JPS5756845A - Protective method of photoresist film - Google Patents

Protective method of photoresist film

Info

Publication number
JPS5756845A
JPS5756845A JP55132584A JP13258480A JPS5756845A JP S5756845 A JPS5756845 A JP S5756845A JP 55132584 A JP55132584 A JP 55132584A JP 13258480 A JP13258480 A JP 13258480A JP S5756845 A JPS5756845 A JP S5756845A
Authority
JP
Japan
Prior art keywords
film
crox
photoresist film
photoresist
adhere
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP55132584A
Other languages
Japanese (ja)
Inventor
Satoshi Araibara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP55132584A priority Critical patent/JPS5756845A/en
Publication of JPS5756845A publication Critical patent/JPS5756845A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings

Abstract

PURPOSE:To prevent peeling off of a photoresist film in case of tightly adhering and transferring a photomask, by making a chrome oxide film adhere into the whole surface of the photoresist film. CONSTITUTION:A metallic film 2 obtained by laminating a metallic chrome film and a CrOx film, whose thickness is 800-900Angstrom is made to adhere onto a glass substrate 1 by means of sputtering, a photoresist film 3 whose thickness is about 5,000Angstrom is applied on its upper surface, and a chrome oxide(CrOx) film is applied on the upper surface of said photoresist film 3, by which a protective film 9 is formed. When such a photomask megative 10 is made to tightly adhere to the master and is exposed by a position matching exposure device, peeling off of the photoresist film 3 is prevented since the CrOx film exists between both the organic films. In case a pattern of a resist film is formed by applying a phtotresist film onto a semiconductor substrate such as silicon, too, a pin hole is prevented by coating with the CrOx film in the thickness of about 100Angstrom to protect said film in the same way.
JP55132584A 1980-09-24 1980-09-24 Protective method of photoresist film Pending JPS5756845A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55132584A JPS5756845A (en) 1980-09-24 1980-09-24 Protective method of photoresist film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55132584A JPS5756845A (en) 1980-09-24 1980-09-24 Protective method of photoresist film

Publications (1)

Publication Number Publication Date
JPS5756845A true JPS5756845A (en) 1982-04-05

Family

ID=15084746

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55132584A Pending JPS5756845A (en) 1980-09-24 1980-09-24 Protective method of photoresist film

Country Status (1)

Country Link
JP (1) JPS5756845A (en)

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