JPS5760648A - Electron microscope - Google Patents

Electron microscope

Info

Publication number
JPS5760648A
JPS5760648A JP55134257A JP13425780A JPS5760648A JP S5760648 A JPS5760648 A JP S5760648A JP 55134257 A JP55134257 A JP 55134257A JP 13425780 A JP13425780 A JP 13425780A JP S5760648 A JPS5760648 A JP S5760648A
Authority
JP
Japan
Prior art keywords
lens
real image
image
objective lens
objective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP55134257A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6336108B2 (enrdf_load_stackoverflow
Inventor
Akira Yonezawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
INTERNATL PRECISION Inc
Original Assignee
INTERNATL PRECISION Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by INTERNATL PRECISION Inc filed Critical INTERNATL PRECISION Inc
Priority to JP55134257A priority Critical patent/JPS5760648A/ja
Publication of JPS5760648A publication Critical patent/JPS5760648A/ja
Publication of JPS6336108B2 publication Critical patent/JPS6336108B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
JP55134257A 1980-09-29 1980-09-29 Electron microscope Granted JPS5760648A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55134257A JPS5760648A (en) 1980-09-29 1980-09-29 Electron microscope

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55134257A JPS5760648A (en) 1980-09-29 1980-09-29 Electron microscope

Publications (2)

Publication Number Publication Date
JPS5760648A true JPS5760648A (en) 1982-04-12
JPS6336108B2 JPS6336108B2 (enrdf_load_stackoverflow) 1988-07-19

Family

ID=15124064

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55134257A Granted JPS5760648A (en) 1980-09-29 1980-09-29 Electron microscope

Country Status (1)

Country Link
JP (1) JPS5760648A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5861758A (ja) * 1981-10-09 1983-04-12 中島 昭 遠赤外線を利用する健康温熱器
JPS5927437A (ja) * 1982-08-09 1984-02-13 Internatl Precision Inc 電子顕微鏡の結像法
JPS5931548A (ja) * 1982-08-17 1984-02-20 Internatl Precision Inc 電子線装置の結像法
JP2007115409A (ja) * 2004-03-31 2007-05-10 Institute Of Physical & Chemical Research 電子線干渉装置および電子顕微鏡

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02246708A (ja) * 1989-03-16 1990-10-02 Fuji Electric Co Ltd 配電盤の接地試験台車

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4895768A (enrdf_load_stackoverflow) * 1972-03-17 1973-12-07
JPS526073A (en) * 1975-07-04 1977-01-18 Hitachi Ltd Magnetic field type electronic lens

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4895768A (enrdf_load_stackoverflow) * 1972-03-17 1973-12-07
JPS526073A (en) * 1975-07-04 1977-01-18 Hitachi Ltd Magnetic field type electronic lens

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5861758A (ja) * 1981-10-09 1983-04-12 中島 昭 遠赤外線を利用する健康温熱器
JPS5927437A (ja) * 1982-08-09 1984-02-13 Internatl Precision Inc 電子顕微鏡の結像法
JPS5931548A (ja) * 1982-08-17 1984-02-20 Internatl Precision Inc 電子線装置の結像法
JP2007115409A (ja) * 2004-03-31 2007-05-10 Institute Of Physical & Chemical Research 電子線干渉装置および電子顕微鏡
US7816648B2 (en) 2004-03-31 2010-10-19 Riken Electron interferometer or electron microscope

Also Published As

Publication number Publication date
JPS6336108B2 (enrdf_load_stackoverflow) 1988-07-19

Similar Documents

Publication Publication Date Title
GB1426359A (en) Microbeam probe apparatus
JP2810797B2 (ja) 反射電子顕微鏡
JPS5526538A (en) Optical system having movable lens group for focusing
GB763522A (en) An electron microscope
JPS55121259A (en) Elelctron microscope
JPS5730253A (en) Secondary electron detector for scan type electron microscope
JPS5760648A (en) Electron microscope
JPS57105715A (en) Uniform scanning lens having high resolving power
JPS5727551A (en) Electron microscope
KR900002716B1 (ko) 레이져묘화기의 집광광학장치
JPS5533716A (en) Electron microscope focusing lens system
JPS5944743B2 (ja) 走査電子顕微鏡等用照射電子レンズ系
GB865050A (en) Improvements in or relating to x-ray shadow microscopes with adjustable optical focussing
JPS55128243A (en) Electron microscope
JPS5667822A (en) Focal diaphragm
JPS6029187B2 (ja) 電子顕微鏡
JPS57212755A (en) Transmission-type electron microscope
JPS57111936A (en) Astigmatism correcting device for electron microscope
JPH0234142B2 (enrdf_load_stackoverflow)
SU600638A1 (ru) Двухкаскадный электростатический энергоанализатор
JPS56130066A (en) Photographing method of microscope image on electron microscope
JPS5715421A (en) Electron beam exposing device
JPS5652859A (en) Scanning type electron microscope
JPS6029185B2 (ja) 電子顕微鏡
JPS5632726A (en) Method for electron beam lithography