JPS58114431A - 電子ビ−ム露光装置 - Google Patents

電子ビ−ム露光装置

Info

Publication number
JPS58114431A
JPS58114431A JP56214775A JP21477581A JPS58114431A JP S58114431 A JPS58114431 A JP S58114431A JP 56214775 A JP56214775 A JP 56214775A JP 21477581 A JP21477581 A JP 21477581A JP S58114431 A JPS58114431 A JP S58114431A
Authority
JP
Japan
Prior art keywords
deflection
signal
stage
electron beam
supplied
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56214775A
Other languages
English (en)
Japanese (ja)
Other versions
JPS634697B2 (cg-RX-API-DMAC7.html
Inventor
Kaoru Nakamura
薫 中村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
NTT Inc
Original Assignee
Jeol Ltd
Nihon Denshi KK
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, Nippon Telegraph and Telephone Corp filed Critical Jeol Ltd
Priority to JP56214775A priority Critical patent/JPS58114431A/ja
Publication of JPS58114431A publication Critical patent/JPS58114431A/ja
Publication of JPS634697B2 publication Critical patent/JPS634697B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP56214775A 1981-12-26 1981-12-26 電子ビ−ム露光装置 Granted JPS58114431A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56214775A JPS58114431A (ja) 1981-12-26 1981-12-26 電子ビ−ム露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56214775A JPS58114431A (ja) 1981-12-26 1981-12-26 電子ビ−ム露光装置

Publications (2)

Publication Number Publication Date
JPS58114431A true JPS58114431A (ja) 1983-07-07
JPS634697B2 JPS634697B2 (cg-RX-API-DMAC7.html) 1988-01-30

Family

ID=16661324

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56214775A Granted JPS58114431A (ja) 1981-12-26 1981-12-26 電子ビ−ム露光装置

Country Status (1)

Country Link
JP (1) JPS58114431A (cg-RX-API-DMAC7.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60178624A (ja) * 1984-02-24 1985-09-12 Jeol Ltd 荷電粒子線描画装置
JPH01120822A (ja) * 1987-11-04 1989-05-12 Jeol Ltd 電子ビーム描画装置の偏向補正回路

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60178624A (ja) * 1984-02-24 1985-09-12 Jeol Ltd 荷電粒子線描画装置
JPH01120822A (ja) * 1987-11-04 1989-05-12 Jeol Ltd 電子ビーム描画装置の偏向補正回路

Also Published As

Publication number Publication date
JPS634697B2 (cg-RX-API-DMAC7.html) 1988-01-30

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