JPS5752051A - Formation of resist pattern - Google Patents
Formation of resist patternInfo
- Publication number
- JPS5752051A JPS5752051A JP12672680A JP12672680A JPS5752051A JP S5752051 A JPS5752051 A JP S5752051A JP 12672680 A JP12672680 A JP 12672680A JP 12672680 A JP12672680 A JP 12672680A JP S5752051 A JPS5752051 A JP S5752051A
- Authority
- JP
- Japan
- Prior art keywords
- contg
- pattern
- resist
- dry etching
- radiation sensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
- G03F7/405—Treatment with inorganic or organometallic reagents after imagewise removal
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Electron Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12672680A JPS5752051A (en) | 1980-09-12 | 1980-09-12 | Formation of resist pattern |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12672680A JPS5752051A (en) | 1980-09-12 | 1980-09-12 | Formation of resist pattern |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5752051A true JPS5752051A (en) | 1982-03-27 |
Family
ID=14942345
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12672680A Pending JPS5752051A (en) | 1980-09-12 | 1980-09-12 | Formation of resist pattern |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5752051A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0210362A (ja) * | 1988-06-29 | 1990-01-16 | Matsushita Electric Ind Co Ltd | 微細パターン形成方法 |
EP0383200A2 (de) * | 1989-02-17 | 1990-08-22 | BASF Aktiengesellschaft | Verfahren zur Herstellung von photopolymerisierten Reliefdruckplatten mit klebfreier Oberfäche |
-
1980
- 1980-09-12 JP JP12672680A patent/JPS5752051A/ja active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0210362A (ja) * | 1988-06-29 | 1990-01-16 | Matsushita Electric Ind Co Ltd | 微細パターン形成方法 |
EP0383200A2 (de) * | 1989-02-17 | 1990-08-22 | BASF Aktiengesellschaft | Verfahren zur Herstellung von photopolymerisierten Reliefdruckplatten mit klebfreier Oberfäche |
US5124237A (en) * | 1989-02-17 | 1992-06-23 | Basf Aktiengesellschaft | Production of photopolymerized relief printing plates having a non-tacky surface |
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