JPS57172742A - Forming method of thin film of oxide glass - Google Patents

Forming method of thin film of oxide glass

Info

Publication number
JPS57172742A
JPS57172742A JP56057029A JP5702981A JPS57172742A JP S57172742 A JPS57172742 A JP S57172742A JP 56057029 A JP56057029 A JP 56057029A JP 5702981 A JP5702981 A JP 5702981A JP S57172742 A JPS57172742 A JP S57172742A
Authority
JP
Japan
Prior art keywords
oxide glass
fine particles
gas
bubbles
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56057029A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6320377B2 (enrdf_load_stackoverflow
Inventor
Kinya Kato
Hiroo Ito
Hirohiko Hasegawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP56057029A priority Critical patent/JPS57172742A/ja
Publication of JPS57172742A publication Critical patent/JPS57172742A/ja
Publication of JPS6320377B2 publication Critical patent/JPS6320377B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Surface Treatment Of Glass (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Formation Of Insulating Films (AREA)
JP56057029A 1981-04-17 1981-04-17 Forming method of thin film of oxide glass Granted JPS57172742A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56057029A JPS57172742A (en) 1981-04-17 1981-04-17 Forming method of thin film of oxide glass

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56057029A JPS57172742A (en) 1981-04-17 1981-04-17 Forming method of thin film of oxide glass

Publications (2)

Publication Number Publication Date
JPS57172742A true JPS57172742A (en) 1982-10-23
JPS6320377B2 JPS6320377B2 (enrdf_load_stackoverflow) 1988-04-27

Family

ID=13044004

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56057029A Granted JPS57172742A (en) 1981-04-17 1981-04-17 Forming method of thin film of oxide glass

Country Status (1)

Country Link
JP (1) JPS57172742A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5986227A (ja) * 1982-11-10 1984-05-18 Toshiba Corp ガラス被膜の形成方法
JPS6148434A (ja) * 1984-08-17 1986-03-10 Nippon Telegr & Teleph Corp <Ntt> ガラス膜形成法
JPS61170561A (ja) * 1985-01-25 1986-08-01 Nippon Telegr & Teleph Corp <Ntt> 高融点金属膜形成方法
JPS61172340A (ja) * 1985-01-28 1986-08-04 Nippon Telegr & Teleph Corp <Ntt> シリコン酸化膜の形成方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5986227A (ja) * 1982-11-10 1984-05-18 Toshiba Corp ガラス被膜の形成方法
JPS6148434A (ja) * 1984-08-17 1986-03-10 Nippon Telegr & Teleph Corp <Ntt> ガラス膜形成法
JPS61170561A (ja) * 1985-01-25 1986-08-01 Nippon Telegr & Teleph Corp <Ntt> 高融点金属膜形成方法
JPS61172340A (ja) * 1985-01-28 1986-08-04 Nippon Telegr & Teleph Corp <Ntt> シリコン酸化膜の形成方法

Also Published As

Publication number Publication date
JPS6320377B2 (enrdf_load_stackoverflow) 1988-04-27

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