JPS58120861A - Low temperature plasma treating apparatus of fiber product - Google Patents

Low temperature plasma treating apparatus of fiber product

Info

Publication number
JPS58120861A
JPS58120861A JP81782A JP81782A JPS58120861A JP S58120861 A JPS58120861 A JP S58120861A JP 81782 A JP81782 A JP 81782A JP 81782 A JP81782 A JP 81782A JP S58120861 A JPS58120861 A JP S58120861A
Authority
JP
Japan
Prior art keywords
reactor
temperature plasma
gas
pair
fabric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP81782A
Other languages
Japanese (ja)
Other versions
JPS6011149B2 (en
Inventor
山東 美一
後藤 徳樹
逸雄 田中
石徹白 博司
南方 松夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sando Iron Works Co Ltd
Unitika Ltd
Original Assignee
Sando Iron Works Co Ltd
Unitika Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sando Iron Works Co Ltd, Unitika Ltd filed Critical Sando Iron Works Co Ltd
Priority to JP57000817A priority Critical patent/JPS6011149B2/en
Priority to US06/452,101 priority patent/US4466258A/en
Priority to DE19823248590 priority patent/DE3248590A1/en
Priority to DE19833300095 priority patent/DE3300095A1/en
Publication of JPS58120861A publication Critical patent/JPS58120861A/en
Priority to US06/583,002 priority patent/US4550578A/en
Publication of JPS6011149B2 publication Critical patent/JPS6011149B2/en
Expired legal-status Critical Current

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  • Treatment Of Fiber Materials (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 を低温プラズマ処理するために有利な装置に関するもの
である。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an apparatus advantageous for low temperature plasma processing.

従来工業的に織物、編物など布帛を連続的に処理する工
程は、染色前の工程では、布帛に付着している撥水性夾
雑物を除去、あるいは親水化し布帛に染料液が容易に浸
透せI〜めるための精練工程および染色後柔軟、撥水、
静電防止、防汚吸水などの特性を付与する仕上工程があ
るが、いずれの工程も水系で処理を行っていた。
Conventionally, in the industrial process of continuously processing fabrics such as woven and knitted fabrics, the process before dyeing involves removing water-repellent impurities adhering to the fabric or making it hydrophilic so that the dye solution can easily penetrate into the fabric. - Softness, water repellency, and scouring process after dyeing
There is a finishing process that imparts properties such as anti-static, anti-fouling and water-absorbing properties, but all of these processes are water-based.

たとえば精練工程では、木綿を含む布帛の場合カセイソ
ーダ、ソーダ灰などのアルカリと、精練助剤を付与し、
100℃前後で20分以上スチーミングあるいは、アル
カリ、精練助剤を含む水溶液で煮沸して、撥水性夾雑物
を水溶化せしめ次いで処理布帛に付着している薬剤およ
び可溶化された夾雑物等の付着物を除去するための手段
として水洗を繰シ返し行い更には、水洗後乾燥する工程
が必要であった。また仕上工程においては、水に溶解あ
るいは分散させた仕上加工剤を付与した後乾燥機を通し
て水分を蒸発除去させる工程が必要であり、加工目的に
よってはさらに高温熱処理により仕上剤を反応固着せし
める工程が必要でちった。
For example, in the scouring process, for fabrics containing cotton, alkalis such as caustic soda and soda ash and scouring aids are added.
Steaming at around 100℃ for 20 minutes or more or boiling in an aqueous solution containing an alkali and scouring aid to solubilize water-repellent impurities, and then remove chemicals and solubilized impurities adhering to the treated fabric. As a means to remove deposits, it was necessary to repeatedly wash with water and further to dry after washing with water. In addition, in the finishing process, it is necessary to apply a finishing agent dissolved or dispersed in water and then pass it through a dryer to evaporate the water, and depending on the purpose of processing, there may be an additional step of reacting and fixing the finishing agent through high-temperature heat treatment. It was necessary.

ところがか\る処理手段では、処理用の薬剤がコスト高
になること、薬剤を布帛に反応せしめるために多量の熱
量を必要とすること、さらには精練工程の場合反応処理
された布帛に含まれる残液、ちるいは夾雑物及び又は付
着物を除去せしめるための多数の水洗機、及びこれらの
各水洗機内に供給すべき多量の水資源が必要であること
、更に水洗された排液を廃棄処理するための装置が必要
である等のことから、布帛を前処理するには多値の水資
dη、熱エネルギーを費しているのが現状である。更に
は水洗機より排出される廃液中には必然的にも薬剤が含
まれることから、排液公害等の問題も生じ該廃液の処理
にも多大なる設備費、人件費等が嵩んでいるもので、特
に繊維加工業会においては経済性に欠けるものであった
However, with such treatment means, the cost of the treatment chemicals is high, a large amount of heat is required to cause the chemicals to react with the fabric, and furthermore, in the case of the scouring process, the chemicals contained in the reaction-treated fabric are A large number of washing machines are required to remove residual liquid, dirt, impurities, and/or deposits, and a large amount of water resources are required to be supplied to each of these washing machines, and the washed waste liquid is disposed of. At present, multi-valued water resources dη and thermal energy are used to pre-treat fabrics because a treatment device is required. Furthermore, since the waste liquid discharged from washing machines inevitably contains chemicals, problems such as waste liquid pollution arise, and the treatment of the waste liquid also requires large equipment costs, personnel costs, etc. Therefore, it lacked economic efficiency, especially for the textile processing industry.

本発明はかかることから鑑みてなされたもので、熱エネ
ルギー、水資源を殆んど使用することなく、低温プラズ
マを使用して布帛等の繊維製品の両面を均一に処理する
ことができる繊維製品の処理装置を提供することを目的
とするものである。
The present invention has been made in view of the above, and provides a textile product that can uniformly process both sides of textile products such as fabric using low-temperature plasma without using almost any thermal energy or water resources. The purpose of the present invention is to provide a processing device for the following.

以下に本発明を図面に示す実施例に基いて詳細に説明す
る。
The present invention will be explained in detail below based on embodiments shown in the drawings.

゛第1図において工は反応器であって、この反応器1に
は、処理すべき布帛2を出入れするための開口部3,4
が設けられており、更にこれらの開口部3,4は蓋5に
よって密閉されるようになっている。6及び7は反応器
1内において、開口部3及び4の近傍に配置した布帛巻
取り軸であって、該双方の巻取り軸6,7はモータ等の
駆動機構(図示せず)によりいずれか一方の巻取シ軸に
巻取られている布帛は、他方の巻取り軸に巻取られるか
、双方の巻取り軸が間歇的に正逆回転して、一方の巻取
り軸6に布帛が巻取られた後は、他方の巻取シ軸7が反
転して該巻取り軸7への巻取りがなされ、この巻取り軸
7による巻取りが完了すれば、巻取シ軸6が反転してこ
の巻取力軸6への巻取りに切替えられるようになってい
る。8及び9と、8′及び9′は、双方の巻取シ軸6と
7との間で張設されている布帛2を境に、上下に隔設さ
れた二対の電極板であって、この一方の電極板8及び8
′には反応器1外に設備された発振器(図示せず)から
の高周波が供給されるものであり、他方の電極板9及び
9′はアースされているものであるが、正負一対の電極
板8及び9に対して、隣設される正負一対の電極板8′
及び9′は、その上下が逆になっている。またこれらの
電極板8.8′及び9゜9′は、例えば金網あるいは多
孔性の金属板となしてガスの分散と分布が電極板の全面
に亘って均一となすことが要求される。なぜならば、電
極板の全面より略均−な低温プラズマが発生できるよう
にすることでアシ、またその金属板の全面近傍に高周波
によって励起されたガスを略均−に漂わせるためである
。10及び10′は電極板8及び8′の全面に向けてガ
スを吹き出すためのガスノズル、11及び11′は対の
電極板を挾んでガスノズル10(5) 及び10′に対設されている吸気ダクトである。従って
第1番目の電極板8,9及びガスノズル1o、吸気ダク
ト11の上下位置に対して、第2番目の電極板s1.9
/及びガスノズル10’、吸気ダクト11′の上下位置
は布帛2を境として逆に設置されているものである。1
2は電極板8の周囲に設けられている囲いであってこの
囲い12によって、電極板8,8′と9.9′によって
発生する低温プラズマの飛散を阻止し、その励起ガスを
効率よく布帛へ作用せしめるようにしたものである。
゛In Fig. 1, the device is a reactor, and this reactor 1 has openings 3 and 4 through which the fabric 2 to be treated is taken in and taken out.
Further, these openings 3 and 4 are sealed with a lid 5. 6 and 7 are fabric winding shafts arranged near the openings 3 and 4 in the reactor 1, and both winding shafts 6 and 7 are driven by a drive mechanism (not shown) such as a motor. The fabric being wound on one winding shaft 6 may be wound on the other winding shaft, or both winding shafts may be intermittently rotated in forward and reverse directions so that the fabric is wound on one winding shaft 6. After the winding shaft 7 is wound, the other winding shaft 7 is reversed and the winding is performed on the winding shaft 7. When the winding by this winding shaft 7 is completed, the winding shaft 6 is The winding force can be reversed and the winding can be switched to the winding force shaft 6. 8 and 9 and 8' and 9' are two pairs of electrode plates vertically spaced apart from each other with the fabric 2 stretched between both winding shafts 6 and 7 as the border. , this one electrode plate 8 and 8
' is supplied with high frequency from an oscillator (not shown) installed outside the reactor 1, and the other electrode plates 9 and 9' are grounded, and a pair of positive and negative electrodes A pair of positive and negative electrode plates 8' are provided adjacent to the plates 8 and 9.
and 9' are upside down. Further, these electrode plates 8, 8' and 9° 9' are required to be made of, for example, a wire mesh or a porous metal plate so that the dispersion and distribution of gas is uniform over the entire surface of the electrode plates. This is because by generating a substantially uniform low-temperature plasma over the entire surface of the electrode plate, the gas excited by the high frequency can be caused to float approximately evenly over the reeds and near the entire surface of the metal plate. 10 and 10' are gas nozzles for blowing out gas toward the entire surface of the electrode plates 8 and 8', and 11 and 11' are intake ports that are arranged opposite to the gas nozzles 10 (5) and 10' with the pair of electrode plates in between. It's a duct. Therefore, with respect to the vertical position of the first electrode plates 8, 9, gas nozzle 1o, and intake duct 11, the second electrode plate s1.9
The vertical positions of the gas nozzle 10' and the intake duct 11' are reversed with the fabric 2 as the boundary. 1
Reference numeral 2 denotes an enclosure provided around the electrode plate 8, and this enclosure 12 prevents the scattering of the low-temperature plasma generated by the electrode plates 8, 8' and 9.9', and efficiently transfers the excited gas to the fabric. It is designed to have an effect on

以上が本実施例の構成であるが次にその作用について述
べると、先ず、長尺布帛2が巻取られている巻取り軸6
又は7を反応器1内にセットし、その布帛の先端を他方
の巻取軸7又は6に掛け、その他方の巻取シ軸に布帛2
を巻替えることができるように準備し、更に蓋5を閉め
て反応器1を密閉する。次に吸気ダクト11及び11′
に接続される真空ボンf(図示せず)を駆動し、またガ
スノズル10及び10′よりガスを供給して反応器1内
の真空度を0.1〜10 Torr望ましくは0.5〜
2(6) TorrKH整保持せしめ、そこで高周波電源よシ高周
波例えば13.56 MHzを電極板に給電して低温プ
ラズマを発生させる。次いで巻取り軸を駆動して布帛2
を両電極板間、即ち低温ゾラズマ雰囲気中を移行させる
。かくして繊維品を低温プラズマ雰囲気中に移行せしめ
るとき低温プラズマ気体粒子が布帛20表裏両面より線
維間に透過し、布帛の内芯部にまで低温ノラズマが作用
することにより、精練工程の場合該布帛2の両面及び内
芯部に含まれている夾雑物及び繊維に付与されている糊
剤の一部は、分解し又一部は親水化されて、水に容易に
溶解する様になる。尚」=記の低温プラズマを発生させ
るための処理条件として例えば、出力、ガスの種類、ガ
ス流量、処理時間等は処理すべき布帛の質及び処理目的
に応じて適宜選択することができる。
The above is the configuration of this embodiment. Next, the operation will be described. First, the winding shaft 6 on which the long fabric 2 is wound.
Or 7 is set in the reactor 1, the tip of the fabric is hung on the other winding shaft 7 or 6, and the fabric 2 is placed on the other winding shaft.
The reactor 1 is sealed by closing the lid 5. Next, the intake ducts 11 and 11'
The degree of vacuum in the reactor 1 is maintained at 0.1 to 10 Torr, preferably 0.5 to 10 Torr, by driving a vacuum bomb f (not shown) connected to the reactor 1 and supplying gas from gas nozzles 10 and 10'.
2(6) The TorrKH is kept constant, and then a high frequency wave, for example 13.56 MHz, is supplied to the electrode plate from a high frequency power source to generate low temperature plasma. Next, the winding shaft is driven to remove the fabric 2.
is transferred between both electrode plates, that is, in a low-temperature Zolazma atmosphere. In this way, when the textile is transferred into a low-temperature plasma atmosphere, the low-temperature plasma gas particles permeate between the fibers from both the front and back surfaces of the fabric 20, and the low-temperature nolasma acts even on the inner core of the fabric. Some of the impurities contained in both surfaces and the inner core of the fiber and the sizing agent applied to the fibers are decomposed and some of them become hydrophilic and become easily soluble in water. As the processing conditions for generating the low-temperature plasma, for example, power, gas type, gas flow rate, processing time, etc., can be appropriately selected depending on the quality of the fabric to be processed and the processing purpose.

上記実施例は、反応器1はパッチ型であったが、例えば
第2図に示す如く、反応器1′を布帛2の連続的通過を
許しながらも内部を真空に保つことのできるシール機構
13及び14を具備せしめた反応器を使用して、繊維製
品の両面プラズマ処理を連続的に行なうようにすること
も可能である。
In the above embodiment, the reactor 1 was of a patch type, but as shown in FIG. It is also possible to carry out double-sided plasma treatment of textile products continuously using a reactor equipped with and 14.

以上のように本発明は内部を真空に保持できる反応器と
、この反応器内で移行される繊維製品の移送路を挾んで
対向される第1の電極対と、この第1のFfll極対に
対して繊維製品の移送路方向へ隣設された第2の電極対
と、前記第1の電極対を挾むようにして対向され、その
電極対に向けてガスヲ噴射する第1のガスノズル及び該
ガス/ 、e ルに対向される第1の吸気ダクトと、前
記第1のガスノズルに対して繊維製品の移送方向に隣設
された第2の吸気ダクト及びこの第2の吸気ダクトに対
して移送路を挾んで対向される第2のガスノズルと、前
記反応器内を真空に保持せしめるためのパキーーム機構
と、反応器内にガスを供給するためのガス供給手段と、
上記双方の電極対間で低温ノラズマを発生せしめるため
の給電手段を具備せしめている繊維製品の低温プラズマ
処理装置であるから、この装置によれば、処理すべき布
帛等の繊維製品の両面よシその内芯部にまで低温プラズ
マが作用し、これによって布帛の表裏全面に亘って、し
かもその内芯部にまで効果的なプラズマ処理ができる効
果がある。更に本発明によれば、繊維製品への低温プラ
ズマ雰囲気での処理によシ、熱エネルギー、水資源、あ
るいは薬液を従来法と比べ極めて少ない量で種々の処理
が可能であることから繊維製品の処理が経済的にしかも
廃液公害を招くことなく迅速になされる効果もある。
As described above, the present invention includes a reactor that can maintain a vacuum inside, a first electrode pair that faces each other across a transfer path for textile products to be transferred within this reactor, and this first Ffll electrode pair. a second pair of electrodes adjacent to each other in the direction of the transport path of the textile product; a first gas nozzle that faces the first pair of electrodes and injects gas toward the pair of electrodes; , e, a first intake duct facing the first gas nozzle, a second intake duct adjacent to the first gas nozzle in the textile product transfer direction, and a transfer path for the second intake duct. a second gas nozzle sandwiched and opposed to each other, a paqueem mechanism for maintaining the inside of the reactor in vacuum, and a gas supply means for supplying gas into the reactor;
This apparatus is a low-temperature plasma processing apparatus for textile products that is equipped with a power supply means for generating low-temperature nolasma between both pairs of electrodes. The low-temperature plasma acts even on the inner core, thereby providing an effect that effective plasma treatment can be performed over the entire front and back surfaces of the fabric, and even on the inner core. Furthermore, according to the present invention, various treatments can be performed on textile products in a low-temperature plasma atmosphere using extremely small amounts of thermal energy, water resources, or chemical solutions compared to conventional methods. Another advantage is that the treatment can be carried out economically and quickly without causing waste liquid pollution.

【図面の簡単な説明】 図面はいずれも本発明よりなる低温プラズマ処理装置の
実施例を示し第1図はその第1実施例を示した説明図、
第2図はその第2実施例を示した説明図である。 1.1′・・・反応器   2・・・布帛3.4 ・開
口部   5・・蓋 6.7 ・布帛巻取り軸8.9・・・電極板10.10
’  ・・ガスノズル 11.11’  ・・吸気ダク
ト12  ・・[」い      13  ・・・導入
側シール機構14  ・・・導出側シール機構 (9) 第 1 図
[BRIEF DESCRIPTION OF THE DRAWINGS] The drawings all show embodiments of the low-temperature plasma processing apparatus according to the present invention, and FIG. 1 is an explanatory diagram showing the first embodiment.
FIG. 2 is an explanatory diagram showing the second embodiment. 1.1'...Reactor 2...Fabric 3.4 - Opening 5... Lid 6.7 - Fabric winding shaft 8.9... Electrode plate 10.10
'...Gas nozzle 11.11'...Intake duct 12... [''13...Inlet side seal mechanism 14...Outlet side seal mechanism (9) Fig. 1

Claims (1)

【特許請求の範囲】[Claims] 内部を真空に保持できる反応器と、この反応器内で移行
される繊維製品の移送路を挾んで対向される第1の電極
対と、この第1の電極対に対して繊維製品の移送路方向
へ隣設された第2の電極対と、前記第1の電極対を挾む
ようにして対向され、その電極対に向けてガスを噴射す
る第1のガスノズル及び該がスノズルに対向される第1
の吸気ダクトと、前記第1のガスノズルに対して繊維製
品の移送方向に隣設された第2の吸気ダクト及びこの第
2の吸気ダクトに対して移送路を挾んで対向される第2
のガスノズルと、前記反応器内を真空に保持せしめるた
めのパキーーム機構と、反応器内にガスを供給するため
のガス供給手段と、上記双方の電極対間で低温プラズマ
を発生せしめるための給電手段を具備せしめていること
を特徴とする繊維製品の低温プラズマ処理装置。
A reactor that can maintain a vacuum inside, a first pair of electrodes facing each other across a transfer path for textile products to be transferred in the reactor, and a transfer path for textile products to be connected to the first electrode pair. a second pair of electrodes adjacent to each other in the direction; a first gas nozzle that faces the first pair of electrodes and injects gas toward the pair of electrodes;
an intake duct, a second intake duct adjacent to the first gas nozzle in the textile product transfer direction, and a second intake duct opposite the second intake duct with a transfer path in between.
a gas nozzle, a pachyme mechanism for maintaining the inside of the reactor in vacuum, a gas supply means for supplying gas into the reactor, and a power supply means for generating low-temperature plasma between both pairs of electrodes. A low-temperature plasma processing apparatus for textile products, characterized by comprising:
JP57000817A 1982-01-06 1982-01-06 Low temperature plasma treatment equipment for textile products Expired JPS6011149B2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP57000817A JPS6011149B2 (en) 1982-01-06 1982-01-06 Low temperature plasma treatment equipment for textile products
US06/452,101 US4466258A (en) 1982-01-06 1982-12-22 Apparatus for low-temperature plasma treatment of a textile product
DE19823248590 DE3248590A1 (en) 1982-01-06 1982-12-30 METHOD AND DEVICE FOR LOW-TEMPERATURE PLASMA TREATMENT OF A TEXTILE
DE19833300095 DE3300095A1 (en) 1982-01-06 1983-01-04 Installation for the continuous treatment of textile products with the aid of low-temperature plasma
US06/583,002 US4550578A (en) 1982-01-06 1984-02-23 Apparatus for low-temperature plasma treatment of a textile product

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57000817A JPS6011149B2 (en) 1982-01-06 1982-01-06 Low temperature plasma treatment equipment for textile products

Publications (2)

Publication Number Publication Date
JPS58120861A true JPS58120861A (en) 1983-07-18
JPS6011149B2 JPS6011149B2 (en) 1985-03-23

Family

ID=11484220

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57000817A Expired JPS6011149B2 (en) 1982-01-06 1982-01-06 Low temperature plasma treatment equipment for textile products

Country Status (1)

Country Link
JP (1) JPS6011149B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1121482A1 (en) * 1999-08-12 2001-08-08 Raytheon Company Removing soil from fabric using an ionized flow of pressurized gas

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5298064A (en) * 1976-02-13 1977-08-17 Toray Industries Method of modification of surface condition and treating apparatus thereof
JPS5480373A (en) * 1977-12-08 1979-06-27 Toray Ind Inc Method of treating high-polymer resin with electrical discharge

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5298064A (en) * 1976-02-13 1977-08-17 Toray Industries Method of modification of surface condition and treating apparatus thereof
JPS5480373A (en) * 1977-12-08 1979-06-27 Toray Ind Inc Method of treating high-polymer resin with electrical discharge

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1121482A1 (en) * 1999-08-12 2001-08-08 Raytheon Company Removing soil from fabric using an ionized flow of pressurized gas
EP1121482A4 (en) * 1999-08-12 2003-08-13 Raytheon Co Removing soil from fabric using an ionized flow of pressurized gas

Also Published As

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JPS6011149B2 (en) 1985-03-23

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