JPS58114426A - レジスト塗布装置 - Google Patents
レジスト塗布装置Info
- Publication number
- JPS58114426A JPS58114426A JP56209843A JP20984381A JPS58114426A JP S58114426 A JPS58114426 A JP S58114426A JP 56209843 A JP56209843 A JP 56209843A JP 20984381 A JP20984381 A JP 20984381A JP S58114426 A JPS58114426 A JP S58114426A
- Authority
- JP
- Japan
- Prior art keywords
- resist
- hood
- wafer
- reservoir
- opening
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56209843A JPS58114426A (ja) | 1981-12-28 | 1981-12-28 | レジスト塗布装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56209843A JPS58114426A (ja) | 1981-12-28 | 1981-12-28 | レジスト塗布装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58114426A true JPS58114426A (ja) | 1983-07-07 |
| JPS6249728B2 JPS6249728B2 (OSRAM) | 1987-10-21 |
Family
ID=16579533
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56209843A Granted JPS58114426A (ja) | 1981-12-28 | 1981-12-28 | レジスト塗布装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58114426A (OSRAM) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6042730U (ja) * | 1983-08-31 | 1985-03-26 | 関西日本電気株式会社 | 半導体製造装置 |
| JPS6151732U (OSRAM) * | 1984-09-10 | 1986-04-07 | ||
| JPS61219136A (ja) * | 1985-03-25 | 1986-09-29 | Iwatsu Electric Co Ltd | レジスト回転塗布機 |
| US4790262A (en) * | 1985-10-07 | 1988-12-13 | Tokyo Denshi Kagaku Co., Ltd. | Thin-film coating apparatus |
-
1981
- 1981-12-28 JP JP56209843A patent/JPS58114426A/ja active Granted
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6042730U (ja) * | 1983-08-31 | 1985-03-26 | 関西日本電気株式会社 | 半導体製造装置 |
| JPS6151732U (OSRAM) * | 1984-09-10 | 1986-04-07 | ||
| JPS61219136A (ja) * | 1985-03-25 | 1986-09-29 | Iwatsu Electric Co Ltd | レジスト回転塗布機 |
| US4790262A (en) * | 1985-10-07 | 1988-12-13 | Tokyo Denshi Kagaku Co., Ltd. | Thin-film coating apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6249728B2 (OSRAM) | 1987-10-21 |
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