JPS5754277A - Plasma cleaning apparatus - Google Patents

Plasma cleaning apparatus

Info

Publication number
JPS5754277A
JPS5754277A JP12909980A JP12909980A JPS5754277A JP S5754277 A JPS5754277 A JP S5754277A JP 12909980 A JP12909980 A JP 12909980A JP 12909980 A JP12909980 A JP 12909980A JP S5754277 A JPS5754277 A JP S5754277A
Authority
JP
Japan
Prior art keywords
electrode
substrate
magnetic field
plasma
time
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12909980A
Other languages
Japanese (ja)
Other versions
JPS6053752B2 (en
Inventor
Hisaharu Obinata
Takashi Matsumoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP12909980A priority Critical patent/JPS6053752B2/en
Publication of JPS5754277A publication Critical patent/JPS5754277A/en
Publication of JPS6053752B2 publication Critical patent/JPS6053752B2/en
Expired legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE:To provide the titled apparatus increasing discharge current and capable of cleaning a substrate in a short time comprising constituting by providing a magnet assemblage to a rear side of an electrode opposed to the substrate so as to act a magnetic field thereof in front of the electrode in a condition almost crossing the front surface thereof at right angles. CONSTITUTION:In a condition evacuating an inside of a treating chamber 1, negative voltage is applied to each electrode 8 to generate glow discharge in front of said electrode 8 as well as a substrate (a) is tranferred along a transfer passage 2. Therefore, during a time when each substrate (a) is passed in front of the electrode 8, ion in plasma generated by the glow discharge is acted thereto to apply plasma cleaning treatment thereto due to ion bombardment. During this time, by a magnet assemblage 11 positioned at a rear side of the electrode 8, a magnetic field in a direction almost crossing a front surface thereof is acted in front of said apparatus. That is, by this magnetic field, dissipation of plasma is inhibited to increase discharge current and the substrate 2 is continuously subjected to cleaning treatment in a short time. Further, 9 in a figure shows an insulator.
JP12909980A 1980-09-19 1980-09-19 plasma cleaning equipment Expired JPS6053752B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12909980A JPS6053752B2 (en) 1980-09-19 1980-09-19 plasma cleaning equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12909980A JPS6053752B2 (en) 1980-09-19 1980-09-19 plasma cleaning equipment

Publications (2)

Publication Number Publication Date
JPS5754277A true JPS5754277A (en) 1982-03-31
JPS6053752B2 JPS6053752B2 (en) 1985-11-27

Family

ID=15001040

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12909980A Expired JPS6053752B2 (en) 1980-09-19 1980-09-19 plasma cleaning equipment

Country Status (1)

Country Link
JP (1) JPS6053752B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS616285A (en) * 1984-03-06 1986-01-11 ア−エスエム　フイコ　ツ−リング　ベスロ−テン　フエン　ノ−トチヤツプ Method and device for purifying mold by reversal sputtering

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS616285A (en) * 1984-03-06 1986-01-11 ア−エスエム　フイコ　ツ−リング　ベスロ−テン　フエン　ノ−トチヤツプ Method and device for purifying mold by reversal sputtering

Also Published As

Publication number Publication date
JPS6053752B2 (en) 1985-11-27

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