JPS5754277A - Plasma cleaning apparatus - Google Patents
Plasma cleaning apparatusInfo
- Publication number
- JPS5754277A JPS5754277A JP12909980A JP12909980A JPS5754277A JP S5754277 A JPS5754277 A JP S5754277A JP 12909980 A JP12909980 A JP 12909980A JP 12909980 A JP12909980 A JP 12909980A JP S5754277 A JPS5754277 A JP S5754277A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- substrate
- magnetic field
- plasma
- time
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE:To provide the titled apparatus increasing discharge current and capable of cleaning a substrate in a short time comprising constituting by providing a magnet assemblage to a rear side of an electrode opposed to the substrate so as to act a magnetic field thereof in front of the electrode in a condition almost crossing the front surface thereof at right angles. CONSTITUTION:In a condition evacuating an inside of a treating chamber 1, negative voltage is applied to each electrode 8 to generate glow discharge in front of said electrode 8 as well as a substrate (a) is tranferred along a transfer passage 2. Therefore, during a time when each substrate (a) is passed in front of the electrode 8, ion in plasma generated by the glow discharge is acted thereto to apply plasma cleaning treatment thereto due to ion bombardment. During this time, by a magnet assemblage 11 positioned at a rear side of the electrode 8, a magnetic field in a direction almost crossing a front surface thereof is acted in front of said apparatus. That is, by this magnetic field, dissipation of plasma is inhibited to increase discharge current and the substrate 2 is continuously subjected to cleaning treatment in a short time. Further, 9 in a figure shows an insulator.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12909980A JPS6053752B2 (en) | 1980-09-19 | 1980-09-19 | plasma cleaning equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12909980A JPS6053752B2 (en) | 1980-09-19 | 1980-09-19 | plasma cleaning equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5754277A true JPS5754277A (en) | 1982-03-31 |
JPS6053752B2 JPS6053752B2 (en) | 1985-11-27 |
Family
ID=15001040
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12909980A Expired JPS6053752B2 (en) | 1980-09-19 | 1980-09-19 | plasma cleaning equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6053752B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS616285A (en) * | 1984-03-06 | 1986-01-11 | ア−エスエム フイコ ツ−リング ベスロ−テン フエン ノ−トチヤツプ | Method and device for purifying mold by reversal sputtering |
-
1980
- 1980-09-19 JP JP12909980A patent/JPS6053752B2/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS616285A (en) * | 1984-03-06 | 1986-01-11 | ア−エスエム フイコ ツ−リング ベスロ−テン フエン ノ−トチヤツプ | Method and device for purifying mold by reversal sputtering |
Also Published As
Publication number | Publication date |
---|---|
JPS6053752B2 (en) | 1985-11-27 |
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