JPS5799361A - Coater for organic resin film - Google Patents

Coater for organic resin film

Info

Publication number
JPS5799361A
JPS5799361A JP17563280A JP17563280A JPS5799361A JP S5799361 A JPS5799361 A JP S5799361A JP 17563280 A JP17563280 A JP 17563280A JP 17563280 A JP17563280 A JP 17563280A JP S5799361 A JPS5799361 A JP S5799361A
Authority
JP
Japan
Prior art keywords
substrate
flowed
fine
organic resin
resin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17563280A
Other languages
Japanese (ja)
Inventor
Hisao Haruyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP17563280A priority Critical patent/JPS5799361A/en
Publication of JPS5799361A publication Critical patent/JPS5799361A/en
Pending legal-status Critical Current

Links

Landscapes

  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To easily form an uniform hot resist film free of pin hole on the surface of a substrate by a method in which gas is introduced from a gas inlet hole provided in the central part of the upper cover of an organic resin film coater and flowed in a laminar flow state on the surface of the substrate.
CONSTITUTION: A glass substrate 1 on which a resist liquid is coated is placed on a substrate base 2 by using a vacuum chuck and then the base 2 is turned at at given revolving speed. At the same time, dry air deprived of fine dust an air filter, etc., is introduced through a gas inlet hole 5 and flowed in a laminar flow state in the direction of arrow A or B on the surface of the substrate 3 through fine holes 6. Thus, the air flow coming toward the rotation center due to swirl flow produced by high-speed rotation is prevented, so that the entanglement of fine resist liquid particles scattered around the substrate 1 can be eliminated. Therefore, an uniform and pin hole-free resist film can be formed.
COPYRIGHT: (C)1982,JPO&Japio
JP17563280A 1980-12-12 1980-12-12 Coater for organic resin film Pending JPS5799361A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17563280A JPS5799361A (en) 1980-12-12 1980-12-12 Coater for organic resin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17563280A JPS5799361A (en) 1980-12-12 1980-12-12 Coater for organic resin film

Publications (1)

Publication Number Publication Date
JPS5799361A true JPS5799361A (en) 1982-06-21

Family

ID=15999471

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17563280A Pending JPS5799361A (en) 1980-12-12 1980-12-12 Coater for organic resin film

Country Status (1)

Country Link
JP (1) JPS5799361A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS607959A (en) * 1983-06-29 1985-01-16 Fujitsu Ltd Rotary coater

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS607959A (en) * 1983-06-29 1985-01-16 Fujitsu Ltd Rotary coater

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