JPS6011149B2 - Low temperature plasma treatment equipment for textile products - Google Patents

Low temperature plasma treatment equipment for textile products

Info

Publication number
JPS6011149B2
JPS6011149B2 JP57000817A JP81782A JPS6011149B2 JP S6011149 B2 JPS6011149 B2 JP S6011149B2 JP 57000817 A JP57000817 A JP 57000817A JP 81782 A JP81782 A JP 81782A JP S6011149 B2 JPS6011149 B2 JP S6011149B2
Authority
JP
Japan
Prior art keywords
reactor
temperature plasma
gas
textile products
gas nozzle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57000817A
Other languages
Japanese (ja)
Other versions
JPS58120861A (en
Inventor
美一 山東
徳樹 後藤
逸雄 田中
博司 石徹白
松夫 南方
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SANTO TETSUKOSHO KK
YUNICHIKA KK
Original Assignee
SANTO TETSUKOSHO KK
YUNICHIKA KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SANTO TETSUKOSHO KK, YUNICHIKA KK filed Critical SANTO TETSUKOSHO KK
Priority to JP57000817A priority Critical patent/JPS6011149B2/en
Priority to US06/452,101 priority patent/US4466258A/en
Priority to DE19823248590 priority patent/DE3248590A1/en
Priority to DE19833300095 priority patent/DE3300095A1/en
Publication of JPS58120861A publication Critical patent/JPS58120861A/en
Priority to US06/583,002 priority patent/US4550578A/en
Publication of JPS6011149B2 publication Critical patent/JPS6011149B2/en
Expired legal-status Critical Current

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  • Treatment Of Fiber Materials (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Description

【発明の詳細な説明】 本発明は布畠、紐、ベルト等の繊維製品の両面を低温プ
ラズマ処理するために有利な装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an apparatus advantageous for low-temperature plasma treatment of both sides of textile products such as cloth linings, strings, and belts.

従来工業的に織物、編物など布富を連続的に処理する工
程は、染色前の工程では、布常に付着している溌水性叉
雑物を除去、あるいは親水化し布常に染料液が容易に浸
透せしめるための精練工程および染色後柔軟、溌水、静
電防止、防汚吸水などの特性を付与する仕上工程がある
が、いずれの工程も水系で処理を行っていた。たとえば
精練工程では、木綿を含む布帯の場合カセィソーダ、ソ
ーダ灰などのアルカリと、精練助剤を付与し、100q
o前後で2粉1以上スチーミングあるいは、アルカリ、
精練助剤を含む水溶液で煮沸して、溌水性爽雑物を水溶
化せしめ次いで処理布寅に付着している薬剤および可溶
化された爽雑物等の付着物を除去するための手段として
水洗を繰り返し行い更には、水洗後乾燥する工程が必要
であった。
Traditionally, the industrial process of continuously processing fabrics such as woven and knitted fabrics involves removing water-repellent impurities that are always attached to the fabric, or making it hydrophilic so that the dye solution can easily penetrate the fabric. There is a scouring process to impart properties such as softness, water repellency, anti-static properties, anti-fouling and water absorption after dyeing, but both processes were carried out in water. For example, in the scouring process, in the case of cloth bands containing cotton, alkalis such as caustic soda and soda ash and scouring aids are added, and 100q.
2 powders 1 or more steaming or alkali before and after o.
It is boiled in an aqueous solution containing a scouring aid to solubilize the water-repellent impurities, and then washed with water as a means to remove the chemicals and solubilized impurities adhering to the treated fabric. It was necessary to repeat this process repeatedly, and then to wash the product with water and then dry it.

また仕上工程においては、水に溶解あるいは分散させた
仕上加工剤を付与した後乾燥機を通して水分を蒸発除去
させる工程が必要であり、加工目的によってはさらに高
温熱処理により仕上剤を反応固着せしめる工程が必要で
あった。ところがか)る処理手段では、処理用の薬剤が
コスト高になること、薬剤を布常に反応せしめるために
多量の熱量を必要とすること、さらには精練工程の場合
反応処理された布常に含まれる残液、あるし、は爽雑物
及び又は付着物を除去せしめるための多数の水洗機、及
びこれらの各水洗機内に供給すべき多量の水資源が必要
であること、更に水洗された排液を廃棄処理するための
装置が必要である等のことから、布幕を前処理するには
多量の水資源、熱エネルギーを費しているのが現状であ
る。更には水洗機より排出される廃液中には必然的にも
薬剤が含まれることから、排液公害等の問題も生じ該廃
液の処理にも多大なる設備費、人件費等が嵩んでいるも
ので、特に繊維加工業会においては経済性に欠けるもの
であった。本発明はかかることから鑑みてなされたもの
で、熱エネルギー、水資源を殆んど使用することなく、
低温プラズマを使用して布用等の繊維製品の両面を均一
に処理することができる繊維製品の処理装置を提供する
ことを目的とするものである。
In addition, in the finishing process, it is necessary to apply a finishing agent dissolved or dispersed in water and then pass it through a dryer to evaporate the water, and depending on the purpose of processing, there may be an additional step of reacting and fixing the finishing agent through high-temperature heat treatment. It was necessary. However, with such treatment means, the cost of the treatment chemicals is high, a large amount of heat is required to cause the chemicals to constantly react with the fabric, and furthermore, in the scouring process, the reaction-treated fabric always contains In order to remove residual liquid, impurities, and/or deposits, a large number of washing machines are required, and a large amount of water resources to be supplied to each of these washing machines, and the washed waste liquid is required. At present, a large amount of water resources and thermal energy are expended in pre-processing cloth, as equipment for disposing of it is required. Furthermore, since the waste liquid discharged from washing machines inevitably contains chemicals, problems such as waste liquid pollution arise, and the treatment of the waste liquid also requires large equipment costs, personnel costs, etc. Therefore, it lacked economic efficiency, especially for the textile processing industry. The present invention was made in view of the above, and uses almost no thermal energy or water resources.
The object of the present invention is to provide a textile processing device that can uniformly process both sides of textile products such as cloth using low-temperature plasma.

以下に本発明を図面に示す実施例に基いて詳細に説明す
る。
The present invention will be explained in detail below based on embodiments shown in the drawings.

第1図において11ま反応器であって、この反応器1に
は「処理すべき布常2を出入れするための閉口部3,4
が設けられており、更にこれらの関口部3,4は蓋5に
よって密閉されるようになっている。
In FIG. 1, numeral 11 indicates a reactor, and this reactor 1 has "closed parts 3 and 4 for taking in and out the cloth 2 to be treated".
are provided, and these entrances 3 and 4 are hermetically sealed with a lid 5.

6及び7は反応器1内において、開□部3及び4の近傍
に配置した布畠巻取り軸であって、該双方の者取り鼠6
,7はモータ等の駆動機構(図示せず)によりいずれか
一方の巻取り軸に巻取られている布常は、他方の巻取り
軸に巻取られるか、双方の巻取り軸が間歌的に正逆回転
して、一方の巻取り軸6に布常が巻取られた後は、他方
の巻取り軸7が反転して該巻取り軸7への巻取りがなさ
れ、この巻取り軸7による巻取りが完了すれば、巻取り
軸6が反転してこの巻取り軸6への巻取りに切替えられ
るようになっている。
6 and 7 are cloth winding shafts arranged in the vicinity of the openings 3 and 4 in the reactor 1, and
, 7 is a motor or other drive mechanism (not shown). When the fabric is wound onto one of the winding shafts, it is wound onto the other winding shaft, or when both winding shafts are interposed. After the cloth is wound up on one winding shaft 6 by rotating forward and backward, the other winding shaft 7 is reversed and winding is performed on the winding shaft 7, and this winding When the winding by the shaft 7 is completed, the winding shaft 6 is reversed and the winding is switched to the winding shaft 6.

8及び9と、8′及び9′は、双方の巻取り髄6と7と
の間で張設されている布帯2を境に、上下に隔設された
二対の電極板であって、この一方の電極板8及び8′に
は反応器1外に設備された発振器(図示せず)からの高
周波が供給されるものであり、他方の電極板9及び9′
はアースされているものであるが、正負一対の電極板8
及び9に対して、隣設される正負一対の電極板8′及び
9′は、その上下が逆になっている。
8 and 9, and 8' and 9' are two pairs of electrode plates vertically spaced apart from each other with the cloth band 2 stretched between both wound piths 6 and 7 as the border. , one electrode plate 8 and 8' is supplied with high frequency from an oscillator (not shown) installed outside the reactor 1, and the other electrode plate 9 and 9'
is grounded, but a pair of positive and negative electrode plates 8
and 9, the pair of adjacent positive and negative electrode plates 8' and 9' are upside down.

またこれらの電極板8,8′及び9,9′は、例えば金
網あるいは多孔性の金属板となしてガスの分散と分布が
電極板の全面に亘つて均一となすことが要求される。な
ぜならば、電極板の全面より略均一な低温プラズマが発
生できるようにすることであり、またその金属板の全面
近傍に高周波によって励起されたガスを略均一に漂わせ
るためである。10及び10′は電極板8及び8′の全
面に向けてガスを吹き出すためのガスノズル、11及び
11′は対の電極板を挟んでガスノズル10及び10′
に対設されている吸気ダクトである。
Further, these electrode plates 8, 8' and 9, 9' are required to be made of, for example, a wire mesh or a porous metal plate so that the gas is uniformly dispersed and distributed over the entire surface of the electrode plates. This is because a substantially uniform low-temperature plasma can be generated from the entire surface of the electrode plate, and the gas excited by the high frequency can be caused to float substantially uniformly near the entire surface of the metal plate. 10 and 10' are gas nozzles for blowing out gas toward the entire surface of the electrode plates 8 and 8', and 11 and 11' are gas nozzles 10 and 10' with the pair of electrode plates in between.
This is an intake duct installed opposite to the

従って第1番目の電極板8,9及びガスノズル10,吸
気ダクト11の上下位置に対して、第2番目の電極板8
′,9′及びガスノズル10′、吸気ダクト11′の上
下位置は布岳2を境として逆に設置されているものであ
る。12は電極板8の周囲に設けられている囲いであっ
てこの囲い12によって、電極板8,8′と9,9′に
よって発生する低温プラズマの飛散を阻止し、その励起
ガスを効率よく布韓へ作用せしめるようにしたものであ
る。
Therefore, with respect to the vertical position of the first electrode plates 8 and 9, the gas nozzle 10, and the intake duct 11,
The vertical positions of ', 9', gas nozzle 10', and intake duct 11' are reversed with Fudake 2 as a boundary. Reference numeral 12 denotes an enclosure provided around the electrode plate 8. This enclosure 12 prevents the scattering of the low-temperature plasma generated by the electrode plates 8, 8' and 9, 9', and efficiently dissipates the excited gas. It was designed to affect Korea.

以上が本実施例の構成であるが次にその作用について述
べると、先ず、最尺布常2が巻取られている巻取り軸6
又は7を反応器1内にセットし、その布岳の先端を他方
の巻取髄7又は6に掛け、その他方の巻取り軸に布常2
を巻替えることができるように準備し、更に蓋5を閉め
て反応器1を密閉する。次に吸気ダクト11及び11′
に接続される真空ポンプ(図示せず)を駆動し、またガ
スノズル10及び10′よりガスを供給して反応器1内
の真空度を0.1〜1伽orr望ましくは0.5〜虹o
rr!こ調整保持せしめ、そこで高周波電源より高周波
例えば13.5母 M位を電極板に給電して低温プラズ
マを発生させる。次いで巻取り軸を駆動して布常2を両
電極板間、即ち低温プラズマ雰囲気中を移行させる。か
くして繊維品を低温プラズマ雰囲気中に移行せしめると
き低温プラズマ気体粒子が布常2の表裏両面より繊維間
に透過し、布岳の内芯部にまで低温プラズマが作用する
ことにより、精練工程の場合布帯2の両面及び内芯部に
含まれている爽雑物及び繊維に付与されている糊剤の一
部は、分解し又一部は親水化されて、水に容易に溶解す
る様になる。尚上記の低温プラズマを発生させるための
処理条件として例えば、出力、ガスの種類、ガス流量、
処理時間等は処理すべき布毎の質及び処理目的に応じて
適宜選択することができる。上言己実施例は、反応器1
はバッチ型であったが、例えば第2図に示す如く、反応
器1′を布用2の連続的通過を許しながらも内部を真空
に保つことのできるシール機構13及び14を具備せし
めた反応器を使用して、繊維製品の両面プラズマ処理を
連続的に行なうようにすることも可能である。
The above is the configuration of this embodiment. Next, the operation will be described. First, the winding shaft 6 on which the longest cloth 2 is wound.
or 7 is set in the reactor 1, the tip of the cloth mount is hung on the other winding shaft 7 or 6, and the cloth holder 2 is placed on the other winding shaft.
The reactor 1 is sealed by closing the lid 5. Next, the intake ducts 11 and 11'
A vacuum pump (not shown) connected to the reactor 1 is driven, and gas is supplied from the gas nozzles 10 and 10' to maintain the degree of vacuum in the reactor 1 to 0.1 to 1 orr, preferably 0.5 to 1000.
rr! This adjustment is maintained, and then high frequency power, for example around 13.5 M, is supplied to the electrode plate from a high frequency power source to generate low temperature plasma. Next, the winding shaft is driven to move the cloth 2 between the two electrode plates, that is, in a low-temperature plasma atmosphere. In this way, when the textile product is transferred to a low-temperature plasma atmosphere, the low-temperature plasma gas particles permeate between the fibers from both the front and back surfaces of the cloth holder 2, and the low-temperature plasma acts even on the inner core of the cloth holder. Some of the impurities contained in both sides and the inner core of the cloth band 2 and the sizing agent applied to the fibers are decomposed and some of them are made hydrophilic so that they can be easily dissolved in water. Become. The processing conditions for generating the above-mentioned low-temperature plasma include, for example, power, gas type, gas flow rate,
The processing time and the like can be appropriately selected depending on the quality of each fabric to be processed and the processing purpose. In the above example, reactor 1
was a batch type, but as shown in FIG. 2, for example, there is a reaction system equipped with sealing mechanisms 13 and 14 that can maintain a vacuum inside while allowing continuous passage of the cloth 2 through the reactor 1'. It is also possible to carry out double-sided plasma treatment of textile products continuously using a device.

以上のように本発明は内部を真空に保持できる反応器と
、この反応器内で移行される繊維製品の移送路を挟んで
対向される第1の電極対と、この第1の電極対に対して
繊維製品の移送路方向へ隣段された第2の電極対と、前
記第1の電極対を挟むようにして対向され、その電極対
に向けてガスを噴射する第1のガスノズル及び該ガスノ
ズルに対向される第1の吸気ダクトと、前記第1のガス
ノズルに対して繊維製品の移送方向に隣設された第2の
吸気ダクト及びこの第2の吸気ダクトに対して移送路を
挟んで対向される第2のガスノズルと、前記反応器内を
真空に保持せしめるためのバキューム機構と、反応器内
にガスを供給するためのガス供給手段と、上記双方の電
極対間で低温プラズマを発生せしめるための給電手段を
具備せしめている繊維製品の低温プラズマ処理装置であ
るから、この装置によれば、処理すべき布岳等の繊維製
品の両面よりその内芯部にまで低温プラズマが作用し、
これによって布岳の表裏全面に亘って、しかもその内芯
部にまで効果的なプラズマ処理ができる効果がある。
As described above, the present invention includes a reactor that can maintain a vacuum inside, a first electrode pair that faces each other across a transfer path for textile products to be transferred within this reactor, and On the other hand, a second electrode pair arranged next to each other in the direction of the textile product transfer path, and a first gas nozzle that faces the first electrode pair and injects gas toward the electrode pair; A first intake duct that faces the first gas nozzle, a second intake duct that is adjacent to the first gas nozzle in the textile product transfer direction, and a second intake duct that faces the second intake duct across the transfer path. a second gas nozzle, a vacuum mechanism for maintaining the inside of the reactor in a vacuum, a gas supply means for supplying gas into the reactor, and a second gas nozzle for generating low-temperature plasma between both pairs of electrodes. This apparatus is a low-temperature plasma processing apparatus for textile products that is equipped with a power supply means, so that low-temperature plasma acts on both sides of the textile product to be treated, including the inner core thereof.
This has the effect of allowing effective plasma treatment to be performed over the entire front and back surfaces of the cloth, and even to the inner core.

更に本発明によれば、繊維製品への低温プラズマ雰囲気
での処理により、熱エネルギー、水資源、あるいは薬液
を従来法と比べ極めて少ない量で種々の処理が可能であ
ることから繊維製品の処理が経済的にしかも廃液公害を
招くことなく迅速になされる効果もある。
Furthermore, according to the present invention, by treating textile products in a low-temperature plasma atmosphere, it is possible to perform various treatments using extremely small amounts of thermal energy, water resources, or chemicals compared to conventional methods. It is also economical and has the effect of being quickly achieved without causing waste liquid pollution.

【図面の簡単な説明】[Brief explanation of the drawing]

図面はいずれも本発明よりなる低温プラズマ処理装置の
実施例を示し第1図はその第1実施例を示した説明図、
第2図はその第2実施例を示した説明図である。 1,1′・・…・反応器、2……布常、3,4・…・・
閉口部、5……蓋、6,7……布常巻取り軸、8,9…
…電極板、10,10′・…・・ガスノズル、11,1
1′・…・・吸気ダクト、12….・.囲い、13・・
・・・・導入側シール機構、14・・・…導出側シール
機構。 第1図 第2図
The drawings all show embodiments of the low temperature plasma processing apparatus according to the present invention, and FIG. 1 is an explanatory diagram showing the first embodiment.
FIG. 2 is an explanatory diagram showing the second embodiment. 1,1'...Reactor, 2...Bujo, 3,4...
Closing part, 5... Lid, 6, 7... Cloth regular winding shaft, 8, 9...
...Electrode plate, 10,10'...Gas nozzle, 11,1
1'...Intake duct, 12...・.. Enclosure, 13...
... Inlet side seal mechanism, 14... Outlet side seal mechanism. Figure 1 Figure 2

Claims (1)

【特許請求の範囲】[Claims] 1 内部を真空に保持できる反応器と、この反応器内で
移行される繊維製品の移送路を挾んで対向される第1の
電極体と、この第1の電極体に対して繊維製品の移送路
方向へ隣設された第2の電極体と、前記第1の電極対を
挾むようにして対向され、その電極体に向けてガスを噴
射する第1のガスノズル及び該ガスノズルに対向される
第1の吸気ダクトと、前記第1のガスノズルに対して繊
維製品の移送方向に隣接された第2の吸気ダクト及びこ
の第2の吸気ダクトに対して移送路を挾んで対向される
第2のガスノズルと、前記反応器内を真空に保持せしめ
るためのバキユーム機構と、反応器内にガスを供給する
ためのガス供給手段と、上記双方の電極対間で低温プラ
ズマを発生せしめるための給電手段を具備せしめている
ことを特徴とする繊維製品の低温プラズマ処理装置。
1. A reactor that can maintain a vacuum inside, a first electrode body that faces across a transfer path for textile products to be transferred in this reactor, and a reactor that can maintain a vacuum inside, and a first electrode body that faces across a transfer path for textile products to be transferred within this reactor, and a a second electrode body adjacent to the road direction; a first gas nozzle that faces the first electrode pair and injects gas toward the electrode body; and a first gas nozzle facing the gas nozzle; an intake duct, a second intake duct adjacent to the first gas nozzle in the textile product transfer direction, and a second gas nozzle opposed to the second intake duct across a transfer path; A vacuum mechanism for maintaining a vacuum inside the reactor, a gas supply means for supplying gas into the reactor, and a power supply means for generating low-temperature plasma between both pairs of electrodes. A low-temperature plasma processing device for textile products, characterized by:
JP57000817A 1982-01-06 1982-01-06 Low temperature plasma treatment equipment for textile products Expired JPS6011149B2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP57000817A JPS6011149B2 (en) 1982-01-06 1982-01-06 Low temperature plasma treatment equipment for textile products
US06/452,101 US4466258A (en) 1982-01-06 1982-12-22 Apparatus for low-temperature plasma treatment of a textile product
DE19823248590 DE3248590A1 (en) 1982-01-06 1982-12-30 METHOD AND DEVICE FOR LOW-TEMPERATURE PLASMA TREATMENT OF A TEXTILE
DE19833300095 DE3300095A1 (en) 1982-01-06 1983-01-04 Installation for the continuous treatment of textile products with the aid of low-temperature plasma
US06/583,002 US4550578A (en) 1982-01-06 1984-02-23 Apparatus for low-temperature plasma treatment of a textile product

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57000817A JPS6011149B2 (en) 1982-01-06 1982-01-06 Low temperature plasma treatment equipment for textile products

Publications (2)

Publication Number Publication Date
JPS58120861A JPS58120861A (en) 1983-07-18
JPS6011149B2 true JPS6011149B2 (en) 1985-03-23

Family

ID=11484220

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57000817A Expired JPS6011149B2 (en) 1982-01-06 1982-01-06 Low temperature plasma treatment equipment for textile products

Country Status (1)

Country Link
JP (1) JPS6011149B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6117190A (en) * 1999-08-12 2000-09-12 Raytheon Company Removing soil from fabric using an ionized flow of pressurized gas

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5298064A (en) * 1976-02-13 1977-08-17 Toray Industries Method of modification of surface condition and treating apparatus thereof
JPS5480373A (en) * 1977-12-08 1979-06-27 Toray Ind Inc Method of treating high-polymer resin with electrical discharge

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5298064A (en) * 1976-02-13 1977-08-17 Toray Industries Method of modification of surface condition and treating apparatus thereof
JPS5480373A (en) * 1977-12-08 1979-06-27 Toray Ind Inc Method of treating high-polymer resin with electrical discharge

Also Published As

Publication number Publication date
JPS58120861A (en) 1983-07-18

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