JPS5798845A - Diffraction greating for x ray and manufacture thereof - Google Patents

Diffraction greating for x ray and manufacture thereof

Info

Publication number
JPS5798845A
JPS5798845A JP55174673A JP17467380A JPS5798845A JP S5798845 A JPS5798845 A JP S5798845A JP 55174673 A JP55174673 A JP 55174673A JP 17467380 A JP17467380 A JP 17467380A JP S5798845 A JPS5798845 A JP S5798845A
Authority
JP
Japan
Prior art keywords
regions
crystal
region
group
laminated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP55174673A
Other languages
Japanese (ja)
Inventor
Shigeru Yasuami
Akimichi Hojo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP55174673A priority Critical patent/JPS5798845A/en
Publication of JPS5798845A publication Critical patent/JPS5798845A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

PURPOSE:To obtain the X ray diffraction grating suitable for lenses and the like as a functional element of an X ray microscope and the like by combining two regions in alternate layers wherein specified two crystal regions are sequentially and repeatedly laminated so that the etching is more intensely performed in either of the crystal regions. CONSTITUTION:The laminated layers 1 comprises the alternate layers of two element crysal regions 2 and three or four element crystal regions 3. The regions 2 comprise a group III element and a group V element in the periodic table, e.g., GaAs. The region 3 comprises one or two of either group III elements or the group V elements, e.g., three element crystal of Ga1-xAlxAs (where X is about 0.7). Each region is formed by controlling both period and composition by changing the molecule beams flying from several evaporating sources to the laminated body in such a way that a shutter is periodically opened and closed by the molecule beam epitaxial method. Then most of GaAs crystal region 2 on said laminated body are etched, with linking regions 2' being left on one side, and the Ga1-xAlxAs crystal regions 3 are protruded in a comb shape.
JP55174673A 1980-12-12 1980-12-12 Diffraction greating for x ray and manufacture thereof Pending JPS5798845A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55174673A JPS5798845A (en) 1980-12-12 1980-12-12 Diffraction greating for x ray and manufacture thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55174673A JPS5798845A (en) 1980-12-12 1980-12-12 Diffraction greating for x ray and manufacture thereof

Publications (1)

Publication Number Publication Date
JPS5798845A true JPS5798845A (en) 1982-06-19

Family

ID=15982687

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55174673A Pending JPS5798845A (en) 1980-12-12 1980-12-12 Diffraction greating for x ray and manufacture thereof

Country Status (1)

Country Link
JP (1) JPS5798845A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0206288A2 (en) * 1985-06-28 1986-12-30 Hitachi, Ltd. Diffraction grating and process for producing the same
JPH01213599A (en) * 1988-02-23 1989-08-28 Nippon Telegr & Teleph Corp <Ntt> Reflection type diffraction grating

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0206288A2 (en) * 1985-06-28 1986-12-30 Hitachi, Ltd. Diffraction grating and process for producing the same
JPH01213599A (en) * 1988-02-23 1989-08-28 Nippon Telegr & Teleph Corp <Ntt> Reflection type diffraction grating

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