JPS57178238A - Photosensitive composition - Google Patents

Photosensitive composition

Info

Publication number
JPS57178238A
JPS57178238A JP56064541A JP6454181A JPS57178238A JP S57178238 A JPS57178238 A JP S57178238A JP 56064541 A JP56064541 A JP 56064541A JP 6454181 A JP6454181 A JP 6454181A JP S57178238 A JPS57178238 A JP S57178238A
Authority
JP
Japan
Prior art keywords
photosensitive composition
acid
polymer
water
obtd
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56064541A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0210935B2 (enrdf_load_stackoverflow
Inventor
Akira Nogami
Nobumasa Sasa
Motoo Kogure
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP56064541A priority Critical patent/JPS57178238A/ja
Publication of JPS57178238A publication Critical patent/JPS57178238A/ja
Publication of JPH0210935B2 publication Critical patent/JPH0210935B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP56064541A 1981-04-27 1981-04-27 Photosensitive composition Granted JPS57178238A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56064541A JPS57178238A (en) 1981-04-27 1981-04-27 Photosensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56064541A JPS57178238A (en) 1981-04-27 1981-04-27 Photosensitive composition

Publications (2)

Publication Number Publication Date
JPS57178238A true JPS57178238A (en) 1982-11-02
JPH0210935B2 JPH0210935B2 (enrdf_load_stackoverflow) 1990-03-12

Family

ID=13261180

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56064541A Granted JPS57178238A (en) 1981-04-27 1981-04-27 Photosensitive composition

Country Status (1)

Country Link
JP (1) JPS57178238A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63141048A (ja) * 1986-10-23 1988-06-13 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド 画像形成方法
JP2009075511A (ja) * 2007-09-25 2009-04-09 Nidec Sankyo Corp 光学装置
WO2013141222A1 (ja) * 2012-03-19 2013-09-26 Jsr株式会社 レジストパターン形成方法及びフォトレジスト組成物

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5136932A (ja) * 1974-09-25 1976-03-29 Unitika Ltd Kankoseisoseibutsu
JPS5598744A (en) * 1979-01-22 1980-07-28 Toyobo Co Ltd Photosensitive resin composition

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5136932A (ja) * 1974-09-25 1976-03-29 Unitika Ltd Kankoseisoseibutsu
JPS5598744A (en) * 1979-01-22 1980-07-28 Toyobo Co Ltd Photosensitive resin composition

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63141048A (ja) * 1986-10-23 1988-06-13 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド 画像形成方法
JP2009075511A (ja) * 2007-09-25 2009-04-09 Nidec Sankyo Corp 光学装置
WO2013141222A1 (ja) * 2012-03-19 2013-09-26 Jsr株式会社 レジストパターン形成方法及びフォトレジスト組成物
JPWO2013141222A1 (ja) * 2012-03-19 2015-08-03 Jsr株式会社 レジストパターン形成方法及びフォトレジスト組成物
US9594303B2 (en) 2012-03-19 2017-03-14 Jsr Corporation Resist pattern-forming method and photoresist composition

Also Published As

Publication number Publication date
JPH0210935B2 (enrdf_load_stackoverflow) 1990-03-12

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