JPS58113932A - レジスト材料およびそれを用いる微細レジストパタ−ンの形成方法 - Google Patents

レジスト材料およびそれを用いる微細レジストパタ−ンの形成方法

Info

Publication number
JPS58113932A
JPS58113932A JP56212729A JP21272981A JPS58113932A JP S58113932 A JPS58113932 A JP S58113932A JP 56212729 A JP56212729 A JP 56212729A JP 21272981 A JP21272981 A JP 21272981A JP S58113932 A JPS58113932 A JP S58113932A
Authority
JP
Japan
Prior art keywords
resist
copolymer
general formula
group
mixture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56212729A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0358103B2 (enrdf_load_stackoverflow
Inventor
Tsuneo Fujii
藤井　恒男
Hiroshi Inukai
宏 犬飼
Takayuki Deguchi
出口　隆行
Toshihiko Amano
俊彦 天野
Masami Kakuchi
覚知　正美
Hiroshi Asakawa
浩 浅川
Osamu Kogure
小暮　攻
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daikin Industries Ltd
Nippon Telegraph and Telephone Corp
Original Assignee
Daikin Industries Ltd
Nippon Telegraph and Telephone Corp
Daikin Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daikin Industries Ltd, Nippon Telegraph and Telephone Corp, Daikin Kogyo Co Ltd filed Critical Daikin Industries Ltd
Priority to JP56212729A priority Critical patent/JPS58113932A/ja
Priority to DE8282111725T priority patent/DE3279090D1/de
Priority to CA000418004A priority patent/CA1207099A/en
Priority to EP82111725A priority patent/EP0090089B1/en
Priority to US06/450,726 priority patent/US4539250A/en
Publication of JPS58113932A publication Critical patent/JPS58113932A/ja
Priority to US06/710,190 priority patent/US4686168A/en
Publication of JPH0358103B2 publication Critical patent/JPH0358103B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
JP56212729A 1981-12-19 1981-12-26 レジスト材料およびそれを用いる微細レジストパタ−ンの形成方法 Granted JPS58113932A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP56212729A JPS58113932A (ja) 1981-12-26 1981-12-26 レジスト材料およびそれを用いる微細レジストパタ−ンの形成方法
DE8282111725T DE3279090D1 (en) 1981-12-19 1982-12-17 Resist material and process for forming fine resist pattern
CA000418004A CA1207099A (en) 1981-12-19 1982-12-17 Resist material and process for forming fine resist pattern
EP82111725A EP0090089B1 (en) 1981-12-19 1982-12-17 Resist material and process for forming fine resist pattern
US06/450,726 US4539250A (en) 1981-12-19 1982-12-17 Resist material and process for forming fine resist pattern
US06/710,190 US4686168A (en) 1981-12-19 1985-03-11 Fluoroalkyl acrylate resist material and process for forming fine resist pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56212729A JPS58113932A (ja) 1981-12-26 1981-12-26 レジスト材料およびそれを用いる微細レジストパタ−ンの形成方法

Publications (2)

Publication Number Publication Date
JPS58113932A true JPS58113932A (ja) 1983-07-07
JPH0358103B2 JPH0358103B2 (enrdf_load_stackoverflow) 1991-09-04

Family

ID=16627462

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56212729A Granted JPS58113932A (ja) 1981-12-19 1981-12-26 レジスト材料およびそれを用いる微細レジストパタ−ンの形成方法

Country Status (1)

Country Link
JP (1) JPS58113932A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4871820A (en) * 1987-02-17 1989-10-03 Daikin Industries, Ltd. Alpha-fluoroacrylic acid polymer and its use
JPH02111988A (ja) * 1988-10-21 1990-04-24 Toppan Printing Co Ltd ホログラム複製型およびその製造方法並びにホログラムの製造方法
US5011275A (en) * 1988-07-05 1991-04-30 Ciba-Geigy Corporation Dimethylacrylamide-copolymer hydrogels with high oxygen permeability
EP1757627A4 (en) * 2004-04-15 2007-05-09 Daikin Ind Ltd FLUOROUS POLYMER AND TREATMENT COMPOSITION
JP2023003342A (ja) * 2021-06-23 2023-01-11 日本ゼオン株式会社 レジストパターン形成方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5524088A (en) * 1979-03-02 1980-02-20 Daiichi Koki Folding thick bedquilt drying tool
JPS5558243A (en) * 1978-10-24 1980-04-30 Nippon Telegr & Teleph Corp <Ntt> Highly sensitive positive resist composition
JPS5653114A (en) * 1979-10-08 1981-05-12 Kohjin Co Ltd Preparation of polymeric material for positive resist sensitive to radiation and far ultraviolet rays

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5558243A (en) * 1978-10-24 1980-04-30 Nippon Telegr & Teleph Corp <Ntt> Highly sensitive positive resist composition
JPS5524088A (en) * 1979-03-02 1980-02-20 Daiichi Koki Folding thick bedquilt drying tool
JPS5653114A (en) * 1979-10-08 1981-05-12 Kohjin Co Ltd Preparation of polymeric material for positive resist sensitive to radiation and far ultraviolet rays

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4871820A (en) * 1987-02-17 1989-10-03 Daikin Industries, Ltd. Alpha-fluoroacrylic acid polymer and its use
US5011275A (en) * 1988-07-05 1991-04-30 Ciba-Geigy Corporation Dimethylacrylamide-copolymer hydrogels with high oxygen permeability
JPH02111988A (ja) * 1988-10-21 1990-04-24 Toppan Printing Co Ltd ホログラム複製型およびその製造方法並びにホログラムの製造方法
EP1757627A4 (en) * 2004-04-15 2007-05-09 Daikin Ind Ltd FLUOROUS POLYMER AND TREATMENT COMPOSITION
JP2023003342A (ja) * 2021-06-23 2023-01-11 日本ゼオン株式会社 レジストパターン形成方法

Also Published As

Publication number Publication date
JPH0358103B2 (enrdf_load_stackoverflow) 1991-09-04

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