A
Authority
JP
Japan
Prior art keywords
group
weight
film
formula
amine compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP997082A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0526185B2 (cs
Inventor
Kazunari Takemoto
一成 竹元
Fumio Kataoka
文雄 片岡
Fusaji Shoji
房次 庄子
Mitsumasa Kojima
児嶋　充雅
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Hitachi Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP997082A priority Critical patent/JPS58127924A/ja
Publication of JPS58127924A publication Critical patent/JPS58127924A/ja
Publication of JPH0526185B2 publication Critical patent/JPH0526185B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP997082A 1982-01-27 1982-01-27 画像の形成方法 Granted JPS58127924A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP997082A JPS58127924A (ja) 1982-01-27 1982-01-27 画像の形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP997082A JPS58127924A (ja) 1982-01-27 1982-01-27 画像の形成方法

Publications (2)

Publication Number Publication Date
JPS58127924A true JPS58127924A (ja) 1983-07-30
JPH0526185B2 JPH0526185B2 (cs) 1993-04-15

Family

ID=11734774

Family Applications (1)

Application Number Title Priority Date Filing Date
JP997082A Granted JPS58127924A (ja) 1982-01-27 1982-01-27 画像の形成方法

Country Status (1)

Country Link
JP (1) JPS58127924A (cs)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6423252A (en) * 1987-07-20 1989-01-25 Ube Industries Photosensitive polyimide composition

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6423252A (en) * 1987-07-20 1989-01-25 Ube Industries Photosensitive polyimide composition

Also Published As

Publication number Publication date
JPH0526185B2 (cs) 1993-04-15

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