JPS5816644U - Photomask for pattern transfer - Google Patents
Photomask for pattern transferInfo
- Publication number
- JPS5816644U JPS5816644U JP1981111247U JP11124781U JPS5816644U JP S5816644 U JPS5816644 U JP S5816644U JP 1981111247 U JP1981111247 U JP 1981111247U JP 11124781 U JP11124781 U JP 11124781U JP S5816644 U JPS5816644 U JP S5816644U
- Authority
- JP
- Japan
- Prior art keywords
- photomask
- pattern transfer
- pattern
- light
- ueno
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000000149 penetrating effect Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図はフォトマスク１１とウェハー１２の密着状態を
示す図である。第２図は従来の方法による露光状態を示
す図で１３は光、１４は発生したガスを示す。
第３図は本考案による実施例を示し、３１は穴である。
第４図は本考案による実施例を示し、４１〜４４は穴の
断面を示す。第５図は本考案による他の実施例を示し、
５１は穴、５２は溝を示す。FIG. 1 is a diagram showing a state in which a photomask 11 and a wafer 12 are in close contact with each other. FIG. 2 is a diagram showing an exposure state according to a conventional method, where 13 indicates light and 14 indicates generated gas. FIG. 3 shows an embodiment according to the present invention, where 31 is a hole. FIG. 4 shows an embodiment according to the present invention, and 41 to 44 show cross sections of the holes. FIG. 5 shows another embodiment according to the present invention,
51 indicates a hole, and 52 indicates a groove.
Claims (1)
着性を確保するために表面と裏面とを貫通する１個もし
くは複数個の穴が設けられたことを特徴とするパターン
転写用フォトマスク。1. A photomask for pattern transfer, characterized in that one or more holes penetrating the front and back surfaces are provided to ensure adhesion to Ueno 1- when a fine pattern is transferred by light.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1981111247U JPS5816644U (en) | 1981-07-27 | 1981-07-27 | Photomask for pattern transfer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1981111247U JPS5816644U (en) | 1981-07-27 | 1981-07-27 | Photomask for pattern transfer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5816644U true JPS5816644U (en) | 1983-02-01 |
Family
ID=29905586
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1981111247U Pending JPS5816644U (en) | 1981-07-27 | 1981-07-27 | Photomask for pattern transfer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5816644U (en) |
-
1981
- 1981-07-27 JP JP1981111247U patent/JPS5816644U/en active Pending
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