JPS5793584A - Semiconductor photoreceiving element - Google Patents
Semiconductor photoreceiving elementInfo
- Publication number
- JPS5793584A JPS5793584A JP55169888A JP16988880A JPS5793584A JP S5793584 A JPS5793584 A JP S5793584A JP 55169888 A JP55169888 A JP 55169888A JP 16988880 A JP16988880 A JP 16988880A JP S5793584 A JPS5793584 A JP S5793584A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- photodetector
- type impurity
- guard ring
- conductive type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title abstract 4
- 239000012535 impurity Substances 0.000 abstract 5
- 239000013078 crystal Substances 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
- H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier
- H01L31/107—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier working in avalanche mode, e.g. avalanche photodiodes
- H01L31/1075—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier working in avalanche mode, e.g. avalanche photodiodes in which the active layers, e.g. absorption or multiplication layers, form an heterostructure, e.g. SAM structure
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Light Receiving Elements (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55169888A JPS5793584A (en) | 1980-12-02 | 1980-12-02 | Semiconductor photoreceiving element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55169888A JPS5793584A (en) | 1980-12-02 | 1980-12-02 | Semiconductor photoreceiving element |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5793584A true JPS5793584A (en) | 1982-06-10 |
JPS6222546B2 JPS6222546B2 (ja) | 1987-05-19 |
Family
ID=15894811
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55169888A Granted JPS5793584A (en) | 1980-12-02 | 1980-12-02 | Semiconductor photoreceiving element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5793584A (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4974061A (en) * | 1987-08-19 | 1990-11-27 | Nec Corporation | Planar type heterostructure avalanche photodiode |
US4999696A (en) * | 1985-05-03 | 1991-03-12 | U.S. Philips Corporation | PIN photodiode having a low leakage current |
US5272364A (en) * | 1991-07-01 | 1993-12-21 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor photodetector device with short lifetime region |
JP2006216976A (ja) * | 2006-03-13 | 2006-08-17 | Mitsubishi Electric Corp | 半導体受光素子 |
JP2006339413A (ja) * | 2005-06-02 | 2006-12-14 | Fujitsu Ltd | 半導体受光装置及びその製造方法 |
US8134179B2 (en) | 2005-06-14 | 2012-03-13 | Austriamicrosystems Ag | Photodiode with a reduced dark current and method for the production thereof |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0230049U (ja) * | 1988-08-16 | 1990-02-26 | ||
GB2597272A (en) * | 2020-07-17 | 2022-01-26 | Cyqiq Ltd | Electrode harness for use in carrying out electrical impedance tomography, a system and a method |
-
1980
- 1980-12-02 JP JP55169888A patent/JPS5793584A/ja active Granted
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4999696A (en) * | 1985-05-03 | 1991-03-12 | U.S. Philips Corporation | PIN photodiode having a low leakage current |
US4974061A (en) * | 1987-08-19 | 1990-11-27 | Nec Corporation | Planar type heterostructure avalanche photodiode |
US5272364A (en) * | 1991-07-01 | 1993-12-21 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor photodetector device with short lifetime region |
JP2006339413A (ja) * | 2005-06-02 | 2006-12-14 | Fujitsu Ltd | 半導体受光装置及びその製造方法 |
US7875946B2 (en) | 2005-06-02 | 2011-01-25 | Fujitsu Limited | Semiconductor photodetector that causes avalanche multiplication to occur only at photodetector portion located at central portion of mesa structure |
US8772896B2 (en) | 2005-06-02 | 2014-07-08 | Fujitsu Limited | Semiconductor photodetector that causes avalanche multiplication to occur only at photodetector portion located at central portion of mesa structure |
US9276162B2 (en) | 2005-06-02 | 2016-03-01 | Fujitsu Limited | Semiconductor photodetector and method for manufacturing the same |
US8134179B2 (en) | 2005-06-14 | 2012-03-13 | Austriamicrosystems Ag | Photodiode with a reduced dark current and method for the production thereof |
JP2006216976A (ja) * | 2006-03-13 | 2006-08-17 | Mitsubishi Electric Corp | 半導体受光素子 |
JP4486603B2 (ja) * | 2006-03-13 | 2010-06-23 | 三菱電機株式会社 | 半導体受光素子 |
Also Published As
Publication number | Publication date |
---|---|
JPS6222546B2 (ja) | 1987-05-19 |
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