JPS57210627A - Detecting method for defect of pattern - Google Patents
Detecting method for defect of patternInfo
- Publication number
- JPS57210627A JPS57210627A JP9384381A JP9384381A JPS57210627A JP S57210627 A JPS57210627 A JP S57210627A JP 9384381 A JP9384381 A JP 9384381A JP 9384381 A JP9384381 A JP 9384381A JP S57210627 A JPS57210627 A JP S57210627A
- Authority
- JP
- Japan
- Prior art keywords
- patterns
- pattern
- defect
- corner sections
- detected
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000007547 defect Effects 0.000 title abstract 3
- 238000001514 detection method Methods 0.000 abstract 1
- 230000015654 memory Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9384381A JPS57210627A (en) | 1981-06-19 | 1981-06-19 | Detecting method for defect of pattern |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9384381A JPS57210627A (en) | 1981-06-19 | 1981-06-19 | Detecting method for defect of pattern |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57210627A true JPS57210627A (en) | 1982-12-24 |
| JPS6239813B2 JPS6239813B2 (enExample) | 1987-08-25 |
Family
ID=14093675
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9384381A Granted JPS57210627A (en) | 1981-06-19 | 1981-06-19 | Detecting method for defect of pattern |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57210627A (enExample) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50131469A (enExample) * | 1974-04-03 | 1975-10-17 | ||
| JPS53117978A (en) * | 1977-03-25 | 1978-10-14 | Hitachi Ltd | Automatic mask appearance inspection apparatus |
-
1981
- 1981-06-19 JP JP9384381A patent/JPS57210627A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50131469A (enExample) * | 1974-04-03 | 1975-10-17 | ||
| JPS53117978A (en) * | 1977-03-25 | 1978-10-14 | Hitachi Ltd | Automatic mask appearance inspection apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6239813B2 (enExample) | 1987-08-25 |
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