JPS57171663A - Method and device for vacuum deposition - Google Patents
Method and device for vacuum depositionInfo
- Publication number
- JPS57171663A JPS57171663A JP56058278A JP5827881A JPS57171663A JP S57171663 A JPS57171663 A JP S57171663A JP 56058278 A JP56058278 A JP 56058278A JP 5827881 A JP5827881 A JP 5827881A JP S57171663 A JPS57171663 A JP S57171663A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- substrate
- clusters
- clustered
- deposition material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/221—Ion beam deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56058278A JPS57171663A (en) | 1981-04-16 | 1981-04-16 | Method and device for vacuum deposition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56058278A JPS57171663A (en) | 1981-04-16 | 1981-04-16 | Method and device for vacuum deposition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS57171663A true JPS57171663A (en) | 1982-10-22 |
Family
ID=13079714
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56058278A Pending JPS57171663A (en) | 1981-04-16 | 1981-04-16 | Method and device for vacuum deposition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57171663A (ja) |
-
1981
- 1981-04-16 JP JP56058278A patent/JPS57171663A/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| ES459671A1 (es) | Procedimiento y aparato para producir una capa depositada por sublimacion catodica sobre un substrato tubular alarga- do. | |
| GB1089967A (en) | Improvements in or relating to arrangements for the manufacture of electronic components comprising thin films | |
| JPS5391665A (en) | Plasma cvd device | |
| JPS57171663A (en) | Method and device for vacuum deposition | |
| EP0388957A3 (en) | Process for depositing tantalum oxide film and chemical vapor deposition system used therefore | |
| CA2037432A1 (en) | Method of and apparatus for preparing oxide superconducting film | |
| JPS5737821A (en) | Vapor phase reaction device | |
| JPS57171661A (en) | Method and device for vacuum deposition | |
| JPH04318168A (ja) | イオン複合cvd法及びその装置 | |
| JPS5730528A (en) | Vapor-separating member | |
| JPS56121629A (en) | Film forming method | |
| JPS6451396A (en) | Device for forming thin diamond film | |
| JPS5591971A (en) | Thin film forming method | |
| JPS55110771A (en) | Vacuum vapor depositing apparatus | |
| JPS5745226A (en) | Manufacture of thin film semiconductor | |
| JPS57155375A (en) | Vacuum evaporation apparatus | |
| JPS5726161A (en) | Manufacturing apparatus for film of very fine particle | |
| JPS5485398A (en) | Magnetic recording medium | |
| JPS57138059A (en) | Manufacture for magnetic recording medium | |
| JPS57156031A (en) | Formation of thin film and vacuum deposition device | |
| JPS5518077A (en) | Device for growing film under gas | |
| JPS6473076A (en) | Inline type ion sputtering device | |
| JPS5546715A (en) | Production of plastic sunglasses | |
| FR2443137A1 (fr) | Procede pour ameliorer l'uniformite des couches epitaxiales, dispositif et produits obtenus | |
| JPS5546714A (en) | Production of plastic sunglasses |