JPS57172732A - Relative position detecting device for mask substrate and wafer - Google Patents

Relative position detecting device for mask substrate and wafer

Info

Publication number
JPS57172732A
JPS57172732A JP56057907A JP5790781A JPS57172732A JP S57172732 A JPS57172732 A JP S57172732A JP 56057907 A JP56057907 A JP 56057907A JP 5790781 A JP5790781 A JP 5790781A JP S57172732 A JPS57172732 A JP S57172732A
Authority
JP
Japan
Prior art keywords
wafer
mask
zone plate
fresnel zone
alignment reference
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56057907A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6211779B2 (enExample
Inventor
Toshiaki Shinozaki
Ichiro Mori
Toru Tojo
Kazuyoshi Sugihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP56057907A priority Critical patent/JPS57172732A/ja
Publication of JPS57172732A publication Critical patent/JPS57172732A/ja
Publication of JPS6211779B2 publication Critical patent/JPS6211779B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/703—Gap setting, e.g. in proximity printer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP56057907A 1981-04-17 1981-04-17 Relative position detecting device for mask substrate and wafer Granted JPS57172732A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56057907A JPS57172732A (en) 1981-04-17 1981-04-17 Relative position detecting device for mask substrate and wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56057907A JPS57172732A (en) 1981-04-17 1981-04-17 Relative position detecting device for mask substrate and wafer

Publications (2)

Publication Number Publication Date
JPS57172732A true JPS57172732A (en) 1982-10-23
JPS6211779B2 JPS6211779B2 (enExample) 1987-03-14

Family

ID=13069054

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56057907A Granted JPS57172732A (en) 1981-04-17 1981-04-17 Relative position detecting device for mask substrate and wafer

Country Status (1)

Country Link
JP (1) JPS57172732A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59218516A (ja) * 1983-05-25 1984-12-08 Nichiden Mach Ltd 同軸直射照明を有する位置決め装置

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62235077A (ja) * 1986-03-29 1987-10-15 加茂　守 卵容器
JPS62251371A (ja) * 1986-04-17 1987-11-02 加茂　守 卵容器

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59218516A (ja) * 1983-05-25 1984-12-08 Nichiden Mach Ltd 同軸直射照明を有する位置決め装置

Also Published As

Publication number Publication date
JPS6211779B2 (enExample) 1987-03-14

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