JPS57192420A - Photopolymer composition - Google Patents

Photopolymer composition

Info

Publication number
JPS57192420A
JPS57192420A JP6446581A JP6446581A JPS57192420A JP S57192420 A JPS57192420 A JP S57192420A JP 6446581 A JP6446581 A JP 6446581A JP 6446581 A JP6446581 A JP 6446581A JP S57192420 A JPS57192420 A JP S57192420A
Authority
JP
Japan
Prior art keywords
component
components
amino group
total
aliphatic amino
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6446581A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0411856B2 (enrdf_load_stackoverflow
Inventor
Takashi Yamadera
Nobuyuki Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP6446581A priority Critical patent/JPS57192420A/ja
Priority to US06/370,295 priority patent/US4454219A/en
Priority to DE19823215513 priority patent/DE3215513C3/de
Priority to GB8211964A priority patent/GB2100278B/en
Priority to DE3249708A priority patent/DE3249708C3/de
Publication of JPS57192420A publication Critical patent/JPS57192420A/ja
Publication of JPH0411856B2 publication Critical patent/JPH0411856B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Graft Or Block Polymers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP6446581A 1981-04-27 1981-04-27 Photopolymer composition Granted JPS57192420A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP6446581A JPS57192420A (en) 1981-04-27 1981-04-27 Photopolymer composition
US06/370,295 US4454219A (en) 1981-04-27 1982-04-20 Photosensitive resin composition comprised of a polymer obtained from an aliphatic amino group-containing monomer as a comonomer
DE19823215513 DE3215513C3 (de) 1981-04-27 1982-04-26 Photoempfindliche Harzmasse
GB8211964A GB2100278B (en) 1981-04-27 1982-04-26 Photosensitive resin composition
DE3249708A DE3249708C3 (de) 1981-04-27 1982-04-26 Lichtempfindliches Element aus einem Träger und einer lichtempfindlichen Schicht

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6446581A JPS57192420A (en) 1981-04-27 1981-04-27 Photopolymer composition

Publications (2)

Publication Number Publication Date
JPS57192420A true JPS57192420A (en) 1982-11-26
JPH0411856B2 JPH0411856B2 (enrdf_load_stackoverflow) 1992-03-02

Family

ID=13259001

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6446581A Granted JPS57192420A (en) 1981-04-27 1981-04-27 Photopolymer composition

Country Status (1)

Country Link
JP (1) JPS57192420A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5823812A (ja) * 1981-08-03 1983-02-12 Mitsui Toatsu Chem Inc 紫外線硬化樹脂組成物
JPS5893046A (ja) * 1981-11-28 1983-06-02 Hitachi Chem Co Ltd 感光性エレメント
JPS58102230A (ja) * 1981-12-15 1983-06-17 Hitachi Chem Co Ltd 感光性樹脂組成物

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5117285A (ja) * 1974-08-05 1976-02-12 Asahi Chemical Ind Hikarijugoseisoseibutsu
JPS529424A (en) * 1975-07-11 1977-01-25 Toyobo Co Ltd Photosensitive compositions
JPS5638458A (en) * 1979-09-05 1981-04-13 Toray Ind Inc Formation of resist pattern
JPS5655941A (en) * 1979-10-12 1981-05-16 Toray Ind Inc Photosensitive material

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5117285A (ja) * 1974-08-05 1976-02-12 Asahi Chemical Ind Hikarijugoseisoseibutsu
JPS529424A (en) * 1975-07-11 1977-01-25 Toyobo Co Ltd Photosensitive compositions
JPS5638458A (en) * 1979-09-05 1981-04-13 Toray Ind Inc Formation of resist pattern
JPS5655941A (en) * 1979-10-12 1981-05-16 Toray Ind Inc Photosensitive material

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5823812A (ja) * 1981-08-03 1983-02-12 Mitsui Toatsu Chem Inc 紫外線硬化樹脂組成物
JPS5893046A (ja) * 1981-11-28 1983-06-02 Hitachi Chem Co Ltd 感光性エレメント
JPS58102230A (ja) * 1981-12-15 1983-06-17 Hitachi Chem Co Ltd 感光性樹脂組成物

Also Published As

Publication number Publication date
JPH0411856B2 (enrdf_load_stackoverflow) 1992-03-02

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