JPS57204116A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS57204116A JPS57204116A JP9011681A JP9011681A JPS57204116A JP S57204116 A JPS57204116 A JP S57204116A JP 9011681 A JP9011681 A JP 9011681A JP 9011681 A JP9011681 A JP 9011681A JP S57204116 A JPS57204116 A JP S57204116A
- Authority
- JP
- Japan
- Prior art keywords
- wafers
- wax
- wafer
- semiconductor device
- impurity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Bipolar Transistors (AREA)
Abstract
PURPOSE:To prevent the cracking of wafers, and to improve productivity by stacking the wafers by using an adhesive material containing an impurity and wax and treating the wafers. CONSTITUTION:A PSG layer 12 is formed to the surface of an N type Si wafer 4, a plurality of the wafers are stacked and thermally treated and N<+> type layers 3 are shaped while the wafers are bonded, the wafers are cut at central positions in the thickness direction of the wafers, the impurity is diffused to both surfaces, and elements 13 are formed. These wafers 14 are bonded by the wax, the PSG sections 12 are cut, the wax is thermally melted and the wafer is separated into two wafers, and an electrode is shaped at a predetermined section, thus forming the semiconductor device. Accordingly, the fracture of the wafers is decreased, the wafer with a large diameter can be treated, and productivity is improved.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9011681A JPS57204116A (en) | 1981-06-09 | 1981-06-09 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9011681A JPS57204116A (en) | 1981-06-09 | 1981-06-09 | Manufacture of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57204116A true JPS57204116A (en) | 1982-12-14 |
Family
ID=13989539
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9011681A Pending JPS57204116A (en) | 1981-06-09 | 1981-06-09 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57204116A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5489555A (en) * | 1992-04-16 | 1996-02-06 | Semiconductor Energy Laboratory Co., Ltd. | Method for forming a photoelectric conversion device |
-
1981
- 1981-06-09 JP JP9011681A patent/JPS57204116A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5489555A (en) * | 1992-04-16 | 1996-02-06 | Semiconductor Energy Laboratory Co., Ltd. | Method for forming a photoelectric conversion device |
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