JPS57210633A - Surface treating device for 3-5 family compound semiconductor - Google Patents
Surface treating device for 3-5 family compound semiconductorInfo
- Publication number
- JPS57210633A JPS57210633A JP3211582A JP3211582A JPS57210633A JP S57210633 A JPS57210633 A JP S57210633A JP 3211582 A JP3211582 A JP 3211582A JP 3211582 A JP3211582 A JP 3211582A JP S57210633 A JPS57210633 A JP S57210633A
- Authority
- JP
- Japan
- Prior art keywords
- vessel
- introducing
- port
- discharging port
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3211582A JPS57210633A (en) | 1982-03-01 | 1982-03-01 | Surface treating device for 3-5 family compound semiconductor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3211582A JPS57210633A (en) | 1982-03-01 | 1982-03-01 | Surface treating device for 3-5 family compound semiconductor |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11341174A Division JPS5140766A (en) | 1974-10-02 | 1974-10-02 | 33v zokukagobutsuhandotaino hyomenshorihoho |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS57210633A true JPS57210633A (en) | 1982-12-24 |
Family
ID=12349897
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3211582A Pending JPS57210633A (en) | 1982-03-01 | 1982-03-01 | Surface treating device for 3-5 family compound semiconductor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57210633A (ja) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04280447A (ja) * | 1991-03-07 | 1992-10-06 | Sumitomo Electric Ind Ltd | ｐ型ＩｎＰ基板とその評価方法 |
| JPH04354327A (ja) * | 1991-05-31 | 1992-12-08 | Shin Etsu Handotai Co Ltd | 化合物半導体発光素子及びその製造方法 |
| US6328809B1 (en) | 1998-10-09 | 2001-12-11 | Scp Global Technologies, Inc. | Vapor drying system and method |
-
1982
- 1982-03-01 JP JP3211582A patent/JPS57210633A/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04280447A (ja) * | 1991-03-07 | 1992-10-06 | Sumitomo Electric Ind Ltd | ｐ型ＩｎＰ基板とその評価方法 |
| JPH04354327A (ja) * | 1991-05-31 | 1992-12-08 | Shin Etsu Handotai Co Ltd | 化合物半導体発光素子及びその製造方法 |
| US6328809B1 (en) | 1998-10-09 | 2001-12-11 | Scp Global Technologies, Inc. | Vapor drying system and method |
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