JPS57211233A - Test of mask - Google Patents
Test of maskInfo
- Publication number
- JPS57211233A JPS57211233A JP9891081A JP9891081A JPS57211233A JP S57211233 A JPS57211233 A JP S57211233A JP 9891081 A JP9891081 A JP 9891081A JP 9891081 A JP9891081 A JP 9891081A JP S57211233 A JPS57211233 A JP S57211233A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- works
- progress
- sets
- patterns
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 abstract 2
- 239000011521 glass Substances 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 230000009469 supplementation Effects 0.000 abstract 1
- 238000010998 test method Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/44—Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54406—Marks applied to semiconductor devices or parts comprising alphanumeric information
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54473—Marks applied to semiconductor devices or parts for use after dicing
- H01L2223/5448—Located on chip prior to dicing and remaining on chip after dicing
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9891081A JPS57211233A (en) | 1981-06-22 | 1981-06-22 | Test of mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9891081A JPS57211233A (en) | 1981-06-22 | 1981-06-22 | Test of mask |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57211233A true JPS57211233A (en) | 1982-12-25 |
| JPS6239814B2 JPS6239814B2 (enrdf_load_stackoverflow) | 1987-08-25 |
Family
ID=14232282
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9891081A Granted JPS57211233A (en) | 1981-06-22 | 1981-06-22 | Test of mask |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57211233A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6216528A (ja) * | 1985-07-16 | 1987-01-24 | Hoya Corp | Ａｌ膜付き基板 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55132039A (en) * | 1979-04-02 | 1980-10-14 | Mitsubishi Electric Corp | Forming method for repeated figure |
| JPS55165629A (en) * | 1979-06-11 | 1980-12-24 | Matsushita Electric Ind Co Ltd | Manufacture of semiconductor device |
-
1981
- 1981-06-22 JP JP9891081A patent/JPS57211233A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55132039A (en) * | 1979-04-02 | 1980-10-14 | Mitsubishi Electric Corp | Forming method for repeated figure |
| JPS55165629A (en) * | 1979-06-11 | 1980-12-24 | Matsushita Electric Ind Co Ltd | Manufacture of semiconductor device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6216528A (ja) * | 1985-07-16 | 1987-01-24 | Hoya Corp | Ａｌ膜付き基板 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6239814B2 (enrdf_load_stackoverflow) | 1987-08-25 |
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