JPS5757871A - Vapor depositing device - Google Patents

Vapor depositing device

Info

Publication number
JPS5757871A
JPS5757871A JP13320480A JP13320480A JPS5757871A JP S5757871 A JPS5757871 A JP S5757871A JP 13320480 A JP13320480 A JP 13320480A JP 13320480 A JP13320480 A JP 13320480A JP S5757871 A JPS5757871 A JP S5757871A
Authority
JP
Japan
Prior art keywords
rings
parts
umbrellas
substrate
substrates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13320480A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6356310B2 (enrdf_load_stackoverflow
Inventor
Yasushi Taniguchi
Osamu Kamiya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP13320480A priority Critical patent/JPS5757871A/ja
Publication of JPS5757871A publication Critical patent/JPS5757871A/ja
Publication of JPS6356310B2 publication Critical patent/JPS6356310B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP13320480A 1980-09-24 1980-09-24 Vapor depositing device Granted JPS5757871A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13320480A JPS5757871A (en) 1980-09-24 1980-09-24 Vapor depositing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13320480A JPS5757871A (en) 1980-09-24 1980-09-24 Vapor depositing device

Publications (2)

Publication Number Publication Date
JPS5757871A true JPS5757871A (en) 1982-04-07
JPS6356310B2 JPS6356310B2 (enrdf_load_stackoverflow) 1988-11-08

Family

ID=15099158

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13320480A Granted JPS5757871A (en) 1980-09-24 1980-09-24 Vapor depositing device

Country Status (1)

Country Link
JP (1) JPS5757871A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63259857A (ja) * 1987-04-17 1988-10-26 Seiko Epson Corp 薄膜の製造方法
JPS6411972A (en) * 1987-07-02 1989-01-17 Seiko Epson Corp Substrate holding mechanism in thin film producing device
JP2007100123A (ja) * 2005-09-30 2007-04-19 Kyocera Kinseki Corp 真空蒸着装置
JP2009228050A (ja) * 2008-03-21 2009-10-08 Sumitomo Heavy Ind Ltd 被成膜物の支持機構

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63259857A (ja) * 1987-04-17 1988-10-26 Seiko Epson Corp 薄膜の製造方法
JPS6411972A (en) * 1987-07-02 1989-01-17 Seiko Epson Corp Substrate holding mechanism in thin film producing device
JP2007100123A (ja) * 2005-09-30 2007-04-19 Kyocera Kinseki Corp 真空蒸着装置
JP2009228050A (ja) * 2008-03-21 2009-10-08 Sumitomo Heavy Ind Ltd 被成膜物の支持機構

Also Published As

Publication number Publication date
JPS6356310B2 (enrdf_load_stackoverflow) 1988-11-08

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