JPS57185037A - Negative resist for forming micropattern - Google Patents

Negative resist for forming micropattern

Info

Publication number
JPS57185037A
JPS57185037A JP56069861A JP6986181A JPS57185037A JP S57185037 A JPS57185037 A JP S57185037A JP 56069861 A JP56069861 A JP 56069861A JP 6986181 A JP6986181 A JP 6986181A JP S57185037 A JPS57185037 A JP S57185037A
Authority
JP
Japan
Prior art keywords
azide compound
poly
linking agent
negative type
dispersion degree
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56069861A
Other languages
English (en)
Inventor
Jiro Naito
Yasuhiro Yoneda
Tateo Kitamura
Toshisuke Kitakoji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP56069861A priority Critical patent/JPS57185037A/ja
Publication of JPS57185037A publication Critical patent/JPS57185037A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP56069861A 1981-05-08 1981-05-08 Negative resist for forming micropattern Pending JPS57185037A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56069861A JPS57185037A (en) 1981-05-08 1981-05-08 Negative resist for forming micropattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56069861A JPS57185037A (en) 1981-05-08 1981-05-08 Negative resist for forming micropattern

Publications (1)

Publication Number Publication Date
JPS57185037A true JPS57185037A (en) 1982-11-15

Family

ID=13415002

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56069861A Pending JPS57185037A (en) 1981-05-08 1981-05-08 Negative resist for forming micropattern

Country Status (1)

Country Link
JP (1) JPS57185037A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6081158A (ja) * 1983-10-11 1985-05-09 Hitachi Ltd 放射線感応物質
EP0349982A2 (en) * 1988-07-04 1990-01-10 Canon Kabushiki Kaisha Volume phase type hologram film and photosensitive resin composition employed therefor
JPH05177770A (ja) * 1992-01-07 1993-07-20 Eidai Co Ltd 突板貼り化粧板

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6081158A (ja) * 1983-10-11 1985-05-09 Hitachi Ltd 放射線感応物質
JPH0446267B2 (ja) * 1983-10-11 1992-07-29 Hitachi Seisakusho Kk
EP0349982A2 (en) * 1988-07-04 1990-01-10 Canon Kabushiki Kaisha Volume phase type hologram film and photosensitive resin composition employed therefor
JPH05177770A (ja) * 1992-01-07 1993-07-20 Eidai Co Ltd 突板貼り化粧板

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