JPS57207334A - Photomask - Google Patents

Photomask

Info

Publication number
JPS57207334A
JPS57207334A JP56091785A JP9178581A JPS57207334A JP S57207334 A JPS57207334 A JP S57207334A JP 56091785 A JP56091785 A JP 56091785A JP 9178581 A JP9178581 A JP 9178581A JP S57207334 A JPS57207334 A JP S57207334A
Authority
JP
Japan
Prior art keywords
film
binder
substrate
powder
magnetized regions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56091785A
Other languages
Japanese (ja)
Inventor
Atsushi Miyahara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP56091785A priority Critical patent/JPS57207334A/en
Publication of JPS57207334A publication Critical patent/JPS57207334A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To obtain the photomask without using exposure technology by depositing a light transmitted ferromagnetic film, wherein magnetizing regions are formed, on a glass substrate, and absorbing and fixing a light transmitting ferromagnetic powder body layer on the magnetized regions. CONSTITUTION:Needle shaped FexOy crystals, wherein a binder is mixed at a desired ratio and their lengths are 1mum or less, are flatly applied to the thickness of about 5mum and solidified at about 130 deg.C. Then the magnetism orientation is performed and the transparent ferromagnetic film 2 is obtained. Thereafter the glass substrate 1 on which the FexOy film 2 is provided is placed on a precision XY table 5. A magnetic head 6 is approached, and magnetic pulses are sent to form magnetized regions 3 with the table 5 being moved based on the digital data of a reticle pattern. The Fe powder 8 coated by the binder is placed in a container 7 to the thickness of about 0.5mum. The film 2 of the substrate 1 is approached, the Fe powder 8 is deposited on the magnetized regions 3, the substrate 1 is heated at about 130 deg.C, the binder is melted and solidified, a light screening pattern 4 is formed, and the reticle is completed.
JP56091785A 1981-06-15 1981-06-15 Photomask Pending JPS57207334A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56091785A JPS57207334A (en) 1981-06-15 1981-06-15 Photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56091785A JPS57207334A (en) 1981-06-15 1981-06-15 Photomask

Publications (1)

Publication Number Publication Date
JPS57207334A true JPS57207334A (en) 1982-12-20

Family

ID=14036246

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56091785A Pending JPS57207334A (en) 1981-06-15 1981-06-15 Photomask

Country Status (1)

Country Link
JP (1) JPS57207334A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102233743A (en) * 2010-04-21 2011-11-09 北京京东方光电科技有限公司 Mask graph transfer-printing device and method for preparing mask graph

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102233743A (en) * 2010-04-21 2011-11-09 北京京东方光电科技有限公司 Mask graph transfer-printing device and method for preparing mask graph
US8935982B2 (en) 2010-04-21 2015-01-20 Beijing Boe Optoelectronics Technology Co., Ltd. Transfer printing apparatus for mask pattern and mask pattern preparation method

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