JPS5720369A - Production of thermal head - Google Patents

Production of thermal head

Info

Publication number
JPS5720369A
JPS5720369A JP9445080A JP9445080A JPS5720369A JP S5720369 A JPS5720369 A JP S5720369A JP 9445080 A JP9445080 A JP 9445080A JP 9445080 A JP9445080 A JP 9445080A JP S5720369 A JPS5720369 A JP S5720369A
Authority
JP
Japan
Prior art keywords
thermal head
conductor layer
pattern
laminate
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9445080A
Other languages
Japanese (ja)
Inventor
Takayuki Yamaguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP9445080A priority Critical patent/JPS5720369A/en
Publication of JPS5720369A publication Critical patent/JPS5720369A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electronic Switches (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)

Abstract

PURPOSE: To obtain a thermal head with a pattern of high precision by a method wherein after a resistor layer and a conductor layer are uniformly laminated on a substrate, or after the thus obtained laminate is etched to form a desired pattern, the laminate is subjected to a light etching treatment.
CONSTITUTION: The resistor layer and the conductor layer are uniformly laminated on the substrate, and the desired pattern is formed by etching the laminate to produce the thermal head. In this case, after laminating the conductor layer or after forming the pattern, the laminate is subjected to the light etching treatment to roughen the surface of the conductor layer. The light etching treatment consists in lightly etching a surface layer of about 0.1W0.3μm in thickness, and it may be conducted following to forming the conductor layer or may be conducted after forming the pattern for the thermal head.
COPYRIGHT: (C)1982,JPO&Japio
JP9445080A 1980-07-10 1980-07-10 Production of thermal head Pending JPS5720369A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9445080A JPS5720369A (en) 1980-07-10 1980-07-10 Production of thermal head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9445080A JPS5720369A (en) 1980-07-10 1980-07-10 Production of thermal head

Publications (1)

Publication Number Publication Date
JPS5720369A true JPS5720369A (en) 1982-02-02

Family

ID=14110591

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9445080A Pending JPS5720369A (en) 1980-07-10 1980-07-10 Production of thermal head

Country Status (1)

Country Link
JP (1) JPS5720369A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012228871A (en) * 2011-04-13 2012-11-22 Rohm Co Ltd Thermal head and method for manufacturing the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012228871A (en) * 2011-04-13 2012-11-22 Rohm Co Ltd Thermal head and method for manufacturing the same

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