JPS57172337A - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
JPS57172337A
JPS57172337A JP5693581A JP5693581A JPS57172337A JP S57172337 A JPS57172337 A JP S57172337A JP 5693581 A JP5693581 A JP 5693581A JP 5693581 A JP5693581 A JP 5693581A JP S57172337 A JPS57172337 A JP S57172337A
Authority
JP
Japan
Prior art keywords
photosensitive resin
formula
photosensitive
resin composition
aliphatic hydrocarbon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5693581A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0337174B2 (it
Inventor
Hiroshi Komano
Shunichi Kasukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP5693581A priority Critical patent/JPS57172337A/ja
Publication of JPS57172337A publication Critical patent/JPS57172337A/ja
Publication of JPH0337174B2 publication Critical patent/JPH0337174B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
JP5693581A 1981-04-17 1981-04-17 Photosensitive resin composition Granted JPS57172337A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5693581A JPS57172337A (en) 1981-04-17 1981-04-17 Photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5693581A JPS57172337A (en) 1981-04-17 1981-04-17 Photosensitive resin composition

Publications (2)

Publication Number Publication Date
JPS57172337A true JPS57172337A (en) 1982-10-23
JPH0337174B2 JPH0337174B2 (it) 1991-06-04

Family

ID=13041372

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5693581A Granted JPS57172337A (en) 1981-04-17 1981-04-17 Photosensitive resin composition

Country Status (1)

Country Link
JP (1) JPS57172337A (it)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61217034A (ja) * 1985-03-22 1986-09-26 Fuji Photo Film Co Ltd 感光性組成物および感光性材料
JPS61218616A (ja) * 1985-03-02 1986-09-29 チバ‐ガイギー　アクチエンゲゼルシヤフト 変性フエノール樹脂生成物、その製造方法及び該化合物を使用する画像形成方法
JPS61228439A (ja) * 1985-04-01 1986-10-11 Fuji Photo Film Co Ltd 感光性組成物および感光性材料

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5271224A (en) * 1975-12-11 1977-06-14 Toshiba Corp Positive type light sensitive composition
JPS5359504A (en) * 1976-11-05 1978-05-29 Tokyo Shibaura Electric Co Positive photoresist material

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5271224A (en) * 1975-12-11 1977-06-14 Toshiba Corp Positive type light sensitive composition
JPS5359504A (en) * 1976-11-05 1978-05-29 Tokyo Shibaura Electric Co Positive photoresist material

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61218616A (ja) * 1985-03-02 1986-09-29 チバ‐ガイギー　アクチエンゲゼルシヤフト 変性フエノール樹脂生成物、その製造方法及び該化合物を使用する画像形成方法
JPS61217034A (ja) * 1985-03-22 1986-09-26 Fuji Photo Film Co Ltd 感光性組成物および感光性材料
JPS61228439A (ja) * 1985-04-01 1986-10-11 Fuji Photo Film Co Ltd 感光性組成物および感光性材料

Also Published As

Publication number Publication date
JPH0337174B2 (it) 1991-06-04

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