JPS57211233A - Test of mask - Google Patents

Test of mask

Info

Publication number
JPS57211233A
JPS57211233A JP9891081A JP9891081A JPS57211233A JP S57211233 A JPS57211233 A JP S57211233A JP 9891081 A JP9891081 A JP 9891081A JP 9891081 A JP9891081 A JP 9891081A JP S57211233 A JPS57211233 A JP S57211233A
Authority
JP
Japan
Prior art keywords
mask
works
progress
sets
patterns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9891081A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6239814B2 (enrdf_load_stackoverflow
Inventor
Hiroaki Morimoto
Kazunori Saito
Yaichiro Watakabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP9891081A priority Critical patent/JPS57211233A/ja
Publication of JPS57211233A publication Critical patent/JPS57211233A/ja
Publication of JPS6239814B2 publication Critical patent/JPS6239814B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/44—Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544—Marks applied to semiconductor devices or parts
    • H01L2223/54406—Marks applied to semiconductor devices or parts comprising alphanumeric information
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544—Marks applied to semiconductor devices or parts
    • H01L2223/54473—Marks applied to semiconductor devices or parts for use after dicing
    • H01L2223/5448—Located on chip prior to dicing and remaining on chip after dicing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP9891081A 1981-06-22 1981-06-22 Test of mask Granted JPS57211233A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9891081A JPS57211233A (en) 1981-06-22 1981-06-22 Test of mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9891081A JPS57211233A (en) 1981-06-22 1981-06-22 Test of mask

Publications (2)

Publication Number Publication Date
JPS57211233A true JPS57211233A (en) 1982-12-25
JPS6239814B2 JPS6239814B2 (enrdf_load_stackoverflow) 1987-08-25

Family

ID=14232282

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9891081A Granted JPS57211233A (en) 1981-06-22 1981-06-22 Test of mask

Country Status (1)

Country Link
JP (1) JPS57211233A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6216528A (ja) * 1985-07-16 1987-01-24 Hoya Corp Ａｌ膜付き基板

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55132039A (en) * 1979-04-02 1980-10-14 Mitsubishi Electric Corp Forming method for repeated figure
JPS55165629A (en) * 1979-06-11 1980-12-24 Matsushita Electric Ind Co Ltd Manufacture of semiconductor device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55132039A (en) * 1979-04-02 1980-10-14 Mitsubishi Electric Corp Forming method for repeated figure
JPS55165629A (en) * 1979-06-11 1980-12-24 Matsushita Electric Ind Co Ltd Manufacture of semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6216528A (ja) * 1985-07-16 1987-01-24 Hoya Corp Ａｌ膜付き基板

Also Published As

Publication number Publication date
JPS6239814B2 (enrdf_load_stackoverflow) 1987-08-25

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