JPS58118439U - photo mask - Google Patents
photo maskInfo
- Publication number
- JPS58118439U JPS58118439U JP1982014869U JP1486982U JPS58118439U JP S58118439 U JPS58118439 U JP S58118439U JP 1982014869 U JP1982014869 U JP 1982014869U JP 1486982 U JP1486982 U JP 1486982U JP S58118439 U JPS58118439 U JP S58118439U
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- photo mask
- photomask
- metal chromium
- main patterns
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第1図は現存するマスクを模式的に示した正面図、第2
図は本考案マスクを模式的に示した正面図であって、2
は本パターン、3は連結パターン、を夫々示している。Figure 1 is a front view schematically showing an existing mask, Figure 2
The figure is a front view schematically showing the mask of the present invention.
3 shows the main pattern, and 3 shows the connected pattern.
Claims (1)
フォトマスクに於て、転与パターンを構成する夫々島状
に独立している本パターンと、該各本パターン間をフォ
トレジストでは解像出来ない線巾で電気的に連結する金
属クロミウムから成る連結パターンと、から成り、この
連結パターンに依って各本パターンの帯電を防止する事
を特徴としたフォトマスク。In a photomask having a metal chromium pattern on an insulating glass substrate, the main patterns that constitute the transfer pattern are independent in the form of islands, and the line width that cannot be resolved with photoresist is used between the main patterns. and a connecting pattern made of metal chromium that is electrically connected to each other, and the photomask is characterized in that each pattern is prevented from being charged with electricity by the connecting pattern.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1982014869U JPS58118439U (en) | 1982-02-04 | 1982-02-04 | photo mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1982014869U JPS58118439U (en) | 1982-02-04 | 1982-02-04 | photo mask |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58118439U true JPS58118439U (en) | 1983-08-12 |
JPS6220843Y2 JPS6220843Y2 (en) | 1987-05-27 |
Family
ID=30027322
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1982014869U Granted JPS58118439U (en) | 1982-02-04 | 1982-02-04 | photo mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58118439U (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009086385A (en) * | 2007-09-29 | 2009-04-23 | Hoya Corp | Photomask and method for manufacturing the same, and pattern transfer method |
JP2011171465A (en) * | 2010-02-18 | 2011-09-01 | Nuflare Technology Inc | Method for manufacturing exposure mask |
-
1982
- 1982-02-04 JP JP1982014869U patent/JPS58118439U/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009086385A (en) * | 2007-09-29 | 2009-04-23 | Hoya Corp | Photomask and method for manufacturing the same, and pattern transfer method |
JP2011171465A (en) * | 2010-02-18 | 2011-09-01 | Nuflare Technology Inc | Method for manufacturing exposure mask |
Also Published As
Publication number | Publication date |
---|---|
JPS6220843Y2 (en) | 1987-05-27 |
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