JPS5773924A - Preparation of magnetic bubble memory - Google Patents

Preparation of magnetic bubble memory

Info

Publication number
JPS5773924A
JPS5773924A JP15008880A JP15008880A JPS5773924A JP S5773924 A JPS5773924 A JP S5773924A JP 15008880 A JP15008880 A JP 15008880A JP 15008880 A JP15008880 A JP 15008880A JP S5773924 A JPS5773924 A JP S5773924A
Authority
JP
Japan
Prior art keywords
film
layer
mask
anode oxidation
magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15008880A
Other languages
Japanese (ja)
Inventor
Taiji Tsuruoka
Kazutami Kawamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP15008880A priority Critical patent/JPS5773924A/en
Publication of JPS5773924A publication Critical patent/JPS5773924A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/32Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film
    • H01F41/34Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film in patterns, e.g. by lithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Thin Magnetic Films (AREA)

Abstract

PURPOSE:To enable lamination of the second conductor pattern through the intermediary of a sufficiently-thin insulator layer, by applying anode oxidation with a mask of a thin insulator layer provided on the first conductor layer and by forming thereby the first conductor pattern having a flat surface. CONSTITUTION:An Al-Cu film 2 is evaporated on a magnetic film 1 formed by the liquid-phase epitaxial method and a CVD SiO2 film 5 is laminated in prescribed thickness thereon. An opening is made in the film 5 with a resist mask 6 applied, the Al-Cu layer 2 is subjected to anode oxidation, and thereby porous Al2O3 7 serving as a magnetic-bubble transmitting channel is prepared. The Al2O3 7 increases up to the position of an interface between the mask 6 and the film 5. The anode oxidation is conducted by using a solution of 1% of oxalic acid. Subsequently, the anode oxidation is made in the solution of ammonium borate in ethylene glycol, whereby the surface of the layer 7 is made into a composite Al2O3 layer 8. The mask 6 being removed, sufficiently thin CVD SiO2 9 can be formed afresh on a flat surface, and the element is completed by providing the second conductor pattern 4, an insulator layer 10, a magnetic-bubble detecting film 11 and a protection film 12.
JP15008880A 1980-10-28 1980-10-28 Preparation of magnetic bubble memory Pending JPS5773924A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15008880A JPS5773924A (en) 1980-10-28 1980-10-28 Preparation of magnetic bubble memory

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15008880A JPS5773924A (en) 1980-10-28 1980-10-28 Preparation of magnetic bubble memory

Publications (1)

Publication Number Publication Date
JPS5773924A true JPS5773924A (en) 1982-05-08

Family

ID=15489245

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15008880A Pending JPS5773924A (en) 1980-10-28 1980-10-28 Preparation of magnetic bubble memory

Country Status (1)

Country Link
JP (1) JPS5773924A (en)

Similar Documents

Publication Publication Date Title
ATE43028T1 (en) METHOD OF MAKING A LAYERED STRUCTURE.
ES8507730A1 (en) Method of forming ohmic contacts.
JPS5522293A (en) Magnetic bubble memory element
JPS5773924A (en) Preparation of magnetic bubble memory
JPS6430248A (en) Formation of on-the-trench insulation film
JPS57204165A (en) Manufacture of charge coupling element
JPS5331964A (en) Production of semiconductor substrates
JPS5484932A (en) Forming method of multi-layer construction
JPS5773925A (en) Preparation of magnetic bubble element
JPS57180144A (en) Manufacture of semiconductor device
GB1348811A (en) Production of schottky contacts
JPS5370777A (en) Dielectric isolating method
JPS57188884A (en) Formation of recessed minute multilayer gate electrode
JPS57183618A (en) Thin film magnetic head
JPS5779643A (en) Semiconductor device
JPS5421293A (en) Inductance
JPS51120690A (en) Manufacturing method for semiconductor apparatus
JPS5717129A (en) Manufacture of semiconductor device
JPS5627940A (en) Manufacture of semiconductor elements
JPS5671978A (en) Preparation method of semiconductor system
JPS5779641A (en) Manufacture of semiconductor device
JPS546782A (en) Semiconductor device and its manufacture
JPS5378763A (en) Preparation for semiconductor device
JPS57210671A (en) Manufacture of semiconductor device
JPS522377A (en) Method of forming an electrode on a semiconductor element