JPS5748225A - Film forming method - Google Patents
Film forming methodInfo
- Publication number
- JPS5748225A JPS5748225A JP55122787A JP12278780A JPS5748225A JP S5748225 A JPS5748225 A JP S5748225A JP 55122787 A JP55122787 A JP 55122787A JP 12278780 A JP12278780 A JP 12278780A JP S5748225 A JPS5748225 A JP S5748225A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- film
- clusters
- chamber
- adhered
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 abstract 4
- 239000004065 semiconductor Substances 0.000 abstract 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 abstract 1
- 230000004913 activation Effects 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 230000006698 induction Effects 0.000 abstract 1
- 229910000077 silane Inorganic materials 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/20—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
- H01L31/202—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials including only elements of Group IV of the Periodic Table
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Plasma & Fusion (AREA)
- Electromagnetism (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Photovoltaic Devices (AREA)
Abstract
PURPOSE:To obtain a semi-amorphous film which is suitable for a high-efficiency photoelectric transducer, by a method wherein, Si, Ge or compound of them is activated and clusterized at the position apart from a substrate and these clusters are adhered to the substrate so as to form a film. CONSTITUTION:An activation chamber 1 is provided at the position apart from a reaction chamber 7 which contains a boat 9 on which a substrate 10 is mounted. Reactive gas mach as silane is introduced from bombs 4-6 into the chamber 7 so as to be excited or activated or degenerated by induction energy of 0.1-10GHz generated by an oscillator 3 and transmitted by an isolator matching device 2 and is condensed to form clusters. The clusters are adhered and accumulated on the substrate 10 to form a film. With the above method a semi-amorphous semiconductor film which has intermediate properties inbetween a crystalline semiconductor and an amorphous semiconductor and is suitable for a high-efficiency photoelectric transducer is obtained.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55122787A JPS5748225A (en) | 1980-09-04 | 1980-09-04 | Film forming method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55122787A JPS5748225A (en) | 1980-09-04 | 1980-09-04 | Film forming method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5748225A true JPS5748225A (en) | 1982-03-19 |
Family
ID=14844602
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55122787A Pending JPS5748225A (en) | 1980-09-04 | 1980-09-04 | Film forming method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5748225A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59141965A (en) * | 1983-02-02 | 1984-08-14 | 三菱電機株式会社 | Golf exerciser |
JPS62172479U (en) * | 1986-04-24 | 1987-11-02 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5478524A (en) * | 1977-11-19 | 1979-06-22 | Concordia Fluidtechnik Gmbh | Flowinggthrough valve for fluid |
-
1980
- 1980-09-04 JP JP55122787A patent/JPS5748225A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5478524A (en) * | 1977-11-19 | 1979-06-22 | Concordia Fluidtechnik Gmbh | Flowinggthrough valve for fluid |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59141965A (en) * | 1983-02-02 | 1984-08-14 | 三菱電機株式会社 | Golf exerciser |
JPS62172479U (en) * | 1986-04-24 | 1987-11-02 |
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