JPS5721965A - Ruggedly forming method by electron beam irradiation - Google Patents

Ruggedly forming method by electron beam irradiation

Info

Publication number
JPS5721965A
JPS5721965A JP9651880A JP9651880A JPS5721965A JP S5721965 A JPS5721965 A JP S5721965A JP 9651880 A JP9651880 A JP 9651880A JP 9651880 A JP9651880 A JP 9651880A JP S5721965 A JPS5721965 A JP S5721965A
Authority
JP
Japan
Prior art keywords
electron beam
mold
ruggedly
liquid
hardened
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9651880A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0142747B2 (enrdf_load_html_response
Inventor
Koji Orihara
Masahiro Shimoyamada
Mitsuharu Nakamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP9651880A priority Critical patent/JPS5721965A/ja
Publication of JPS5721965A publication Critical patent/JPS5721965A/ja
Publication of JPH0142747B2 publication Critical patent/JPH0142747B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Application Of Or Painting With Fluid Materials (AREA)
  • Laminated Bodies (AREA)
JP9651880A 1980-07-15 1980-07-15 Ruggedly forming method by electron beam irradiation Granted JPS5721965A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9651880A JPS5721965A (en) 1980-07-15 1980-07-15 Ruggedly forming method by electron beam irradiation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9651880A JPS5721965A (en) 1980-07-15 1980-07-15 Ruggedly forming method by electron beam irradiation

Publications (2)

Publication Number Publication Date
JPS5721965A true JPS5721965A (en) 1982-02-04
JPH0142747B2 JPH0142747B2 (enrdf_load_html_response) 1989-09-14

Family

ID=14167354

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9651880A Granted JPS5721965A (en) 1980-07-15 1980-07-15 Ruggedly forming method by electron beam irradiation

Country Status (1)

Country Link
JP (1) JPS5721965A (enrdf_load_html_response)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5759667A (en) * 1980-09-29 1982-04-10 Toyo Ink Mfg Co Ltd Curing method using electron beam radiation
JPS5954552A (ja) * 1982-09-22 1984-03-29 凸版印刷株式会社 艶変化模様を有する塩化ビニル金属積層板の製造方法
JPS61277945A (ja) * 1985-06-01 1986-12-08 Konishiroku Photo Ind Co Ltd 写真感光材料の製造方法
JPS61277946A (ja) * 1985-06-01 1986-12-08 Konishiroku Photo Ind Co Ltd 写真感光材料の製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4934750A (enrdf_load_html_response) * 1972-07-31 1974-03-30

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4934750A (enrdf_load_html_response) * 1972-07-31 1974-03-30

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5759667A (en) * 1980-09-29 1982-04-10 Toyo Ink Mfg Co Ltd Curing method using electron beam radiation
JPS5954552A (ja) * 1982-09-22 1984-03-29 凸版印刷株式会社 艶変化模様を有する塩化ビニル金属積層板の製造方法
JPS61277945A (ja) * 1985-06-01 1986-12-08 Konishiroku Photo Ind Co Ltd 写真感光材料の製造方法
JPS61277946A (ja) * 1985-06-01 1986-12-08 Konishiroku Photo Ind Co Ltd 写真感光材料の製造方法

Also Published As

Publication number Publication date
JPH0142747B2 (enrdf_load_html_response) 1989-09-14

Similar Documents

Publication Publication Date Title
JPS5619758A (en) Preparation of gravure cylinder made of resin
JPS5356500A (en) Method of and apparatus for washing equipment for drying and solidifying radioactive waste liquid
ATE30804T1 (de) Verfahren zum dekontaminieren der oberflaeche eines gegenstands.
JPS5721965A (en) Ruggedly forming method by electron beam irradiation
GB2017003A (en) Offset or lithographic printing process and apparatus for formation of continuous patterns
JPS5721966A (en) Continuous ruggedly forming method by electron beam irradiation
FR2412147A1 (fr) Procede et appareil pour le stockage des matieres radioactives
ATE98927T1 (de) Verfahren zum herstellen eines festen gegenstandes.
JPS57168838A (en) Manufacture of fine nozzle
JPS5749530A (en) Manufacture of replica
JPS5222598A (en) Etching method of chromium oxide
JPS52143775A (en) Reduction projecting and printing method and reduction projecting and printing apparatus used in this method
JPS56159122A (en) Method of forming uneven pattern
JPS5269291A (en) Charge removing method
JPS5496369A (en) Mask forming method
JPS51145270A (en) Method of errosive-printing elaborate pattern on metal plate, semicond uctor, etc.
JPS563679A (en) Formation of metallic pattern
JPS5511717A (en) Processing method for surface pattern by sandblast
JPS56117860A (en) Production of mold
JPS53140216A (en) Removing method for hot iron desulfurization slag
FR2382523A1 (fr) Procede d'elimination selective d'un materiau semiconducteur par rapport a un autre materiau semiconducteur, et produit en resultant
JPS53148857A (en) Method and device for washing concrete residues in concrete mixer
JPS56109781A (en) Production of ornamental board
JPS53120269A (en) Partial film formation method
JPS52123170A (en) Insulation method of electrodes of semiconductor elements