JPS5759328A - Method for fixed exfoliation of sample - Google Patents

Method for fixed exfoliation of sample

Info

Publication number
JPS5759328A
JPS5759328A JP55134618A JP13461880A JPS5759328A JP S5759328 A JPS5759328 A JP S5759328A JP 55134618 A JP55134618 A JP 55134618A JP 13461880 A JP13461880 A JP 13461880A JP S5759328 A JPS5759328 A JP S5759328A
Authority
JP
Japan
Prior art keywords
sample
resist
exfoliation
bonding agent
developing solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP55134618A
Other languages
English (en)
Japanese (ja)
Other versions
JPS623972B2 (enrdf_load_stackoverflow
Inventor
Toru Tojo
Tsutomu Ito
Yasunobu Kawachi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Shibaura Machine Co Ltd
Original Assignee
Toshiba Corp
Toshiba Machine Co Ltd
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Toshiba Machine Co Ltd, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP55134618A priority Critical patent/JPS5759328A/ja
Publication of JPS5759328A publication Critical patent/JPS5759328A/ja
Publication of JPS623972B2 publication Critical patent/JPS623972B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP55134618A 1980-09-27 1980-09-27 Method for fixed exfoliation of sample Granted JPS5759328A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55134618A JPS5759328A (en) 1980-09-27 1980-09-27 Method for fixed exfoliation of sample

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55134618A JPS5759328A (en) 1980-09-27 1980-09-27 Method for fixed exfoliation of sample

Publications (2)

Publication Number Publication Date
JPS5759328A true JPS5759328A (en) 1982-04-09
JPS623972B2 JPS623972B2 (enrdf_load_stackoverflow) 1987-01-28

Family

ID=15132593

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55134618A Granted JPS5759328A (en) 1980-09-27 1980-09-27 Method for fixed exfoliation of sample

Country Status (1)

Country Link
JP (1) JPS5759328A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59192834U (ja) * 1983-06-09 1984-12-21 富士通株式会社 基板保持構造

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63156477U (enrdf_load_stackoverflow) * 1987-04-01 1988-10-13
JPH02163477A (ja) * 1988-12-19 1990-06-22 Kayaba Ind Co Ltd 回転ピストンポンプ並びにモータ

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5318969A (en) * 1976-08-06 1978-02-21 Nippon Telegr & Teleph Corp <Ntt> Wafer fixing method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5318969A (en) * 1976-08-06 1978-02-21 Nippon Telegr & Teleph Corp <Ntt> Wafer fixing method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59192834U (ja) * 1983-06-09 1984-12-21 富士通株式会社 基板保持構造

Also Published As

Publication number Publication date
JPS623972B2 (enrdf_load_stackoverflow) 1987-01-28

Similar Documents

Publication Publication Date Title
FR2396286A1 (fr) Procede et systeme interferometriques pour la mesure de la vitesse de decapage de surfaces opaques
DE3260160D1 (en) Method of applying a resist pattern on a substrate, and resist material mixture
JPS5759328A (en) Method for fixed exfoliation of sample
JPS5377957A (en) Connecting meahod for material
JPS538188A (en) On-line measuring method for concentration of concentrated waste liquid
JPS5290798A (en) Exit window for charged particles
JPS54158870A (en) Etching method
JPS5587436A (en) Method of producing semiconductor device
JPS5421278A (en) Plasma etching method
JPS5352139A (en) Specimen supporting device
JPS5371A (en) Scribing method of semiconductor wafer
JPS5528083A (en) Focusing type optical transmission body array
JPS52106681A (en) Etching method
JPS549572A (en) Sample production method for transmission electronic microscope
JPS53106576A (en) Ion etching device
JPS5321573A (en) Etching method
JPS6430223A (en) Wetetching processor
JPS52104865A (en) X-ray analysis apparatus in electronic microscope or like
JPS5772328A (en) Electron beam exposure
JPS5210680A (en) Method of manufacturing photo-mask for photo etching
JPS6410239A (en) Method for forming positive type resist pattern
JPS53130033A (en) Electron beam sensitive material
JPS56133833A (en) Shaping of thin layer
Chrzanowski et al. Propagation of a Crack Nucleated Within the Specimen Body
Oftedal Nordic accent patterns in Scottish Gaelic