JPS58101454A - 半導体装置の電極 - Google Patents
半導体装置の電極Info
- Publication number
- JPS58101454A JPS58101454A JP56199489A JP19948981A JPS58101454A JP S58101454 A JPS58101454 A JP S58101454A JP 56199489 A JP56199489 A JP 56199489A JP 19948981 A JP19948981 A JP 19948981A JP S58101454 A JPS58101454 A JP S58101454A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- tin
- substrate
- electrode
- prevented
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 7
- 229910052782 aluminium Inorganic materials 0.000 claims description 7
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims 2
- 241000270666 Testudines Species 0.000 claims 1
- 239000000758 substrate Substances 0.000 abstract description 10
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 abstract description 9
- 239000011800 void material Substances 0.000 abstract description 8
- 238000009792 diffusion process Methods 0.000 abstract description 6
- 238000000034 method Methods 0.000 abstract description 5
- 229910052719 titanium Inorganic materials 0.000 abstract description 5
- 239000012298 atmosphere Substances 0.000 abstract description 2
- 229910052710 silicon Inorganic materials 0.000 abstract description 2
- 238000004544 sputter deposition Methods 0.000 abstract description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 230000032683 aging Effects 0.000 abstract 2
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 238000005546 reactive sputtering Methods 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 239000010949 copper Substances 0.000 description 11
- 239000010936 titanium Substances 0.000 description 9
- 229910052802 copper Inorganic materials 0.000 description 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000013011 mating Effects 0.000 description 2
- 229910021341 titanium silicide Inorganic materials 0.000 description 2
- ZXEYZECDXFPJRJ-UHFFFAOYSA-N $l^{3}-silane;platinum Chemical group [SiH3].[Pt] ZXEYZECDXFPJRJ-UHFFFAOYSA-N 0.000 description 1
- 241000272201 Columbiformes Species 0.000 description 1
- 241001063191 Elops affinis Species 0.000 description 1
- 241001092070 Eriobotrya Species 0.000 description 1
- 235000009008 Eriobotrya japonica Nutrition 0.000 description 1
- 235000002756 Erythrina berteroana Nutrition 0.000 description 1
- GXCLVBGFBYZDAG-UHFFFAOYSA-N N-[2-(1H-indol-3-yl)ethyl]-N-methylprop-2-en-1-amine Chemical compound CN(CCC1=CNC2=C1C=CC=C2)CC=C GXCLVBGFBYZDAG-UHFFFAOYSA-N 0.000 description 1
- 241000287127 Passeridae Species 0.000 description 1
- 244000005687 Poranopsis paniculata Species 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- HKPHPIREJKHECO-UHFFFAOYSA-N butachlor Chemical compound CCCCOCN(C(=O)CCl)C1=C(CC)C=CC=C1CC HKPHPIREJKHECO-UHFFFAOYSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000036962 time dependent Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/532—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56199489A JPS58101454A (ja) | 1981-12-12 | 1981-12-12 | 半導体装置の電極 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56199489A JPS58101454A (ja) | 1981-12-12 | 1981-12-12 | 半導体装置の電極 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58101454A true JPS58101454A (ja) | 1983-06-16 |
JPH033395B2 JPH033395B2 (enrdf_load_stackoverflow) | 1991-01-18 |
Family
ID=16408655
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56199489A Granted JPS58101454A (ja) | 1981-12-12 | 1981-12-12 | 半導体装置の電極 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58101454A (enrdf_load_stackoverflow) |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6074675A (ja) * | 1983-09-30 | 1985-04-26 | Fujitsu Ltd | 半導体装置 |
JPS6190445A (ja) * | 1984-10-09 | 1986-05-08 | Nec Corp | 半導体装置 |
JPS61224435A (ja) * | 1985-03-29 | 1986-10-06 | Toshiba Corp | 半導体装置 |
JPS61263159A (ja) * | 1985-03-15 | 1986-11-21 | フエアチヤイルド セミコンダクタ コ−ポレ−シヨン | 集積回路用の高温相互接続方式 |
JPS6255929A (ja) * | 1985-09-05 | 1987-03-11 | Toshiba Corp | 半導体装置の製造方法 |
JPS62219921A (ja) * | 1986-03-20 | 1987-09-28 | Mitsubishi Electric Corp | 半導体装置 |
US5155063A (en) * | 1990-10-09 | 1992-10-13 | Nec Corporation | Method of fabricating semiconductor device including an al/tin/ti contact |
US5240880A (en) * | 1992-05-05 | 1993-08-31 | Zilog, Inc. | Ti/TiN/Ti contact metallization |
US5278099A (en) * | 1985-05-13 | 1994-01-11 | Kabushiki Kaisha Toshiba | Method for manufacturing a semiconductor device having wiring electrodes |
US6051490A (en) * | 1991-11-29 | 2000-04-18 | Sony Corporation | Method of forming wirings |
US6268290B1 (en) * | 1991-11-19 | 2001-07-31 | Sony Corporation | Method of forming wirings |
US8168996B2 (en) | 2006-04-17 | 2012-05-01 | Nichia Corporation | Semiconductor light emitting device |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS507430A (enrdf_load_stackoverflow) * | 1973-05-18 | 1975-01-25 | ||
JPS5024596A (enrdf_load_stackoverflow) * | 1973-02-20 | 1975-03-15 | ||
JPS5271174A (en) * | 1975-12-10 | 1977-06-14 | Fujitsu Ltd | Production of semiconductor device |
-
1981
- 1981-12-12 JP JP56199489A patent/JPS58101454A/ja active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5024596A (enrdf_load_stackoverflow) * | 1973-02-20 | 1975-03-15 | ||
JPS507430A (enrdf_load_stackoverflow) * | 1973-05-18 | 1975-01-25 | ||
JPS5271174A (en) * | 1975-12-10 | 1977-06-14 | Fujitsu Ltd | Production of semiconductor device |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6074675A (ja) * | 1983-09-30 | 1985-04-26 | Fujitsu Ltd | 半導体装置 |
JPS6190445A (ja) * | 1984-10-09 | 1986-05-08 | Nec Corp | 半導体装置 |
JPS61263159A (ja) * | 1985-03-15 | 1986-11-21 | フエアチヤイルド セミコンダクタ コ−ポレ−シヨン | 集積回路用の高温相互接続方式 |
JPS61224435A (ja) * | 1985-03-29 | 1986-10-06 | Toshiba Corp | 半導体装置 |
US5278099A (en) * | 1985-05-13 | 1994-01-11 | Kabushiki Kaisha Toshiba | Method for manufacturing a semiconductor device having wiring electrodes |
JPS6255929A (ja) * | 1985-09-05 | 1987-03-11 | Toshiba Corp | 半導体装置の製造方法 |
JPS62219921A (ja) * | 1986-03-20 | 1987-09-28 | Mitsubishi Electric Corp | 半導体装置 |
US5155063A (en) * | 1990-10-09 | 1992-10-13 | Nec Corporation | Method of fabricating semiconductor device including an al/tin/ti contact |
US6268290B1 (en) * | 1991-11-19 | 2001-07-31 | Sony Corporation | Method of forming wirings |
US6051490A (en) * | 1991-11-29 | 2000-04-18 | Sony Corporation | Method of forming wirings |
US5240880A (en) * | 1992-05-05 | 1993-08-31 | Zilog, Inc. | Ti/TiN/Ti contact metallization |
US8168996B2 (en) | 2006-04-17 | 2012-05-01 | Nichia Corporation | Semiconductor light emitting device |
US8362516B2 (en) | 2006-04-17 | 2013-01-29 | Nichia Corporation | Semiconductor light emitting device |
Also Published As
Publication number | Publication date |
---|---|
JPH033395B2 (enrdf_load_stackoverflow) | 1991-01-18 |
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